DE69504431T2 - Photopolymerisationsinitiatorzusammensetzung und photopolymerisierbare Zusammensetzung - Google Patents

Photopolymerisationsinitiatorzusammensetzung und photopolymerisierbare Zusammensetzung

Info

Publication number
DE69504431T2
DE69504431T2 DE69504431T DE69504431T DE69504431T2 DE 69504431 T2 DE69504431 T2 DE 69504431T2 DE 69504431 T DE69504431 T DE 69504431T DE 69504431 T DE69504431 T DE 69504431T DE 69504431 T2 DE69504431 T2 DE 69504431T2
Authority
DE
Germany
Prior art keywords
composition
photopolymerization initiator
photopolymerizable
photopolymerizable composition
initiator composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69504431T
Other languages
English (en)
Other versions
DE69504431D1 (de
Inventor
Yasuhiro Tanaka
Yasumasa Toba
Madoka Yasuikie
Tadashi Tanoue
Kaoru Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Ink Mfg Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Application granted granted Critical
Publication of DE69504431D1 publication Critical patent/DE69504431D1/de
Publication of DE69504431T2 publication Critical patent/DE69504431T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
DE69504431T 1994-06-28 1995-06-28 Photopolymerisationsinitiatorzusammensetzung und photopolymerisierbare Zusammensetzung Expired - Fee Related DE69504431T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14601794 1994-06-28
JP5834195 1995-03-17

Publications (2)

Publication Number Publication Date
DE69504431D1 DE69504431D1 (de) 1998-10-08
DE69504431T2 true DE69504431T2 (de) 1999-01-14

Family

ID=26399400

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69504431T Expired - Fee Related DE69504431T2 (de) 1994-06-28 1995-06-28 Photopolymerisationsinitiatorzusammensetzung und photopolymerisierbare Zusammensetzung

Country Status (3)

Country Link
US (1) US5631307A (de)
EP (1) EP0690074B1 (de)
DE (1) DE69504431T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
MY132867A (en) * 1995-11-24 2007-10-31 Ciba Specialty Chemicals Holding Inc Acid-stable borates for photopolymerization
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US6054501A (en) * 1996-06-12 2000-04-25 Nippon Kayaku Kabushiki Kaisha Photopolymerization initiator and energy ray curable composition containing the same
US6218076B1 (en) 1997-08-26 2001-04-17 Showa Denko K.K. Stabilizer for organic borate salts and photosensitive composition containing the same
TW455616B (en) * 1997-11-03 2001-09-21 Ciba Sc Holding Ag New quinolinium dyes and borates, combinations thereof as photoinitiator compositions and photopolymerizable compositions comprising these photoinitiators
US6855415B2 (en) * 1997-11-14 2005-02-15 General Electric Company Coated thermoplastic film substrate
US6458865B2 (en) * 1999-01-15 2002-10-01 Curators Of The University Of Missouri Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates
US6610759B1 (en) 2000-03-06 2003-08-26 Curators Of The University Of Missouri Cationically polymerizable adhesive composition containing an acidic component and methods and materials employing same
JP4019645B2 (ja) 2001-03-12 2007-12-12 東洋インキ製造株式会社 重合性組成物
US7341828B2 (en) * 2002-02-28 2008-03-11 Showa Denko K.K. Thiol compound, photopolymerization initiator composition and photosensitive composition
JP4697197B2 (ja) * 2006-10-30 2011-06-08 セイコーエプソン株式会社 インクジェット記録方法
JP5304977B2 (ja) * 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
KR20130102464A (ko) 2010-05-11 2013-09-17 쓰리엠 이노베이티브 프로퍼티즈 컴파니 경화성 조성물, 감압 접착제, 그의 제조 방법, 및 접착 용품
EP3350233A4 (de) 2015-09-15 2019-06-19 G3 Enterprises, Inc. Vorrichtung und verfahren für alternative, auf metall anwendbare beschichtungen
EP3883975A4 (de) 2018-11-20 2022-08-24 G3 Enterprises, Inc. Vorrichtung und verfahren unter verwendung von beschichtungen für metallanwendungen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
DE2718259C2 (de) 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
JPS591281A (ja) 1982-06-28 1984-01-06 Fujitsu Ltd プランジャ型ハンマ
DE3333450A1 (de) 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
DE3337024A1 (de) 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPS6244258A (ja) 1985-08-23 1987-02-26 テルモ株式会社 医療用生体表面被覆材
DE3807381A1 (de) 1988-03-07 1989-09-21 Hoechst Ag 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische verbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindung enthaelt
DE3807380A1 (de) 1988-03-07 1989-09-21 Hoechst Ag 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende oxadiazolverbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
DE3807378A1 (de) 1988-03-07 1989-09-21 Hoechst Ag Durch 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen substituierte aromatische verbindungen, verfahren zu ihrer herstellung und ihre verwendung in lichtempfindlichen gemischen
DE3912652A1 (de) 1989-04-18 1990-10-25 Hoechst Ag Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JP2711491B2 (ja) 1992-02-07 1998-02-10 東洋インキ製造株式会社 スルホニウム錯体またはオキソスルホニウム錯体
DE69310401T2 (de) * 1992-02-07 1997-08-21 Toyo Ink Mfg Co (Oxo)Sulfoniumkomplex, diese enthaltende polymerisierbare Zusammensetzung und Verfahren zur Polymerisation
JP2803454B2 (ja) 1992-03-13 1998-09-24 東洋インキ製造株式会社 スルホニウム錯体またはオキソスルホニウム錯体
US5550453A (en) * 1994-01-24 1996-08-27 Motorola, Inc. Battery charging method and apparatus

Also Published As

Publication number Publication date
EP0690074A1 (de) 1996-01-03
EP0690074B1 (de) 1998-09-02
US5631307A (en) 1997-05-20
DE69504431D1 (de) 1998-10-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee