DE69408193D1 - Verwendung einer fotoempflindlichen Zusammensetzung zur Herstellung einer Flüssigkristall-Anzeigevorrichtung - Google Patents

Verwendung einer fotoempflindlichen Zusammensetzung zur Herstellung einer Flüssigkristall-Anzeigevorrichtung

Info

Publication number
DE69408193D1
DE69408193D1 DE69408193T DE69408193T DE69408193D1 DE 69408193 D1 DE69408193 D1 DE 69408193D1 DE 69408193 T DE69408193 T DE 69408193T DE 69408193 T DE69408193 T DE 69408193T DE 69408193 D1 DE69408193 D1 DE 69408193D1
Authority
DE
Germany
Prior art keywords
manufacture
liquid crystal
display device
crystal display
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69408193T
Other languages
English (en)
Other versions
DE69408193T2 (de
Inventor
Hidetoshi Miyamoto
Shinji Shiraki
Yoshiji Yumoto
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Application granted granted Critical
Publication of DE69408193D1 publication Critical patent/DE69408193D1/de
Publication of DE69408193T2 publication Critical patent/DE69408193T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
DE69408193T 1993-04-19 1994-04-13 Verwendung einer fotoempflindlichen Zusammensetzung zur Herstellung einer Flüssigkristall-Anzeigevorrichtung Expired - Lifetime DE69408193T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11420293A JPH06308729A (ja) 1993-04-19 1993-04-19 感放射線性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69408193D1 true DE69408193D1 (de) 1998-03-05
DE69408193T2 DE69408193T2 (de) 1998-05-20

Family

ID=14631771

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69408193T Expired - Lifetime DE69408193T2 (de) 1993-04-19 1994-04-13 Verwendung einer fotoempflindlichen Zusammensetzung zur Herstellung einer Flüssigkristall-Anzeigevorrichtung

Country Status (4)

Country Link
US (1) US5609988A (de)
EP (1) EP0621509B1 (de)
JP (1) JPH06308729A (de)
DE (1) DE69408193T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3578803B2 (ja) * 1993-06-22 2004-10-20 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． ネガ型感光性組成物
US6190833B1 (en) * 1997-03-30 2001-02-20 Jsr Corporation Radiation-sensitive resin composition
US5910394A (en) * 1997-06-18 1999-06-08 Shipley Company, L.L.C. I-line photoresist compositions
JP4163305B2 (ja) * 1998-11-24 2008-10-08 日東電工株式会社 多色反射板及びその製造方法
JP3320397B2 (ja) * 2000-03-09 2002-09-03 クラリアント ジャパン 株式会社 逆テーパー状レジストパターンの形成方法
JP4042142B2 (ja) 2000-09-08 2008-02-06 Ｊｓｒ株式会社 Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
JP4401033B2 (ja) * 2001-03-19 2010-01-20 Ａｚエレクトロニックマテリアルズ株式会社 ネガ型感光性樹脂組成物及びこれを用いた表示デバイス
US20050003300A1 (en) * 2001-03-19 2005-01-06 Satoshi Kobayashi Negative photosensitive resin composition and display device using the same
TWI242689B (en) * 2001-07-30 2005-11-01 Tokyo Ohka Kogyo Co Ltd Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same
KR100906795B1 (ko) * 2003-03-12 2009-07-09 주식회사 동진쎄미켐 액정표시장치 회로용 포토레지스트 조성물
JP4376706B2 (ja) * 2004-06-30 2009-12-02 東京応化工業株式会社 ネガ型ホトレジスト組成物を用いたメッキ形成物の形成方法
KR101385946B1 (ko) * 2007-04-02 2014-04-16 주식회사 동진쎄미켐 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴의형성 방법
JP4656242B2 (ja) * 2009-02-19 2011-03-23 三菱電機株式会社 レジスト材およびこれを用いた半導体装置の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
EP0288533A4 (de) * 1986-10-20 1989-02-06 Macdermid Inc Bildumkehrsystem und -verfahren.
JP2505033B2 (ja) * 1988-11-28 1996-06-05 東京応化工業株式会社 電子線レジスト組成物及びそれを用いた微細パタ―ンの形成方法
JP2583600B2 (ja) * 1989-02-20 1997-02-19 東京応化工業株式会社 ネガ型電子線レジスト組成物
EP0458325B1 (de) * 1990-05-25 1998-08-19 Mitsubishi Chemical Corporation Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters
JP2538117B2 (ja) * 1990-09-28 1996-09-25 東京応化工業株式会社 ネガ型放射線感応レジスト組成物
EP0483693B1 (de) * 1990-10-29 1998-12-30 Toyo Gosei Kogyo Co., Ltd. Lichtempfindliches gefärbtes Harz, farbiges Bild, Verfahren zur Herstellung von Farbfiltern und Verfahren zur Herstellung einer Schwarzmatrix
TW207009B (de) * 1991-01-31 1993-06-01 Sumitomo Chemical Co
DE4120174A1 (de) * 1991-06-19 1992-12-24 Hoechst Ag Strahlungsempfindliche sulfonsaeureester und deren verwendung
US5258257A (en) * 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
JP2566098B2 (ja) * 1992-05-01 1996-12-25 東京応化工業株式会社 ネガ型放射線感応性レジスト組成物

Also Published As

Publication number Publication date
JPH06308729A (ja) 1994-11-04
DE69408193T2 (de) 1998-05-20
EP0621509B1 (de) 1998-01-28
EP0621509A1 (de) 1994-10-26
US5609988A (en) 1997-03-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: JSR CORP., TOKIO/TOKYO, JP