DE69404372D1 - Zerstäubungstarget mit Warneinrichtung - Google Patents

Zerstäubungstarget mit Warneinrichtung

Info

Publication number
DE69404372D1
DE69404372D1 DE69404372T DE69404372T DE69404372D1 DE 69404372 D1 DE69404372 D1 DE 69404372D1 DE 69404372 T DE69404372 T DE 69404372T DE 69404372 T DE69404372 T DE 69404372T DE 69404372 D1 DE69404372 D1 DE 69404372D1
Authority
DE
Germany
Prior art keywords
warning device
atomization target
atomization
target
warning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69404372T
Other languages
English (en)
Other versions
DE69404372T2 (de
Inventor
Susumu Sawada
Junichi Anan
Hiroki Nakamura
Yoshihiro Sakaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Publication of DE69404372D1 publication Critical patent/DE69404372D1/de
Application granted granted Critical
Publication of DE69404372T2 publication Critical patent/DE69404372T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69404372T 1993-04-28 1994-04-27 Zerstäubungstarget mit Warneinrichtung Expired - Fee Related DE69404372T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5125067A JPH08176808A (ja) 1993-04-28 1993-04-28 寿命警報機能を備えたスパッタリングタ−ゲット

Publications (2)

Publication Number Publication Date
DE69404372D1 true DE69404372D1 (de) 1997-08-28
DE69404372T2 DE69404372T2 (de) 1998-02-26

Family

ID=14901005

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69404372T Expired - Fee Related DE69404372T2 (de) 1993-04-28 1994-04-27 Zerstäubungstarget mit Warneinrichtung

Country Status (6)

Country Link
US (1) US5487823A (de)
EP (1) EP0622823B1 (de)
JP (1) JPH08176808A (de)
KR (1) KR970001004B1 (de)
DE (1) DE69404372T2 (de)
TW (1) TW286413B (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6179975B1 (en) * 1996-10-02 2001-01-30 National Semiconductor Corporation Method of monitoring target/component consumption for dual use titanium/titanium nitride sputtering
DE60142299D1 (de) * 2000-08-17 2010-07-15 Tosoh Smd Inc Hochreiner sputtering targets mit indikator zur anzeige des endes der nutzungsdauerfür target und herstellungsverfahren dafür
ATE425277T1 (de) * 2002-10-21 2009-03-15 Cabot Corp Verfahren zur herstellung eines sputtertargets und sputtertarget
US6702930B1 (en) 2003-05-08 2004-03-09 Seagate Technology Llc Method and means for enhancing utilization of sputtering targets
US20050178653A1 (en) * 2004-02-17 2005-08-18 Charles Fisher Method for elimination of sputtering into the backing plate of a target/backing plate assembly
US7282122B2 (en) * 2004-03-26 2007-10-16 Taiwan Semiconductor Manufacturing Company Method and system for target lifetime
US20060081459A1 (en) * 2004-10-18 2006-04-20 Applied Materials, Inc. In-situ monitoring of target erosion
US8795486B2 (en) 2005-09-26 2014-08-05 Taiwan Semiconductor Manufacturing Company, Ltd. PVD target with end of service life detection capability
US20070068796A1 (en) * 2005-09-26 2007-03-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method of using a target having end of service life detection capability
JP4560500B2 (ja) * 2005-09-26 2010-10-13 台湾積體電路製造股▲ふん▼有限公司 スラブの寿命検出方法
US7891536B2 (en) 2005-09-26 2011-02-22 Taiwan Semiconductor Manufacturing Co., Ltd. PVD target with end of service life detection capability
CN100560784C (zh) * 2005-09-26 2009-11-18 台湾积体电路制造股份有限公司 侦测制程机台使用的消耗性材料厚板寿命的系统及方法
US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
US8647484B2 (en) * 2005-11-25 2014-02-11 Applied Materials, Inc. Target for sputtering chamber
US8968536B2 (en) * 2007-06-18 2015-03-03 Applied Materials, Inc. Sputtering target having increased life and sputtering uniformity
US7901552B2 (en) 2007-10-05 2011-03-08 Applied Materials, Inc. Sputtering target with grooves and intersecting channels
DE102010052341B4 (de) * 2010-11-25 2015-02-12 Von Ardenne Gmbh Schutzvorrichtung an Rohrtargets
TWI470103B (zh) * 2011-10-27 2015-01-21 Solar Applied Mat Tech Corp 具有警示功能之濺鍍靶材
CN103088304A (zh) * 2011-10-28 2013-05-08 光洋应用材料科技股份有限公司 具有警示功能的溅镀靶材
US20130206589A1 (en) * 2012-02-14 2013-08-15 Solar Applied Materials Technology Corp. Sputtering Target Having Alarm Function
JP2013185230A (ja) * 2012-03-09 2013-09-19 Solar Applied Materials Technology Corp アラーム機能を有するスパッタリングターゲット
US10060023B2 (en) 2012-10-19 2018-08-28 Infineon Technologies Ag Backing plate for a sputter target, sputter target, and sputter device
CN102994970B (zh) * 2012-11-16 2014-12-10 京东方科技集团股份有限公司 一种靶材使用检测系统和方法
CN106032565A (zh) * 2015-03-11 2016-10-19 北京北方微电子基地设备工艺研究中心有限责任公司 靶材组件及物理气相沉积设备
CN111172507A (zh) * 2020-03-05 2020-05-19 东莞南玻工程玻璃有限公司 平面靶材烧穿报警系统
US11424111B2 (en) 2020-06-25 2022-08-23 Taiwan Semiconductor Manufacturing Company Limited Sputtering target assembly to prevent overetch of backing plate and methods of using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3069702D1 (en) * 1980-08-08 1985-01-10 Battelle Development Corp Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus
US4345968A (en) * 1981-08-27 1982-08-24 Ncr Corporation End point detection using gas flow
US4545882A (en) * 1983-09-02 1985-10-08 Shatterproof Glass Corporation Method and apparatus for detecting sputtering target depletion
DE3630737C1 (de) * 1986-09-10 1987-11-05 Philips & Du Pont Optical Kathodenzerstaeubungseinrichtung mit einer Vorrichtung zur Messung eines kritischen Target-Abtrages
CH669609A5 (de) * 1986-12-23 1989-03-31 Balzers Hochvakuum

Also Published As

Publication number Publication date
KR970001004B1 (ko) 1997-01-25
US5487823A (en) 1996-01-30
EP0622823A1 (de) 1994-11-02
DE69404372T2 (de) 1998-02-26
JPH08176808A (ja) 1996-07-09
EP0622823B1 (de) 1997-07-23
TW286413B (de) 1996-09-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee