DE69402509D1 - Verfahren zur Herstellung eines hydrophoben Aerogels - Google Patents

Verfahren zur Herstellung eines hydrophoben Aerogels

Info

Publication number
DE69402509D1
DE69402509D1 DE69402509T DE69402509T DE69402509D1 DE 69402509 D1 DE69402509 D1 DE 69402509D1 DE 69402509 T DE69402509 T DE 69402509T DE 69402509 T DE69402509 T DE 69402509T DE 69402509 D1 DE69402509 D1 DE 69402509D1
Authority
DE
Germany
Prior art keywords
production
hydrophobic airgel
airgel
hydrophobic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69402509T
Other languages
English (en)
Other versions
DE69402509T2 (de
DE69402509T3 (de
Inventor
Hiroshi Yokogawa
Masaru Yokoyama
Koichi Takahama
Yuriko Uegaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17669302&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69402509(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Application granted granted Critical
Publication of DE69402509D1 publication Critical patent/DE69402509D1/de
Publication of DE69402509T2 publication Critical patent/DE69402509T2/de
Publication of DE69402509T3 publication Critical patent/DE69402509T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C01B33/1585—Dehydration into aerogels
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/02—Polysilicates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Silicon Polymers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
DE69402509T 1993-11-12 1994-04-27 Verfahren zur Herstellung eines hydrophoben Aerogels Expired - Lifetime DE69402509T3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5283726A JP2725573B2 (ja) 1993-11-12 1993-11-12 疎水性エアロゲルの製法
JP283726/93 1993-11-12

Publications (3)

Publication Number Publication Date
DE69402509D1 true DE69402509D1 (de) 1997-05-15
DE69402509T2 DE69402509T2 (de) 1997-07-17
DE69402509T3 DE69402509T3 (de) 2005-09-15

Family

ID=17669302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69402509T Expired - Lifetime DE69402509T3 (de) 1993-11-12 1994-04-27 Verfahren zur Herstellung eines hydrophoben Aerogels

Country Status (4)

Country Link
US (1) US5496527A (de)
EP (1) EP0653377B2 (de)
JP (1) JP2725573B2 (de)
DE (1) DE69402509T3 (de)

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US5736425A (en) * 1995-11-16 1998-04-07 Texas Instruments Incorporated Glycol-based method for forming a thin-film nanoporous dielectric
US6319852B1 (en) 1995-11-16 2001-11-20 Texas Instruments Incorporated Nanoporous dielectric thin film formation using a post-deposition catalyst
US5807607A (en) * 1995-11-16 1998-09-15 Texas Instruments Incorporated Polyol-based method for forming thin film aerogels on semiconductor substrates
US6380105B1 (en) 1996-11-14 2002-04-30 Texas Instruments Incorporated Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
US6130152A (en) 1995-11-16 2000-10-10 Texas Instruments Incorporated Aerogel thin film formation from multi-solvent systems
US6037277A (en) * 1995-11-16 2000-03-14 Texas Instruments Incorporated Limited-volume apparatus and method for forming thin film aerogels on semiconductor substrates
US5753305A (en) * 1995-11-16 1998-05-19 Texas Instruments Incorporated Rapid aging technique for aerogel thin films
US5955140A (en) * 1995-11-16 1999-09-21 Texas Instruments Incorporated Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
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DE19622500C2 (de) * 1996-06-05 1998-09-17 Fraunhofer Ges Forschung Verfahren zur Herstellung poröser Keramik der Zusammensetzung Pb(Zr¶x¶Ti¶1¶-¶x¶)0¶3¶
DE19648798C2 (de) * 1996-11-26 1998-11-19 Hoechst Ag Verfahren zur Herstellung von organisch modifizierten Aerogelen durch Oberflächenmodifikation des wäßrigen Gels (ohne vorherigen Lösungsmitteltausch) und anschließender Trocknung
US6197270B1 (en) 1996-12-20 2001-03-06 Matsushita Electric Works, Ltd. Process for producing aerogel
DE19718741A1 (de) 1997-05-02 1998-11-05 Hoechst Ag Verfahren zur Kompaktierung von Aerogelen
DE19718740A1 (de) 1997-05-02 1998-11-05 Hoechst Ag Verfahren zur Granulierung von Aerogelen
DE19726330C2 (de) * 1997-06-20 1999-07-29 Joerg Ortjohann Vakuum-Isolationspaneel, Verfahren zur Herstellung eines solchen Paneels und ein Verfahren zur Regelung der Wärmeströme
US6154595A (en) * 1997-07-14 2000-11-28 Matsushita Electric Works, Ltd. Side-face illuminating optical fiber
DE19752456A1 (de) 1997-11-26 1999-05-27 Hoechst Ag Verfahren zur Herstellung von organisch modifizierten Aerogelen auf Basis von Siliciumtetrachlorid
DE19756633A1 (de) 1997-12-19 1999-06-24 Hoechst Ag Verfahren zur unterkritischen Trocknung von Lyogelen zu Aerogelen
DE19801004A1 (de) * 1998-01-14 1999-07-15 Cabot Corp Verfahren zur Herstellung von im wesentlichen kugelförmigen Lyogelen in wasserunlöslichen Silylierungsmitteln
WO1999064504A1 (de) 1998-06-05 1999-12-16 Cabot Corporation Nanoporöse interpenetrierende organisch-anorganische netzwerke
AU5477299A (en) * 1998-08-12 2000-03-06 Rofin Australia Pty Ltd Fluid light guide
JP4107732B2 (ja) 1998-10-20 2008-06-25 松下電器産業株式会社 有機多孔体の製造方法
US6586501B1 (en) 1999-01-20 2003-07-01 Cabot Corporation Aggregates having attached polymer groups and polymer foams
EP1230008A1 (de) * 1999-10-21 2002-08-14 Aspen Systems, Inc. Schnelles verfahren zur herstellung von aerogelen
US6762553B1 (en) 1999-11-10 2004-07-13 Matsushita Electric Works, Ltd. Substrate for light emitting device, light emitting device and process for production of light emitting device
US6740416B1 (en) 1999-11-10 2004-05-25 Matsushita Electric Works, Ltd. Aerogel substrate and method for preparing the same
US6764667B1 (en) 2001-03-09 2004-07-20 Steiner, Iii Stephen A. Method for the formation of aerogel precursor using rapid gelation two-step catalysis
US20030032681A1 (en) * 2001-05-18 2003-02-13 The Regents Of The University Of Clifornia Super-hydrophobic fluorine containing aerogels
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US20050119360A1 (en) * 2003-11-28 2005-06-02 Kabushiki Kaisha Kobe Seiko Sho Method for producing porous material
JP4912146B2 (ja) * 2004-12-01 2012-04-11 三洋電機株式会社 有機金属ポリマー材料
CN101203779B (zh) 2005-06-21 2011-08-17 日本瑞翁株式会社 用于偏振片的保护膜
US7998563B2 (en) 2005-06-21 2011-08-16 Zeon Corporation Protective film for polarizing plate
US8367793B2 (en) * 2005-09-30 2013-02-05 Abs Materials, Inc. Swellable materials and methods of use
US8021610B2 (en) * 2006-09-07 2011-09-20 Biolargo Life Technologies, Inc. Systems providing antimicrobial activity to an environment
JP2008193291A (ja) * 2007-02-02 2008-08-21 Matsushita Electric Ind Co Ltd 乾燥ゲルを含む音響整合層とその製造方法
CN101357766B (zh) * 2007-07-30 2012-04-18 成都思摩纳米技术有限公司 二氧化硅疏水粉末超临界制取技术
JP4575978B2 (ja) * 2008-10-31 2010-11-04 日東電工株式会社 液晶表示装置
GB0905205D0 (en) * 2009-03-26 2009-05-13 Dow Corning Preparation of organosiloxane polymer
JP5377252B2 (ja) * 2009-11-27 2013-12-25 日東電工株式会社 画像表示装置
US8217087B1 (en) 2011-04-26 2012-07-10 Keller Companies, Inc. Aerogel with reduced dust, static charge, and having reduced fluidity when in granular form
JP5803468B2 (ja) * 2011-09-14 2015-11-04 富士ゼロックス株式会社 疎水性シリカ粒子の製造方法
JP6099029B2 (ja) * 2011-11-08 2017-03-22 オゾンセーブ株式会社 断熱用塗料、該塗料を用いた断熱方法、及び該塗料を塗布したシート材
KR101409884B1 (ko) 2012-05-04 2014-06-27 한국과학기술연구원 소수성 모노리스형 실리카 에어로젤의 제조방법
KR101501015B1 (ko) * 2012-12-13 2015-03-10 한국생산기술연구원 이산화탄소 용매를 이용한 폴리실세스퀴옥산의 제조방법 및 이를 이용하여 제조된 폴리실세스퀴옥산.
EP2953714B1 (de) * 2013-02-05 2017-07-12 Basf Se Verfahren zur herstellung eines festen oxidischen materials
US9249075B2 (en) 2013-02-05 2016-02-02 Basf Se Process for producing porous or finely divided solid inorganic materials
US9399632B2 (en) 2013-02-05 2016-07-26 Basf Se Process for producing a solid oxidic material
KR20150116898A (ko) * 2013-02-05 2015-10-16 바스프 에스이 다공 또는 미분 입자 고체 무기 물질의 제조 방법
SG10201907591UA (en) 2014-02-26 2019-10-30 Hitachi Chemical Co Ltd Aerogel
TWI737161B (zh) * 2014-09-25 2021-08-21 日商昭和電工材料股份有限公司 氣凝膠複合體、帶有氣凝膠複合體的支撐構件及絕熱材
RU2576311C1 (ru) * 2014-11-25 2016-02-27 Федеральное государственное бюджетное учреждение науки Институт элементоорганических соединений им. А.Н. Несмеянова Российской академии наук (ИНЭОС РАН) Способ получения полиорганосилоксанов
CN107921731B (zh) 2015-09-02 2020-10-09 日立化成株式会社 气凝胶层叠复合体以及绝热材
ES2818298B2 (es) 2019-10-07 2021-11-08 Consejo Superior Investigacion Procedimiento para la preparación de aerogeles hidrofóbicos
CN112875711B (zh) * 2021-01-26 2022-06-21 西南科技大学 一种梯度密度疏水氧化硅气凝胶的制备方法
CN115093241B (zh) * 2022-06-07 2023-10-13 航天特种材料及工艺技术研究所 一种疏水型耐高温气凝胶材料及其制备方法

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Also Published As

Publication number Publication date
DE69402509T2 (de) 1997-07-17
EP0653377B2 (de) 2004-11-24
EP0653377B1 (de) 1997-04-09
JP2725573B2 (ja) 1998-03-11
JPH07138375A (ja) 1995-05-30
EP0653377A1 (de) 1995-05-17
DE69402509T3 (de) 2005-09-15
US5496527A (en) 1996-03-05

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8320 Willingness to grant licences declared (paragraph 23)
8366 Restricted maintained after opposition proceedings