DE69327749T2 - Verfahren zum Einstellen der Konzentration eines Entwicklers - Google Patents

Verfahren zum Einstellen der Konzentration eines Entwicklers

Info

Publication number
DE69327749T2
DE69327749T2 DE69327749T DE69327749T DE69327749T2 DE 69327749 T2 DE69327749 T2 DE 69327749T2 DE 69327749 T DE69327749 T DE 69327749T DE 69327749 T DE69327749 T DE 69327749T DE 69327749 T2 DE69327749 T2 DE 69327749T2
Authority
DE
Germany
Prior art keywords
developer
concentration
adjusting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69327749T
Other languages
English (en)
Other versions
DE69327749D1 (de
Inventor
Koichi Kotake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of DE69327749D1 publication Critical patent/DE69327749D1/de
Application granted granted Critical
Publication of DE69327749T2 publication Critical patent/DE69327749T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
DE69327749T 1992-07-10 1993-07-09 Verfahren zum Einstellen der Konzentration eines Entwicklers Expired - Lifetime DE69327749T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4207431A JP2670211B2 (ja) 1992-07-10 1992-07-10 現像液の調整方法

Publications (2)

Publication Number Publication Date
DE69327749D1 DE69327749D1 (de) 2000-03-09
DE69327749T2 true DE69327749T2 (de) 2000-10-12

Family

ID=16539651

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69327749T Expired - Lifetime DE69327749T2 (de) 1992-07-10 1993-07-09 Verfahren zum Einstellen der Konzentration eines Entwicklers

Country Status (6)

Country Link
US (1) US5843602A (de)
EP (1) EP0578505B1 (de)
JP (1) JP2670211B2 (de)
KR (1) KR100232861B1 (de)
DE (1) DE69327749T2 (de)
TW (1) TW217462B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06190256A (ja) * 1992-12-28 1994-07-12 Sumitomo Chem Co Ltd 現像液調合装置及び現像液調合方法
US5476320A (en) * 1992-12-28 1995-12-19 Sumitomo Chemical Co., Ltd. Developer preparing apparatus and developer preparing method
KR20000062334A (ko) * 1996-12-25 2000-10-25 나카노 가츠히코 패턴 가공용 약액 집중 관리 장치
US6355388B1 (en) * 1999-10-07 2002-03-12 Advanced Micro Devices, Inc. Method for controlling photoresist strip processes
EP1094506A3 (de) 1999-10-18 2004-03-03 Applied Materials, Inc. Schutzschicht für Filme mit besonders kleiner Dielektrizitätskonstante
JP4648513B2 (ja) * 2000-03-15 2011-03-09 関東化学株式会社 濃度検知方法及び濃度検知装置並びに薬剤の希釈調合装置
JP4704228B2 (ja) * 2005-09-06 2011-06-15 東京応化工業株式会社 レジスト液供給装置及び当該レジスト液供給装置を得るための改造キット
US20110159447A1 (en) 2009-12-25 2011-06-30 Tokyo Ohka Kogyo Co., Ltd. Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL179316C (nl) * 1973-09-10 1986-08-18 Oce Van Der Grinten N V P A Oc Concentratie-regelinrichting voor een vloeibare oplossing.
JPS5921022A (ja) * 1982-07-27 1984-02-02 Nippon Zeon Co Ltd 半導体用レジスト現像液又はリンス液を容器に充填する方法
JPS59184221A (ja) * 1983-04-04 1984-10-19 Kanegafuchi Chem Ind Co Ltd 改良された芳香族ポリエステル及びその製造方法
US4724795A (en) * 1985-06-03 1988-02-16 Acheson Industries, Inc. Automatic solution concentration monitoring system
JPS61279858A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp ネガレジスト現像装置
JPS634236A (ja) * 1986-06-24 1988-01-09 Konica Corp 現像の安定性等が改良される感光性平版印刷版の現像処理方法
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
CA1290744C (en) * 1987-07-08 1991-10-15 Laurent Verreault Process and an apparatus for mixing substances
JP2516022B2 (ja) * 1987-07-17 1996-07-10 富士写真フイルム株式会社 感光性平版印刷版自動現像装置の現像補充液補充方法
JP2585784B2 (ja) * 1989-02-03 1997-02-26 株式会社東芝 自動現像装置および方法
DE3921564A1 (de) * 1989-06-30 1991-01-17 Peter Luettgen Verfahren zur regelung der konzentration von entwickler- bzw. entschichterloesung fuer leiterplatten und vorrichtung zur durchfuehrung des verfahrens
JP3120817B2 (ja) * 1992-02-04 2000-12-25 三菱瓦斯化学株式会社 現像液の自動希釈装置
JPH06230037A (ja) * 1993-02-03 1994-08-19 Nippondenso Co Ltd 交差コイル駆動回路

Also Published As

Publication number Publication date
JPH0629207A (ja) 1994-02-04
EP0578505B1 (de) 2000-02-02
EP0578505A2 (de) 1994-01-12
US5843602A (en) 1998-12-01
EP0578505A3 (en) 1994-05-25
DE69327749D1 (de) 2000-03-09
JP2670211B2 (ja) 1997-10-29
TW217462B (en) 1993-12-11
KR100232861B1 (ko) 1999-12-01
KR940005997A (ko) 1994-03-22

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