DE69320623T2 - Mikropolarimeter, Mikrosensorsystem und Methode zum charakterisieren Dünner Filme - Google Patents

Mikropolarimeter, Mikrosensorsystem und Methode zum charakterisieren Dünner Filme

Info

Publication number
DE69320623T2
DE69320623T2 DE69320623T DE69320623T DE69320623T2 DE 69320623 T2 DE69320623 T2 DE 69320623T2 DE 69320623 T DE69320623 T DE 69320623T DE 69320623 T DE69320623 T DE 69320623T DE 69320623 T2 DE69320623 T2 DE 69320623T2
Authority
DE
Germany
Prior art keywords
micropolarimeter
thin films
microsensor system
characterizing thin
characterizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320623T
Other languages
English (en)
Other versions
DE69320623D1 (de
Inventor
Peter Dr Pokrowsky
Eckehard Dr Dipl Chem Kiefer
Michael Dr Abraham
Bernd Dipl Phys Stenkamp
Wolfgang Prof Dr Ehrfeld
Thomas Dr Zetterer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zegema GmbH
International Business Machines Corp
Original Assignee
IMM INST MIKROTECH
Institut fuer Mikrotechnik Mainz GmbH
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IMM INST MIKROTECH, Institut fuer Mikrotechnik Mainz GmbH, International Business Machines Corp filed Critical IMM INST MIKROTECH
Application granted granted Critical
Publication of DE69320623D1 publication Critical patent/DE69320623D1/de
Publication of DE69320623T2 publication Critical patent/DE69320623T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
DE69320623T 1993-06-28 1993-06-28 Mikropolarimeter, Mikrosensorsystem und Methode zum charakterisieren Dünner Filme Expired - Fee Related DE69320623T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP93110277A EP0632256B1 (de) 1993-06-28 1993-06-28 Mikropolarimeter, Mikrosensorsystem und Methode zum charakterisieren Dünner Filme

Publications (2)

Publication Number Publication Date
DE69320623D1 DE69320623D1 (de) 1998-10-01
DE69320623T2 true DE69320623T2 (de) 1999-04-15

Family

ID=8213014

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320623T Expired - Fee Related DE69320623T2 (de) 1993-06-28 1993-06-28 Mikropolarimeter, Mikrosensorsystem und Methode zum charakterisieren Dünner Filme

Country Status (3)

Country Link
US (1) US5502567A (de)
EP (1) EP0632256B1 (de)
DE (1) DE69320623T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10236999B3 (de) * 2002-08-13 2004-02-05 Kiepenheuer-Institut für Sonnenphysik Stiftung des öffentlichen Rechts des Landes Baden-Württemberg Vorrichtung zur Untersuchung von polarisiertem Licht
DE102013200394A1 (de) * 2013-01-14 2014-07-17 Carl Zeiss Smt Gmbh Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung

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DE19537706A1 (de) * 1995-10-11 1997-04-17 Lorenz Diener Verfahren und Vorrichtung zur störunempfindlichen analogen Echtzeitpolarimetrie
DE19621512A1 (de) * 1996-05-29 1997-12-04 Univ Schiller Jena Verfahren und Anordnung zur Auswertung des wellenlängenabhängigen Polarisationszustandes einer Strahlung
DE19707926A1 (de) * 1997-02-27 1998-09-03 Gunther Dr Elender Abbildendes Mikro-Ellipsometer
EP1002221B1 (de) * 1997-08-06 2003-07-02 INSTITUT FÜR MIKROTECHNIK MAINZ GmbH Mikropolarimeter
DE19751817A1 (de) * 1997-11-21 1999-05-27 Kalle Pentaplast Gmbh Verfahren zur kontinuierlichen Steuerung des Schrumpfes einer amorphen Folie und eine Anordnung hierfür
DE19816974C1 (de) * 1998-04-17 2000-01-13 Nanophotonics Ag Verfahren und Vorrichtung zur automatischen relativen Justierung von Proben bezüglich eines Ellipsometers
EP0950881A3 (de) * 1998-04-17 2000-08-16 NanoPhotonics AG Verfahren und Vorrichtung zur automatischen relativen Justierung von Proben bezüglich eines Ellipsometers
DE19842364C1 (de) * 1998-09-16 2000-04-06 Nanophotonics Ag Mikropolarimeter und Ellipsometer
WO2001055671A1 (en) * 2000-01-31 2001-08-02 Therma-Wave, Inc. Fiber-filtered laser system for use in measuring thin film thicknesses
US6515744B2 (en) * 2001-02-08 2003-02-04 Therma-Wave, Inc. Small spot ellipsometer
DE10146945A1 (de) * 2001-09-24 2003-04-10 Zeiss Carl Jena Gmbh Meßanordnung und Meßverfahren
DE10146944A1 (de) * 2001-09-24 2003-04-10 Zeiss Carl Jena Gmbh Meßanordnung
US6674532B2 (en) 2001-11-02 2004-01-06 Vandelden Jay S. Interferometric polarization interrogating filter assembly and method
US7064828B1 (en) 2001-12-19 2006-06-20 Nanometrics Incorporated Pulsed spectroscopy with spatially variable polarization modulation element
US6798513B2 (en) * 2002-04-11 2004-09-28 Nanophotonics Ab Measuring module
US6891609B2 (en) * 2002-04-11 2005-05-10 Nanophotonics Ag Measurement box with module for measuring wafer characteristics
DE10217028C1 (de) * 2002-04-11 2003-11-20 Nanophotonics Ag Meßmodul für Waferfertigungsanlagen
US7079249B2 (en) 2002-06-21 2006-07-18 Therma-Wave, Inc. Modulated reflectance measurement system with fiber laser technology
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
DE102010023605B4 (de) * 2010-06-12 2015-08-20 Wenglor Sensoric Gmbh Lichtschranke
CN102261955A (zh) * 2011-05-03 2011-11-30 杭州电子科技大学 一种光束偏振光谱特性检测方法
JP6981967B2 (ja) 2015-08-31 2021-12-17 ジェンテュイティ・リミテッド・ライアビリティ・カンパニーGentuity, LLC 撮像プローブおよびデリバリデバイスを含む撮像システム
EP3841736A4 (de) * 2018-09-17 2022-05-18 Gentuity LLC Bildgebungssystem mit optischem pfad
KR20230003886A (ko) * 2021-06-30 2023-01-06 삼성전자주식회사 광학 계측 설비, 그를 이용한 광학 계측 방법 및 그를 이용한 반도체 장치의 제조 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE456897C (de) * 1925-02-17 1928-06-19 Johann Wickeland Zugsicherung mittels Scheinwerfer und Spiegelreflektoren
DE1951920A1 (de) * 1969-10-15 1971-04-22 Siemens Ag Anordnung zur Bestimmung der Schwingungsebene einer polarisierten Lichtstrahlung
GB1352839A (en) * 1970-07-31 1974-05-15 Nat Res Dev Methods of and apparatus for effecting optical measurement and analysis
US3880524A (en) * 1973-06-25 1975-04-29 Ibm Automatic ellipsometer
US4158506A (en) * 1977-11-15 1979-06-19 The United States Of America As Represented By The Secretary Of The Army Automatic determination of the polarization state of nanosecond laser pulses
US4286843A (en) * 1979-05-14 1981-09-01 Reytblatt Zinovy V Polariscope and filter therefor
US4585348A (en) * 1981-09-28 1986-04-29 International Business Machines Corporation Ultra-fast photometric instrument
NL8502988A (nl) * 1985-11-01 1987-06-01 Philips Nv Halfgeleidende radieele fotodetector, en inrichting bevattende een dergelijke detector.
US5329357A (en) * 1986-03-06 1994-07-12 Sopra-Societe De Production Et De Recherches Appliquees Spectroscopic ellipsometry apparatus including an optical fiber
US4904085A (en) * 1988-05-04 1990-02-27 Simmonds Precision Products, Inc. Polarimetric fiber optic sensor testing apparatus
US4906844A (en) * 1988-08-12 1990-03-06 Rockwell International Corporation Phase sensitive optical monitor for thin film deposition
US4944579A (en) * 1989-05-31 1990-07-31 Grumman Aerospace Corporation Detection system for circularly polarized radiation
EP0456897A1 (de) * 1990-05-15 1991-11-21 Siemens Aktiengesellschaft Messanordnung für die Röntgenfluoreszenzanalyse
US5131752A (en) * 1990-06-28 1992-07-21 Tamarack Scientific Co., Inc. Method for film thickness endpoint control
US5357342A (en) * 1992-12-30 1994-10-18 The United States Of America As Represented By The United States Department Of Energy Process and apparatus for measuring degree of polarization and angle of major axis of polarized beam of light
JPH06229909A (ja) * 1993-01-30 1994-08-19 New Oji Paper Co Ltd 偏光二色性測定装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10236999B3 (de) * 2002-08-13 2004-02-05 Kiepenheuer-Institut für Sonnenphysik Stiftung des öffentlichen Rechts des Landes Baden-Württemberg Vorrichtung zur Untersuchung von polarisiertem Licht
DE102013200394A1 (de) * 2013-01-14 2014-07-17 Carl Zeiss Smt Gmbh Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung

Also Published As

Publication number Publication date
EP0632256A1 (de) 1995-01-04
EP0632256B1 (de) 1998-08-26
DE69320623D1 (de) 1998-10-01
US5502567A (en) 1996-03-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NANOPHOTONICS AG, 55129 MAINZ, DE

8327 Change in the person/name/address of the patent owner

Owner name: INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y

Owner name: NANOPHOTONICS AG, 55129 MAINZ, DE

8339 Ceased/non-payment of the annual fee