DE69314205T2 - Methode und Vorrichtung zur Messung der Grösse von Teilchen oder Fehlern - Google Patents

Methode und Vorrichtung zur Messung der Grösse von Teilchen oder Fehlern

Info

Publication number
DE69314205T2
DE69314205T2 DE69314205T DE69314205T DE69314205T2 DE 69314205 T2 DE69314205 T2 DE 69314205T2 DE 69314205 T DE69314205 T DE 69314205T DE 69314205 T DE69314205 T DE 69314205T DE 69314205 T2 DE69314205 T2 DE 69314205T2
Authority
DE
Germany
Prior art keywords
defects
particles
measuring
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69314205T
Other languages
English (en)
Other versions
DE69314205D1 (de
Inventor
Kazuo Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RAYTEX CORP., TAMA, TOKIO, JP
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Application granted granted Critical
Publication of DE69314205D1 publication Critical patent/DE69314205D1/de
Publication of DE69314205T2 publication Critical patent/DE69314205T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/02Investigating particle size or size distribution
    • G01N15/0205Investigating particle size or size distribution by optical means, e.g. by light scattering, diffraction, holography or imaging
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/02Investigating particle size or size distribution
    • G01N15/0205Investigating particle size or size distribution by optical means, e.g. by light scattering, diffraction, holography or imaging
    • G01N2015/0238Single particle scatter
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765Method using an image detector and processing of image signal
    • G01N2021/177Detector of the video camera type
    • G01N2021/1772Array detector
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4704Angular selective
    • G01N2021/4726Detecting scatter at 90°
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4792Polarisation of scatter light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N2021/8477Investigating crystals, e.g. liquid crystals
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
DE69314205T 1992-03-27 1993-03-26 Methode und Vorrichtung zur Messung der Grösse von Teilchen oder Fehlern Expired - Lifetime DE69314205T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4071593A JP2722362B2 (ja) 1992-03-27 1992-03-27 粒子または欠陥の大きさ情報の測定方法および装置

Publications (2)

Publication Number Publication Date
DE69314205D1 DE69314205D1 (de) 1997-11-06
DE69314205T2 true DE69314205T2 (de) 1998-01-29

Family

ID=13465126

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69314205T Expired - Lifetime DE69314205T2 (de) 1992-03-27 1993-03-26 Methode und Vorrichtung zur Messung der Grösse von Teilchen oder Fehlern

Country Status (4)

Country Link
US (1) US5471298A (de)
EP (1) EP0562630B1 (de)
JP (1) JP2722362B2 (de)
DE (1) DE69314205T2 (de)

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US6797975B2 (en) 2000-09-21 2004-09-28 Hitachi, Ltd. Method and its apparatus for inspecting particles or defects of a semiconductor device
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US6760100B2 (en) 2001-03-12 2004-07-06 Ade Corporation Method and apparatus for classifying defects occurring at or near a surface of a smooth substrate
GB2377012B (en) * 2001-03-21 2005-03-16 Univ Loughborough Measurement method and apparatus
EP1432972A1 (de) * 2001-09-07 2004-06-30 Inficon, Inc. Signalverarbeitungsverfahren zur in-situ-teilchenüberwachung mit einem gescannten strahl
US7105848B2 (en) * 2002-04-15 2006-09-12 Wintriss Engineering Corporation Dual level out-of-focus light source for amplification of defects on a surface
DE10227614B4 (de) * 2002-06-20 2006-04-20 Novar Gmbh Rauchsimulationskörper zum Abgleichen von Streulichtrauchmeldern
US7066868B2 (en) * 2003-07-07 2006-06-27 Rockfit Industries, Llc Exercise apparatus
IL156856A (en) * 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
JP4043417B2 (ja) 2003-08-28 2008-02-06 シスメックス株式会社 粒子径計測装置
US7163510B2 (en) * 2003-09-17 2007-01-16 Applied Medical Resources Corporation Surgical instrument access device
DE102004017237B4 (de) * 2004-04-05 2006-04-06 Schott Ag Verfahren und Vorrichtung zur quantitativen Bestimmung der optischen Güte eines transparenten Materials
US7292329B2 (en) * 2005-01-13 2007-11-06 Komag, Inc. Test head for optically inspecting workpieces comprising a lens for elongating a laser spot on the workpieces
JP4313322B2 (ja) * 2005-02-03 2009-08-12 株式会社レイテックス 欠陥粒子測定装置および欠陥粒子測定方法
JP2007024737A (ja) 2005-07-20 2007-02-01 Hitachi High-Technologies Corp 半導体の欠陥検査装置及びその方法
JP4785041B2 (ja) * 2005-10-18 2011-10-05 古河電気工業株式会社 被測定線状体の外径測定方法
JP2007304044A (ja) * 2006-05-15 2007-11-22 Sysmex Corp 粒子画像分析装置
JP4945181B2 (ja) * 2006-07-12 2012-06-06 株式会社日立ハイテクノロジーズ 表面検査方法および表面検査装置
JP4905029B2 (ja) * 2006-09-28 2012-03-28 住友金属鉱山株式会社 光散乱観察装置
JP4911509B2 (ja) 2007-04-03 2012-04-04 三洋電機株式会社 電解コンデンサおよびその製造方法
JP5178079B2 (ja) 2007-07-23 2013-04-10 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
US8154724B2 (en) 2007-12-04 2012-04-10 Particle Measuring Systems, Inc. Two-dimensional optical imaging methods and systems for particle detection
JP5308321B2 (ja) * 2009-12-14 2013-10-09 株式会社日立ハイテクノロジーズ ディスクの表面欠陥検査方法および検査装置
MX2012009546A (es) 2010-02-17 2012-09-12 Dow Global Technologies Llc Sistema de deteccion de defecto de filtro y membrana.
EP2567202B1 (de) * 2010-03-23 2022-12-07 Ophir Optronics Solutions Ltd. Messgerät zur messung von laserstrahlen mit strahlstreuung
CA2813354A1 (en) 2010-10-01 2012-04-05 Dow Global Technologies Llc System and method for analyzing pore sizes of substrates
US20150036121A1 (en) * 2011-07-05 2015-02-05 Boehringer Ingelheim Microparts Gmbh Method for Measuring the Scattered Light of Particles in a Medium
JP6309896B2 (ja) 2011-12-01 2018-04-11 ピー.エム.エル. − パーティクルズ モニタリング テクノロジーズ リミテッド 粒径及び濃度測定のための検出スキーム
CN105218689A (zh) * 2015-11-06 2016-01-06 河南工业大学 一种激光处理制备变性淀粉的装置
FR3062209B1 (fr) * 2017-01-25 2021-08-27 Commissariat Energie Atomique Detecteur optique de particules
EP3580550A1 (de) * 2017-02-10 2019-12-18 Amgen Inc. Bildgebungssystem zum zählen und klassifizieren von partikeln in flüssigkeitsgefüllten gefässen
CN111247418A (zh) 2017-10-26 2020-06-05 粒子监测系统有限公司 粒子测量系统和方法
JP7017133B2 (ja) * 2018-09-26 2022-02-08 株式会社Sumco 欠陥評価装置の調整状態評価方法及び調整方法
US11016024B2 (en) * 2019-02-19 2021-05-25 Kla Corporation Air scattering standard for light scattering based optical instruments and tools
US10514331B1 (en) * 2019-03-23 2019-12-24 Horiba Instruments Incorporated Method for determining the size of nanoparticles in a colloid
JP2022529213A (ja) 2019-04-25 2022-06-20 パーティクル・メージャーリング・システムズ・インコーポレーテッド 軸上粒子検出及び/又は差分検出のための粒子検出システム及び方法

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Also Published As

Publication number Publication date
EP0562630A1 (de) 1993-09-29
EP0562630B1 (de) 1997-10-01
JPH05273110A (ja) 1993-10-22
US5471298A (en) 1995-11-28
JP2722362B2 (ja) 1998-03-04
DE69314205D1 (de) 1997-11-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: RAYTEX CORP., TAMA, TOKIO, JP