DE69313150D1 - Zusammensetzung einer flüssigen Beschichtung für die Herstellung einer isolierenden Schicht eines Flüssigkristallanzeigeelements - Google Patents

Zusammensetzung einer flüssigen Beschichtung für die Herstellung einer isolierenden Schicht eines Flüssigkristallanzeigeelements

Info

Publication number
DE69313150D1
DE69313150D1 DE69313150T DE69313150T DE69313150D1 DE 69313150 D1 DE69313150 D1 DE 69313150D1 DE 69313150 T DE69313150 T DE 69313150T DE 69313150 T DE69313150 T DE 69313150T DE 69313150 D1 DE69313150 D1 DE 69313150D1
Authority
DE
Germany
Prior art keywords
producing
insulating layer
crystal display
coating composition
display element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69313150T
Other languages
English (en)
Other versions
DE69313150T2 (de
Inventor
Tatsuya Nogami
Rie Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of DE69313150D1 publication Critical patent/DE69313150D1/de
Application granted granted Critical
Publication of DE69313150T2 publication Critical patent/DE69313150T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Paints Or Removers (AREA)
  • Liquid Crystal (AREA)
  • Inorganic Insulating Materials (AREA)
DE69313150T 1992-01-14 1993-01-13 Zusammensetzung einer flüssigen Beschichtung für die Herstellung einer isolierenden Schicht eines Flüssigkristallanzeigeelements Expired - Fee Related DE69313150T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04004961A JP3127542B2 (ja) 1992-01-14 1992-01-14 液晶表示素子絶縁被膜形成用塗布液

Publications (2)

Publication Number Publication Date
DE69313150D1 true DE69313150D1 (de) 1997-09-25
DE69313150T2 DE69313150T2 (de) 1998-02-05

Family

ID=11598187

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69313150T Expired - Fee Related DE69313150T2 (de) 1992-01-14 1993-01-13 Zusammensetzung einer flüssigen Beschichtung für die Herstellung einer isolierenden Schicht eines Flüssigkristallanzeigeelements

Country Status (7)

Country Link
US (1) US5384356A (de)
EP (1) EP0552131B1 (de)
JP (1) JP3127542B2 (de)
KR (1) KR100256918B1 (de)
CA (1) CA2087306A1 (de)
DE (1) DE69313150T2 (de)
TW (1) TW215103B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3817749B2 (ja) * 1994-03-17 2006-09-06 日産化学工業株式会社 紫外線照射によるシリカ含有無機酸化物被膜のパターン形成用コーティング剤及びパターン形成方法
DE69502709T2 (de) * 1994-10-18 1998-12-24 Philips Electronics Nv Verfahren und herstellung einer dünnen silizium-oxid-schicht
TW397927B (en) * 1996-02-16 2000-07-11 Nissan Chemical Ind Ltd Process for forming a liquid crystal alignment film
US6057038A (en) 1996-08-02 2000-05-02 Sharp Kabushiki Kaisha Substrate for use in display element, method of manufacturing the same, and apparatus for manufacturing the same
KR100234170B1 (ko) 1996-12-10 2000-01-15 손욱 투명도전성 박막 형성용 조성물, 이를 이용한 투명도전성 박막의 제조방법 및 표면도전성 물품
JP5354161B2 (ja) * 2008-10-17 2013-11-27 Ｊｓｒ株式会社 液晶配向剤および液晶表示素子
CN103443750B (zh) * 2011-01-20 2017-02-15 日产化学工业株式会社 触摸屏用涂布组合物、涂膜及触摸屏
JP6075292B2 (ja) * 2011-10-31 2017-02-08 日産化学工業株式会社 金属酸化物被膜用塗布液の製造方法、金属酸化物被膜用塗布液及び金属酸化物被膜
KR20150064152A (ko) * 2012-10-03 2015-06-10 닛산 가가쿠 고교 가부시키 가이샤 미세 도포 가능한 무기 산화물 피막 형성용 도포액 및 미세 무기 산화물 피막의 제조 방법
CN106536651B (zh) * 2014-05-29 2019-12-20 日产化学工业株式会社 氧化铝基板或铝基板用的密合覆膜形成剂
GB2570002B (en) * 2018-01-09 2021-12-08 Nottingham Rehab Ltd Bedrail
GB2584421B (en) * 2019-05-24 2023-05-17 Nottingham Rehab Ltd Bedrail

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5510180B2 (de) * 1974-12-04 1980-03-14
DE2722900C3 (de) * 1977-05-20 1979-11-08 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung einer eine Flüssigkristallschicht homöotrop orientierenden, Siliciumoxid enthaltenden Schicht
US4476281A (en) * 1978-11-30 1984-10-09 General Electric Company Silicone resin coating composition
US4368235A (en) * 1980-01-18 1983-01-11 General Electric Co. Silicone resin coating composition
US4499224A (en) * 1984-01-20 1985-02-12 General Electric Company Upgrading silicone resin coating compositions
JP2530436B2 (ja) * 1986-09-18 1996-09-04 住友化学工業株式会社 コ−テイング組成物
JP2729373B2 (ja) * 1987-01-07 1998-03-18 東京応化工業 株式会社 金属酸化膜形成用塗布液
DE3704518A1 (de) * 1987-02-13 1988-08-25 Hoechst Ag Beschichtungsloesung und verfahren zur erzeugung glasartiger schichten

Also Published As

Publication number Publication date
US5384356A (en) 1995-01-24
TW215103B (de) 1993-10-21
EP0552131B1 (de) 1997-08-20
CA2087306A1 (en) 1993-07-15
KR100256918B1 (ko) 2000-05-15
EP0552131A1 (de) 1993-07-21
JPH05188363A (ja) 1993-07-30
DE69313150T2 (de) 1998-02-05
JP3127542B2 (ja) 2001-01-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee