DE69310950T2 - Verfahren zur Herstellung eines wässrigen Kieselsäuresols hoher Reinheit - Google Patents

Verfahren zur Herstellung eines wässrigen Kieselsäuresols hoher Reinheit

Info

Publication number
DE69310950T2
DE69310950T2 DE1993610950 DE69310950T DE69310950T2 DE 69310950 T2 DE69310950 T2 DE 69310950T2 DE 1993610950 DE1993610950 DE 1993610950 DE 69310950 T DE69310950 T DE 69310950T DE 69310950 T2 DE69310950 T2 DE 69310950T2
Authority
DE
Germany
Prior art keywords
preparation
high purity
silica sol
aqueous silica
purity aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1993610950
Other languages
English (en)
Other versions
DE69310950D1 (de
Inventor
Yoshitane Watanabe
Mikio Ando
Isao Yogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Application granted granted Critical
Publication of DE69310950D1 publication Critical patent/DE69310950D1/de
Publication of DE69310950T2 publication Critical patent/DE69310950T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
DE1993610950 1992-02-27 1993-02-01 Verfahren zur Herstellung eines wässrigen Kieselsäuresols hoher Reinheit Expired - Fee Related DE69310950T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84242392A 1992-02-27 1992-02-27

Publications (2)

Publication Number Publication Date
DE69310950D1 DE69310950D1 (de) 1997-07-03
DE69310950T2 true DE69310950T2 (de) 1997-10-23

Family

ID=25287257

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1993610950 Expired - Fee Related DE69310950T2 (de) 1992-02-27 1993-02-01 Verfahren zur Herstellung eines wässrigen Kieselsäuresols hoher Reinheit

Country Status (3)

Country Link
EP (1) EP0557740B1 (de)
JP (1) JP3367132B2 (de)
DE (1) DE69310950T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11130418A (ja) * 1997-10-29 1999-05-18 Clariant Japan Kk コロイダルシリカからのナトリウムイオンの除去方法
KR100349632B1 (ko) * 2000-08-04 2002-08-24 주식회사영일화성 실리카졸의 제조방법
JP4852302B2 (ja) 2004-12-01 2012-01-11 信越半導体株式会社 研磨剤の製造方法及びそれにより製造された研磨剤並びにシリコンウエーハの製造方法
US8658278B2 (en) 2005-08-31 2014-02-25 Mitsubishi Plastics, Inc. Gas barrier multilayer film
US20090022981A1 (en) 2005-09-20 2009-01-22 Mitsubishi Plastics, Inc. Laminated film having gas barrier characteristics
CN100363256C (zh) * 2006-05-31 2008-01-23 河北工业大学 超大规模集成电路专用纳米硅溶胶的稳定方法
CN100363255C (zh) * 2006-05-31 2008-01-23 河北工业大学 超大规模集成电路专用纳米硅溶胶的纯化方法
KR100894795B1 (ko) * 2007-06-26 2009-04-22 한국산업기술평가원(관리부서:요업기술원) 금속 규소로부터 직접산화법에 의한 콜로이달 실리카의제조방법
AU2009299921A1 (en) * 2008-09-30 2010-04-08 Evonik Degussa Gmbh Production of solar-grade silicon from silicon dioxide
JP5356209B2 (ja) * 2009-12-25 2013-12-04 日揮触媒化成株式会社 有機溶媒分散高濃度珪酸液
CN102304723A (zh) * 2011-09-20 2012-01-04 福建师范大学 一种基于阴阳离子交换膜与双极膜构成的三膜四室无氯产碱电解槽
TWI549911B (zh) 2011-12-28 2016-09-21 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
CN102583406B (zh) * 2012-01-19 2014-03-19 深圳市力合材料有限公司 一种高纯硅溶胶的纯化方法
JP6251970B2 (ja) 2012-03-30 2017-12-27 三菱ケミカル株式会社 ガスバリア性フィルム及びその製造方法、並びにガスバリア性積層体
JP6131570B2 (ja) 2012-11-07 2017-05-24 凸版印刷株式会社 ガスバリア用コーティング液、その製造方法、ガスバリア性積層体の製造方法、包装材料の製造方法および加熱殺菌用包装材料の製造方法
CN105263860B (zh) * 2013-05-20 2017-06-27 日产化学工业株式会社 硅溶胶以及含二氧化硅的环氧树脂组合物
WO2017069065A1 (ja) * 2015-10-20 2017-04-27 日産化学工業株式会社 精製された珪酸水溶液の製造方法
KR102141829B1 (ko) * 2018-09-12 2020-08-07 주식회사 삼에스코리아 합성석영분말의 제조방법
CN113603098A (zh) * 2021-07-05 2021-11-05 航天特种材料及工艺技术研究所 一种低成本制备高纯硅酸的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61158810A (ja) * 1984-12-28 1986-07-18 Shokubai Kasei Kogyo Kk 高純度シリカゾルの製造法
JP2508713B2 (ja) * 1987-05-15 1996-06-19 日産化学工業株式会社 高純度大粒子径シリカゾルの製造法
US5100581A (en) * 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol

Also Published As

Publication number Publication date
EP0557740A3 (en) 1993-11-18
EP0557740A2 (de) 1993-09-01
DE69310950D1 (de) 1997-07-03
EP0557740B1 (de) 1997-05-28
JP3367132B2 (ja) 2003-01-14
JPH0616414A (ja) 1994-01-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee