DE69302215T2 - Wafer Prüfstation mit Zusatzhaltetischen - Google Patents

Wafer Prüfstation mit Zusatzhaltetischen

Info

Publication number
DE69302215T2
DE69302215T2 DE69302215T DE69302215T DE69302215T2 DE 69302215 T2 DE69302215 T2 DE 69302215T2 DE 69302215 T DE69302215 T DE 69302215T DE 69302215 T DE69302215 T DE 69302215T DE 69302215 T2 DE69302215 T2 DE 69302215T2
Authority
DE
Germany
Prior art keywords
test station
wafer test
additional holding
holding tables
tables
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69302215T
Other languages
English (en)
Other versions
DE69302215D1 (de
Inventor
Warren K Harwood
Paul A Tervo
Richard H Warner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FormFactor Beaverton Inc
Original Assignee
Cascade Microtech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25397402&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69302215(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Cascade Microtech Inc filed Critical Cascade Microtech Inc
Application granted granted Critical
Publication of DE69302215D1 publication Critical patent/DE69302215D1/de
Publication of DE69302215T2 publication Critical patent/DE69302215T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06705Apparatus for holding or moving single probes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69302215T 1992-05-29 1993-05-20 Wafer Prüfstation mit Zusatzhaltetischen Expired - Fee Related DE69302215T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/890,970 US5237267A (en) 1992-05-29 1992-05-29 Wafer probe station having auxiliary chucks

Publications (2)

Publication Number Publication Date
DE69302215D1 DE69302215D1 (de) 1996-05-23
DE69302215T2 true DE69302215T2 (de) 1996-09-19

Family

ID=25397402

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69302215T Expired - Fee Related DE69302215T2 (de) 1992-05-29 1993-05-20 Wafer Prüfstation mit Zusatzhaltetischen

Country Status (4)

Country Link
US (1) US5237267A (de)
EP (1) EP0572180B1 (de)
JP (1) JP3338510B2 (de)
DE (1) DE69302215T2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6380751B2 (en) * 1992-06-11 2002-04-30 Cascade Microtech, Inc. Wafer probe station having environment control enclosure
US5345170A (en) * 1992-06-11 1994-09-06 Cascade Microtech, Inc. Wafer probe station having integrated guarding, Kelvin connection and shielding systems
US5550482A (en) * 1993-07-20 1996-08-27 Tokyo Electron Kabushiki Kaisha Probe device
US5835997A (en) * 1995-03-28 1998-11-10 University Of South Florida Wafer shielding chamber for probe station
US5892367A (en) * 1995-10-23 1999-04-06 Mcms, Inc. Thermal box for a semiconductor test system
JP3172760B2 (ja) * 1997-03-07 2001-06-04 東京エレクトロン株式会社 バキュームコンタクタ
WO1999004276A1 (en) * 1997-07-15 1999-01-28 Wentworth Laboratories, Inc. Probe station with emi shielding
US6445202B1 (en) 1999-06-30 2002-09-03 Cascade Microtech, Inc. Probe station thermal chuck with shielding for capacitive current
US6914423B2 (en) * 2000-09-05 2005-07-05 Cascade Microtech, Inc. Probe station
US6965226B2 (en) 2000-09-05 2005-11-15 Cascade Microtech, Inc. Chuck for holding a device under test
US20020163632A1 (en) * 2001-05-02 2002-11-07 Ya-Chan Cheng Measuring system of a gas stream environment
DE10162004B4 (de) * 2001-12-18 2020-02-27 Zf Friedrichshafen Ag Prüfstand für Prüflinge
JP2004004169A (ja) * 2002-05-30 2004-01-08 Nikon Corp 顕微鏡照明装置及び顕微鏡装置
US6861856B2 (en) * 2002-12-13 2005-03-01 Cascade Microtech, Inc. Guarded tub enclosure
US7492172B2 (en) 2003-05-23 2009-02-17 Cascade Microtech, Inc. Chuck for holding a device under test
KR100536610B1 (ko) * 2003-08-29 2005-12-14 삼성전자주식회사 프로브 스테이션 교정 도구
US7250626B2 (en) 2003-10-22 2007-07-31 Cascade Microtech, Inc. Probe testing structure
US7187188B2 (en) 2003-12-24 2007-03-06 Cascade Microtech, Inc. Chuck with integrated wafer support
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
JP4209457B1 (ja) 2008-02-29 2009-01-14 三菱重工業株式会社 常温接合装置
JP4875678B2 (ja) * 2008-09-01 2012-02-15 三菱重工業株式会社 常温接合装置
JP4875676B2 (ja) * 2008-09-01 2012-02-15 三菱重工業株式会社 常温接合装置
US8319503B2 (en) 2008-11-24 2012-11-27 Cascade Microtech, Inc. Test apparatus for measuring a characteristic of a device under test
US11047795B2 (en) * 2019-06-03 2021-06-29 Formfactor, Inc. Calibration chucks for optical probe systems, optical probe systems including the calibration chucks, and methods of utilizing the optical probe systems

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3597081A (en) * 1967-11-02 1971-08-03 Continental Device Corp Vacuum masking system and method
US3710251A (en) * 1971-04-07 1973-01-09 Collins Radio Co Microelectric heat exchanger pedestal
US4755746A (en) * 1985-04-24 1988-07-05 Prometrix Corporation Apparatus and methods for semiconductor wafer testing
FR2641436A1 (de) * 1988-12-30 1990-07-06 Labo Electronique Physique
US5077523A (en) * 1989-11-03 1991-12-31 John H. Blanz Company, Inc. Cryogenic probe station having movable chuck accomodating variable thickness probe cards

Also Published As

Publication number Publication date
JPH0661319A (ja) 1994-03-04
EP0572180A1 (de) 1993-12-01
JP3338510B2 (ja) 2002-10-28
DE69302215D1 (de) 1996-05-23
US5237267A (en) 1993-08-17
EP0572180B1 (de) 1996-04-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: ZEITLER, VOLPERT, KANDLBINDER, 80539 MUENCHEN

8339 Ceased/non-payment of the annual fee