DE69231229T2 - Bestrahlungskopf für Stereolithografie - Google Patents

Bestrahlungskopf für Stereolithografie

Info

Publication number
DE69231229T2
DE69231229T2 DE69231229T DE69231229T DE69231229T2 DE 69231229 T2 DE69231229 T2 DE 69231229T2 DE 69231229 T DE69231229 T DE 69231229T DE 69231229 T DE69231229 T DE 69231229T DE 69231229 T2 DE69231229 T2 DE 69231229T2
Authority
DE
Germany
Prior art keywords
mirrors
exposure
stereolithography
exposure head
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69231229T
Other languages
German (de)
English (en)
Other versions
DE69231229D1 (de
Inventor
Larry D. Mitcham
William E. Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Application granted granted Critical
Publication of DE69231229D1 publication Critical patent/DE69231229D1/de
Publication of DE69231229T2 publication Critical patent/DE69231229T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70416—2.5D lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
DE69231229T 1991-12-30 1992-12-22 Bestrahlungskopf für Stereolithografie Expired - Fee Related DE69231229T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/814,859 US5247180A (en) 1991-12-30 1991-12-30 Stereolithographic apparatus and method of use

Publications (2)

Publication Number Publication Date
DE69231229D1 DE69231229D1 (de) 2000-08-10
DE69231229T2 true DE69231229T2 (de) 2001-02-15

Family

ID=25216187

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69231229T Expired - Fee Related DE69231229T2 (de) 1991-12-30 1992-12-22 Bestrahlungskopf für Stereolithografie
DE69218572T Expired - Fee Related DE69218572T2 (de) 1991-12-30 1992-12-22 Stereolithographische Vorrichtung und Verfahren zur Herstellung eines Modells

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69218572T Expired - Fee Related DE69218572T2 (de) 1991-12-30 1992-12-22 Stereolithographische Vorrichtung und Verfahren zur Herstellung eines Modells

Country Status (7)

Country Link
US (1) US5247180A (enExample)
EP (2) EP0549993B1 (enExample)
JP (1) JPH0639928A (enExample)
KR (1) KR100252458B1 (enExample)
CA (1) CA2086157A1 (enExample)
DE (2) DE69231229T2 (enExample)
TW (1) TW214584B (enExample)

Families Citing this family (177)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
WO1995015841A1 (fr) * 1992-06-05 1995-06-15 Finab Limited Machine de fabrication d'objets par photopolymerisation selective de liquides ou poudres par couches
US6044705A (en) * 1993-10-18 2000-04-04 Xros, Inc. Micromachined members coupled for relative rotation by torsion bars
US6467345B1 (en) 1993-10-18 2002-10-22 Xros, Inc. Method of operating micromachined members coupled for relative rotation
AU2908895A (en) * 1994-06-27 1996-01-19 Hercules Incorporated Programmable mask for producing three-dimensional objects
US5573721A (en) * 1995-02-16 1996-11-12 Hercules Incorporated Use of a support liquid to manufacture three-dimensional objects
US5841579A (en) 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
GB2315700A (en) * 1996-07-27 1998-02-11 Rupert Charles David Young Use of dynamic masks for object manufacture
US7332537B2 (en) 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
JP2818934B2 (ja) * 1996-12-02 1998-10-30 マツダ株式会社 層状給気エンジン
DE59608890D1 (de) * 1996-12-31 2002-04-18 Friedrich Luellau Verfahren zur ansteuerung einer belichtungsvorrichtung
US6051179A (en) * 1997-03-19 2000-04-18 Replicator Systems, Inc. Apparatus and method for production of three-dimensional models by spatial light modulator
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
US6088102A (en) 1997-10-31 2000-07-11 Silicon Light Machines Display apparatus including grating light-valve array and interferometric optical system
EP2332645A1 (en) * 1998-02-11 2011-06-15 The University Of Houston Apparatus for chemical and biochemical reactions using photo-generated reagents
US20040035690A1 (en) * 1998-02-11 2004-02-26 The Regents Of The University Of Michigan Method and apparatus for chemical and biochemical reactions using photo-generated reagents
US6271808B1 (en) 1998-06-05 2001-08-07 Silicon Light Machines Stereo head mounted display using a single display device
US6101036A (en) 1998-06-23 2000-08-08 Silicon Light Machines Embossed diffraction grating alone and in combination with changeable image display
US6130770A (en) 1998-06-23 2000-10-10 Silicon Light Machines Electron gun activated grating light valve
US6215579B1 (en) 1998-06-24 2001-04-10 Silicon Light Machines Method and apparatus for modulating an incident light beam for forming a two-dimensional image
US6303986B1 (en) 1998-07-29 2001-10-16 Silicon Light Machines Method of and apparatus for sealing an hermetic lid to a semiconductor die
US6872984B1 (en) 1998-07-29 2005-03-29 Silicon Light Machines Corporation Method of sealing a hermetic lid to a semiconductor die at an angle
AU771238B2 (en) * 1998-08-28 2004-03-18 Febit Ferrarius Biotechnology Gmbh Method and device for producing and/or analyzing biochemical reaction supporting materials
US7620527B1 (en) 1999-05-10 2009-11-17 Johan Leo Alfons Gielis Method and apparatus for synthesizing and analyzing patterns utilizing novel “super-formula” operator
US6626949B1 (en) 1999-07-14 2003-09-30 Biopro, Inc. Diamond coated joint implant
DE19944760A1 (de) * 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Vorrichtung und Verfahren zur Kompensation von Inhomogenitäten bei Abbildungssystemen
WO2001034371A2 (en) 1999-11-05 2001-05-17 Z Corporation Material systems and methods of three-dimensional printing
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
US6956878B1 (en) 2000-02-07 2005-10-18 Silicon Light Machines Corporation Method and apparatus for reducing laser speckle using polarization averaging
US6369845B1 (en) 2000-03-14 2002-04-09 Kubota Research Associates Inc. Exposure system for recording media
US6816182B2 (en) * 2000-03-14 2004-11-09 Masanori Kubota Radiation welding and imaging apparatus and method for using the same
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
US6500378B1 (en) 2000-07-13 2002-12-31 Eom Technologies, L.L.C. Method and apparatus for creating three-dimensional objects by cross-sectional lithography
DE10051396A1 (de) * 2000-10-17 2002-04-18 Febit Ferrarius Biotech Gmbh Verfahren und Vorrichtung zur integrierten Synthese und Analytbestimmung an einem Träger
US7177081B2 (en) 2001-03-08 2007-02-13 Silicon Light Machines Corporation High contrast grating light valve type device
US20020160427A1 (en) * 2001-04-27 2002-10-31 Febit Ag Methods and apparatuses for electronic determination of analytes
US6865346B1 (en) 2001-06-05 2005-03-08 Silicon Light Machines Corporation Fiber optic transceiver
US6782205B2 (en) 2001-06-25 2004-08-24 Silicon Light Machines Method and apparatus for dynamic equalization in wavelength division multiplexing
US6747781B2 (en) 2001-06-25 2004-06-08 Silicon Light Machines, Inc. Method, apparatus, and diffuser for reducing laser speckle
DE10130968B4 (de) * 2001-06-27 2009-08-20 Envisiontec Gmbh Beschichtetes Polymermaterial, dessen Verwendung sowie Verfahren zu dessen Herstellung
US6829092B2 (en) 2001-08-15 2004-12-07 Silicon Light Machines, Inc. Blazed grating light valve
US6930364B2 (en) 2001-09-13 2005-08-16 Silicon Light Machines Corporation Microelectronic mechanical system and methods
US6956995B1 (en) 2001-11-09 2005-10-18 Silicon Light Machines Corporation Optical communication arrangement
US6800238B1 (en) 2002-01-15 2004-10-05 Silicon Light Machines, Inc. Method for domain patterning in low coercive field ferroelectrics
CA2481048A1 (en) * 2002-04-09 2003-10-23 Dicon A/S Light modulating engine
US6855482B2 (en) * 2002-04-09 2005-02-15 Day International, Inc. Liquid transfer articles and method for producing the same using digital imaging photopolymerization
US6894712B2 (en) * 2002-04-10 2005-05-17 Fuji Photo Film Co., Ltd. Exposure head, exposure apparatus, and application thereof
US6767751B2 (en) 2002-05-28 2004-07-27 Silicon Light Machines, Inc. Integrated driver process flow
US7054515B1 (en) 2002-05-30 2006-05-30 Silicon Light Machines Corporation Diffractive light modulator-based dynamic equalizer with integrated spectral monitor
US6822797B1 (en) 2002-05-31 2004-11-23 Silicon Light Machines, Inc. Light modulator structure for producing high-contrast operation using zero-order light
US6829258B1 (en) 2002-06-26 2004-12-07 Silicon Light Machines, Inc. Rapidly tunable external cavity laser
US6813059B2 (en) 2002-06-28 2004-11-02 Silicon Light Machines, Inc. Reduced formation of asperities in contact micro-structures
US6714337B1 (en) 2002-06-28 2004-03-30 Silicon Light Machines Method and device for modulating a light beam and having an improved gamma response
US6908201B2 (en) 2002-06-28 2005-06-21 Silicon Light Machines Corporation Micro-support structures
US6801354B1 (en) 2002-08-20 2004-10-05 Silicon Light Machines, Inc. 2-D diffraction grating for substantially eliminating polarization dependent losses
US7057795B2 (en) 2002-08-20 2006-06-06 Silicon Light Machines Corporation Micro-structures with individually addressable ribbon pairs
US6712480B1 (en) 2002-09-27 2004-03-30 Silicon Light Machines Controlled curvature of stressed micro-structures
US6928207B1 (en) 2002-12-12 2005-08-09 Silicon Light Machines Corporation Apparatus for selectively blocking WDM channels
US7057819B1 (en) 2002-12-17 2006-06-06 Silicon Light Machines Corporation High contrast tilting ribbon blazed grating
US6987600B1 (en) 2002-12-17 2006-01-17 Silicon Light Machines Corporation Arbitrary phase profile for better equalization in dynamic gain equalizer
US6934070B1 (en) 2002-12-18 2005-08-23 Silicon Light Machines Corporation Chirped optical MEM device
US6927891B1 (en) 2002-12-23 2005-08-09 Silicon Light Machines Corporation Tilt-able grating plane for improved crosstalk in 1×N blaze switches
US7068372B1 (en) 2003-01-28 2006-06-27 Silicon Light Machines Corporation MEMS interferometer-based reconfigurable optical add-and-drop multiplexor
US7286764B1 (en) 2003-02-03 2007-10-23 Silicon Light Machines Corporation Reconfigurable modulator-based optical add-and-drop multiplexer
US6947613B1 (en) 2003-02-11 2005-09-20 Silicon Light Machines Corporation Wavelength selective switch and equalizer
US6922272B1 (en) 2003-02-14 2005-07-26 Silicon Light Machines Corporation Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices
US7391973B1 (en) 2003-02-28 2008-06-24 Silicon Light Machines Corporation Two-stage gain equalizer
US6922273B1 (en) 2003-02-28 2005-07-26 Silicon Light Machines Corporation PDL mitigation structure for diffractive MEMS and gratings
US7027202B1 (en) 2003-02-28 2006-04-11 Silicon Light Machines Corp Silicon substrate as a light modulator sacrificial layer
US6829077B1 (en) 2003-02-28 2004-12-07 Silicon Light Machines, Inc. Diffractive light modulator with dynamically rotatable diffraction plane
US6806997B1 (en) 2003-02-28 2004-10-19 Silicon Light Machines, Inc. Patterned diffractive light modulator ribbon for PDL reduction
US7042611B1 (en) 2003-03-03 2006-05-09 Silicon Light Machines Corporation Pre-deflected bias ribbons
EP2269808B1 (en) 2003-05-21 2017-03-22 3D Systems Incorporated Thermoplastic powder material system for appearance models from 3D printing systems
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
US7605832B2 (en) * 2004-03-22 2009-10-20 Thomson Licensing Method and apparatus for improving images provided by spatial light modulated (SLM) display systems
US7250632B2 (en) * 2004-04-06 2007-07-31 E. I. Du Pont De Nemours And Company Electronic devices having a layer overlying an edge of a different layer and a process for forming the same
DE102004022606A1 (de) * 2004-05-07 2005-12-15 Envisiontec Gmbh Verfahren zur Herstellung eines dreidimensionalen Objekts mit verbesserter Trennung ausgehärteter Materialschichten von einer Bauebene
EP1894705B1 (de) 2004-05-10 2010-08-25 Envisiontec GmbH Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift
DE102004022961B4 (de) * 2004-05-10 2008-11-20 Envisiontec Gmbh Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift
US7758799B2 (en) * 2005-04-01 2010-07-20 3D Systems, Inc. Edge smoothness with low resolution projected images for use in solid imaging
WO2006122564A1 (en) * 2005-05-20 2006-11-23 Huntsman Advanced Materials (Switzerland) Gmbh Rapid prototyping apparatus and method of rapid prototyping
CN100340844C (zh) * 2005-12-07 2007-10-03 西安交通大学 一种用于光固化快速成型工艺的树脂液位检测方法
DE102006019963B4 (de) 2006-04-28 2023-12-07 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung
DE102006019964C5 (de) * 2006-04-28 2021-08-26 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts mittels Maskenbelichtung
US7931460B2 (en) * 2006-05-03 2011-04-26 3D Systems, Inc. Material delivery system for use in solid imaging
US7467939B2 (en) * 2006-05-03 2008-12-23 3D Systems, Inc. Material delivery tension and tracking system for use in solid imaging
US7636610B2 (en) * 2006-07-19 2009-12-22 Envisiontec Gmbh Method and device for producing a three-dimensional object, and computer and data carrier useful therefor
US9415544B2 (en) * 2006-08-29 2016-08-16 3D Systems, Inc. Wall smoothness, feature accuracy and resolution in projected images via exposure levels in solid imaging
US7892474B2 (en) 2006-11-15 2011-02-22 Envisiontec Gmbh Continuous generative process for producing a three-dimensional object
EP2089215B1 (en) 2006-12-08 2015-02-18 3D Systems Incorporated Three dimensional printing material system
CN101616785B (zh) 2007-01-10 2014-01-08 3D系统公司 具有改进的颜色、制品性能和易用性的三维印刷材料体系
US20080181977A1 (en) * 2007-01-17 2008-07-31 Sperry Charles R Brush assembly for removal of excess uncured build material
US8221671B2 (en) * 2007-01-17 2012-07-17 3D Systems, Inc. Imager and method for consistent repeatable alignment in a solid imaging apparatus
US20080226346A1 (en) * 2007-01-17 2008-09-18 3D Systems, Inc. Inkjet Solid Imaging System and Method for Solid Imaging
US20080170112A1 (en) * 2007-01-17 2008-07-17 Hull Charles W Build pad, solid image build, and method for building build supports
US7706910B2 (en) * 2007-01-17 2010-04-27 3D Systems, Inc. Imager assembly and method for solid imaging
US8003039B2 (en) * 2007-01-17 2011-08-23 3D Systems, Inc. Method for tilting solid image build platform for reducing air entrainment and for build release
US7614866B2 (en) * 2007-01-17 2009-11-10 3D Systems, Inc. Solid imaging apparatus and method
CN101626881B (zh) * 2007-01-17 2012-11-14 3D系统公司 用于固体成像的成像器组件与方法
US7771183B2 (en) * 2007-01-17 2010-08-10 3D Systems, Inc. Solid imaging system with removal of excess uncured build material
US8105066B2 (en) * 2007-01-17 2012-01-31 3D Systems, Inc. Cartridge for solid imaging apparatus and method
US7731887B2 (en) * 2007-01-17 2010-06-08 3D Systems, Inc. Method for removing excess uncured build material in solid imaging
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
US20100140849A1 (en) * 2007-03-22 2010-06-10 Stratasys, Inc. Extrusion-based layered deposition systems using selective radiation exposure
ATE553910T1 (de) 2007-07-04 2012-05-15 Envisiontec Gmbh Verfahren und vorrichtung zum herstellen eines dreidimensionalen objekts
EP2052693B2 (en) * 2007-10-26 2021-02-17 Envisiontec GmbH Process and freeform fabrication system for producing a three-dimensional object
DE102008009003A1 (de) 2008-02-13 2009-08-20 Dreve Prodimed Gmbh Vorrichtung und Verfahren zur generativen Herstellung von 3 dimensionalen Objekten auf der Basis eines Multiphasensystems
GB0816258D0 (en) * 2008-09-05 2008-10-15 Ulive Entpr Ltd Process
US8048359B2 (en) * 2008-10-20 2011-11-01 3D Systems, Inc. Compensation of actinic radiation intensity profiles for three-dimensional modelers
US8372330B2 (en) * 2009-10-19 2013-02-12 Global Filtration Systems Resin solidification substrate and assembly
GB201016169D0 (en) 2010-09-27 2010-11-10 Materialise Nv Method for reducing differential shrinkage in stereolithography
CN103180125B (zh) 2010-10-27 2017-03-01 雷兹公司 用于制作三维物体的工艺和设备
US20140093690A1 (en) * 2011-05-31 2014-04-03 Nanoptics, Incorporated Method and apparatus for lithographic manufacture of multi-component polymeric fiber plates
US8691476B2 (en) 2011-12-16 2014-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. EUV mask and method for forming the same
US9636873B2 (en) 2012-05-03 2017-05-02 B9Creations, LLC Solid image apparatus with improved part separation from the image plate
US9716319B2 (en) 2012-09-24 2017-07-25 The Antenna Company International N.V. Lens antenna, method for manufacturing and using such an antenna, and antenna system
US9034237B2 (en) 2012-09-25 2015-05-19 3D Systems, Inc. Solid imaging systems, components thereof, and methods of solid imaging
FR3000698B1 (fr) * 2013-01-09 2015-02-06 Phidias Technologies Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree
EP3203318A1 (en) 2013-02-12 2017-08-09 CARBON3D, Inc. Continuous liquid interphase printing
US9498920B2 (en) 2013-02-12 2016-11-22 Carbon3D, Inc. Method and apparatus for three-dimensional fabrication
CN105122136B (zh) 2013-02-12 2020-03-24 卡本有限公司 三维制造的方法和设备
EP2969489B1 (en) 2013-03-12 2019-04-24 Orange Maker Llc 3d printing using spiral buildup
US12083744B2 (en) 2013-03-12 2024-09-10 Orange Maker, Llc Security features and anti-counterfeiting and part tracking system for 3D printed parts
US11141908B2 (en) * 2013-03-12 2021-10-12 Orange Maker LLC 3D printing using rotational components and improved light sources
US10150247B2 (en) * 2013-03-12 2018-12-11 Orange Maker LLC 3D printing using spiral buildup and high viscosity build materials
GB201310398D0 (en) 2013-06-11 2013-07-24 Renishaw Plc Additive manufacturing apparatus and method
US10335901B2 (en) * 2013-06-10 2019-07-02 Renishaw Plc Selective laser solidification apparatus and method
US11260208B2 (en) 2018-06-08 2022-03-01 Acclarent, Inc. Dilation catheter with removable bulb tip
US12151073B2 (en) 2013-08-14 2024-11-26 Carbon, Inc. Continuous liquid interphase printing
US9360757B2 (en) 2013-08-14 2016-06-07 Carbon3D, Inc. Continuous liquid interphase printing
US9527244B2 (en) 2014-02-10 2016-12-27 Global Filtration Systems Apparatus and method for forming three-dimensional objects from solidifiable paste
WO2015131250A1 (en) * 2014-03-07 2015-09-11 Sgat Pty Ltd Three dimensional printer
KR20160138490A (ko) 2014-03-26 2016-12-05 더 안테나 컴퍼니 인터내셔널 엔.브이. 패치안테나, 이와 같은 안테나 제조 및 사용방법, 및 안테나 시스템
WO2015160252A1 (en) * 2014-04-15 2015-10-22 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Exposure head, exposure apparatus and method of operating an exposure head
ES2711849T3 (es) 2014-06-20 2019-05-07 Carbon Inc Impresión tridimensional con alimentación recíproca de líquido polimerizable
WO2015195909A1 (en) * 2014-06-20 2015-12-23 Carbon3D, Inc. Three-dimensional printing using tiled light engines
EP3158398B1 (en) 2014-06-23 2024-09-04 Carbon, Inc. Methods of producing polyurethane three-dimensional objects from materials having multiple mechanisms of hardening
GB201505458D0 (en) 2015-03-30 2015-05-13 Renishaw Plc Additive manufacturing apparatus and methods
DE102015208852A1 (de) 2015-05-13 2016-11-17 Nanoscribe Gmbh Verfahren zum Herstellen einer dreidimensionalen Struktur
KR20160144837A (ko) * 2015-06-09 2016-12-19 오스템임플란트 주식회사 3차원 프린터 및 그의 작동방법
DE102015008863A1 (de) 2015-07-14 2017-01-19 BXG tech GmbH i. Gr. Verfahren und Vorrichtung zum 3D-Drucken mit mehreren Bauräumen oder einem erweiterten Bauraum
US10336056B2 (en) 2015-08-31 2019-07-02 Colorado School Of Mines Hybrid additive manufacturing method
KR101725658B1 (ko) * 2015-09-08 2017-04-27 임은석 3차원 프린터 및 3차원 객체 제작 방법
US10792868B2 (en) 2015-09-09 2020-10-06 Carbon, Inc. Method and apparatus for three-dimensional fabrication
WO2017054859A1 (en) * 2015-09-30 2017-04-06 Hewlett-Packard Development Company, L.P. Build material containers
US12064919B2 (en) 2015-10-15 2024-08-20 Saint-Gobain Ceramics & Plastics, Inc. Method for forming a three dimensional body from a mixture with a high content of solid particles
TWI674964B (zh) * 2015-10-22 2019-10-21 揚明光學股份有限公司 立體列印裝置及立體列印方法
EP3181357B1 (en) 2015-12-15 2018-10-10 Agfa Nv Additive manufacturing method using dynamic light projection for flexographic print masters
AT518101B1 (de) * 2015-12-17 2018-05-15 Stadlmann Klaus Verfahren zum Erzeugen eines dreidimensionalen Gegenstands
US10737479B2 (en) 2017-01-12 2020-08-11 Global Filtration Systems Method of making three-dimensional objects using both continuous and discontinuous solidification
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
DE102017110241A1 (de) 2017-05-11 2018-11-15 Nanoscribe Gmbh Verfahren zum Erzeugen einer 3D-Struktur mittels Laserlithographie sowie Computerprogrammprodukt
US11919246B2 (en) 2017-07-11 2024-03-05 Daniel S. Clark 5D part growing machine with volumetric display technology
US10967578B2 (en) 2017-07-11 2021-04-06 Daniel S. Clark 5D part growing machine with volumetric display technology
JP6918199B2 (ja) 2017-07-21 2021-08-11 サン−ゴバン パフォーマンス プラスティックス コーポレイション ３次元物体を形成する方法
JP2021516180A (ja) * 2018-03-02 2021-07-01 フォームラブス, インコーポレーテッドFormlabs, Inc. 潜在性硬化樹脂および関連する方法
FI128627B (en) * 2018-06-28 2020-09-15 Planmeca Oy Stereolithography equipment provided with resin collection mechanism and method for operating said equipment
CN118003625A (zh) * 2019-01-24 2024-05-10 沃尔特·沃伊特 用于超高吞吐量增材制造的系统、方法及材料
JP7161628B2 (ja) 2019-02-28 2022-10-26 スリーディー システムズ インコーポレーテッド 高解像度三次元プリントシステム
US11707883B2 (en) 2020-11-20 2023-07-25 General Electric Company Foil interaction device for additive manufacturing
KR102378863B1 (ko) * 2020-12-28 2022-03-29 (주)유니젯 3d 프린터 카트리지 및 3d 프린터
US11865780B2 (en) 2021-02-26 2024-01-09 General Electric Company Accumalator assembly for additive manufacturing
US11951679B2 (en) 2021-06-16 2024-04-09 General Electric Company Additive manufacturing system
US11731367B2 (en) 2021-06-23 2023-08-22 General Electric Company Drive system for additive manufacturing
US11958249B2 (en) 2021-06-24 2024-04-16 General Electric Company Reclamation system for additive manufacturing
US11958250B2 (en) 2021-06-24 2024-04-16 General Electric Company Reclamation system for additive manufacturing
US11826950B2 (en) 2021-07-09 2023-11-28 General Electric Company Resin management system for additive manufacturing
US12370741B2 (en) 2021-08-13 2025-07-29 General Electric Company Material deposition assembly for additive manufacturing
US12296535B2 (en) 2021-08-24 2025-05-13 General Electric Company Attachment structure for additive manufacturing
US11813799B2 (en) 2021-09-01 2023-11-14 General Electric Company Control systems and methods for additive manufacturing
EP4249216A1 (en) 2022-03-23 2023-09-27 General Electric Company Systems and methods for additive manufacturing
WO2023205716A1 (en) 2022-04-22 2023-10-26 Carbon, Inc. Hollow dental molds configured for high throughput cleaning
WO2023220523A1 (en) 2022-05-09 2023-11-16 Carbon, Inc. Method for direct coloration of resins for additive manufacturing
US20240059022A1 (en) * 2022-08-18 2024-02-22 General Electric Company Systems and methods for additive manufacturing using pixel shifting
US12403654B2 (en) 2022-09-30 2025-09-02 General Electric Company Systems and methods for additive manufacturing
WO2024243041A1 (en) 2023-05-19 2024-11-28 Carbon, Inc. Hollow dental molds configured for high throughput cleaning

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL109511A (en) * 1987-12-23 1996-10-16 Cubital Ltd Three-dimensional modelling apparatus
WO1989009687A1 (en) * 1988-04-11 1989-10-19 Austral Asian Lasers Pty. Ltd. Laser based plastic model making workstation
US5059359A (en) * 1988-04-18 1991-10-22 3 D Systems, Inc. Methods and apparatus for production of three-dimensional objects by stereolithography
US5164128A (en) * 1988-04-18 1992-11-17 3D Systems, Inc. Methods for curing partially polymerized parts
JPH0340693A (ja) * 1989-02-27 1991-02-21 Texas Instr Inc <Ti> 可視ディスプレイシステム
US5011635A (en) * 1989-05-18 1991-04-30 Desoto, Inc. Stereolithographic method and apparatus in which a membrane separates phases
DE69131711T2 (de) * 1990-02-15 2000-06-21 3D Systems, Inc. Verfahren und apparat zur formung eines festen dreidimensionalen artikels aus einer flüssigkeit
CA2036695A1 (en) * 1990-03-01 1991-09-02 Brian Gregory Chapman Solid imaging apparatus and method with coating station
US5049901A (en) * 1990-07-02 1991-09-17 Creo Products Inc. Light modulator using large area light sources

Also Published As

Publication number Publication date
KR100252458B1 (ko) 2000-04-15
DE69218572T2 (de) 1997-11-13
EP0549993B1 (en) 1997-03-26
TW214584B (enExample) 1993-10-11
US5247180A (en) 1993-09-21
EP0676275B1 (en) 2000-07-05
DE69231229D1 (de) 2000-08-10
DE69218572D1 (de) 1997-04-30
CA2086157A1 (en) 1993-07-01
EP0676275A1 (en) 1995-10-11
EP0549993A1 (en) 1993-07-07
JPH0639928A (ja) 1994-02-15

Similar Documents

Publication Publication Date Title
DE69231229T2 (de) Bestrahlungskopf für Stereolithografie
DE3587656T2 (de) Stereolithographische Vorrichtung und Verfahren zur Herstellung von dreidimensionalen Gegenständen.
DE69811861T2 (de) Optisches herstellungsverfahren und - gerät
DE69220629T2 (de) Verfahren und Vorrichtung zur Herstellung eines Musters eines Aufzeichnungselementes
DE102004022961B4 (de) Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift
DE69220985T2 (de) Belichtungsapparat mit zwei Beleuchtungssystemen und diesen verwendendes Belichtungsverfahren
EP0467076B1 (de) Verfahren und Vorrichtung zur Herstellung von Mikrostrukturen auf einem lichtempfindlich beschichteten Substrat durch fokussierte Laserstrahlung
DE3933308A1 (de) Abtast- und wiederholungs-projektionslithographiesystem mit hoher aufloesung
DE4302418A1 (de) Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts
DE9319405U1 (de) Vorrichtung zur Herstellung eines dreidimensionalen Objekts (Modells) nach dem Prinzip der Photoverfestigung
DE69727016T2 (de) Belichtungsapparat
DE4313796C2 (de) Laserbearbeitungsvorrichtung
DE3926949A1 (de) Buehnenmechanismus fuer ein wafer-belichtungsgeraet
DE69024100T2 (de) Verfahren und Vorrichtung zur Aufrechterhaltung der gewünschten Belichtungswerte
EP3197249A1 (de) Direktbelichtungseinrichtung zur direktbelichtung von lötstopplacken in 2-dimensionaler, kurzzeittemperierter umgebung
DE2535561A1 (de) Vorrichtung zur erzeugung von mustern auf einem werkstueck
DE19716240C2 (de) Fotoplott-Verfahren und Anordnung zur Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger
DE4333620A1 (de) Anordnung und Verfahren zur Erzeugung von Dosisprofilen für die Herstellung von Oberflächenprofilen
DE102007047663A1 (de) Verfahren und Vorrichtung zur Herstellung periodischer Muster mittels Interferenz-Lithographie durch schrittweise vorgenommene Ausrichtung
DE102012011418A1 (de) Stereolithographie- System
DE2411508C2 (de) Vorrichtung zum Erzeugen von Masken für Mikroschaltkreise
DE60319087T2 (de) Lithographische Methode zur Herstellung einer Vorrichtung
WO2020058194A1 (de) Belichtungsvorrichtung für ein fotolithographieverfahren, baugruppe mit einer belichtungsvorrichtung sowie verfahren zur belichtung eines mit einem fotolack beschichteten substrats
DE102013021961A1 (de) Stereolithographie- System
DE19954365B4 (de) Verfahren zum bildweisen Bestrahlen eines Resists

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee