DE69222461T2 - Photostrukturierbare Beschichtungen auf Basis eines Wasserstoff-Silsesquioxanharzes - Google Patents

Photostrukturierbare Beschichtungen auf Basis eines Wasserstoff-Silsesquioxanharzes

Info

Publication number
DE69222461T2
DE69222461T2 DE69222461T DE69222461T DE69222461T2 DE 69222461 T2 DE69222461 T2 DE 69222461T2 DE 69222461 T DE69222461 T DE 69222461T DE 69222461 T DE69222461 T DE 69222461T DE 69222461 T2 DE69222461 T2 DE 69222461T2
Authority
DE
Germany
Prior art keywords
photostructurable
coatings based
hydrogen silsesquioxane
silsesquioxane resin
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69222461T
Other languages
English (en)
Other versions
DE69222461D1 (de
Inventor
Loren Andrew Haluska
Keith Winton Michael
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of DE69222461D1 publication Critical patent/DE69222461D1/de
Application granted granted Critical
Publication of DE69222461T2 publication Critical patent/DE69222461T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE69222461T 1991-04-22 1992-04-15 Photostrukturierbare Beschichtungen auf Basis eines Wasserstoff-Silsesquioxanharzes Expired - Fee Related DE69222461T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/688,418 US5238787A (en) 1991-04-22 1991-04-22 Photodelineable coatings from hydrogen silsesquioxane resin

Publications (2)

Publication Number Publication Date
DE69222461D1 DE69222461D1 (de) 1997-11-06
DE69222461T2 true DE69222461T2 (de) 1998-04-09

Family

ID=24764345

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69222461T Expired - Fee Related DE69222461T2 (de) 1991-04-22 1992-04-15 Photostrukturierbare Beschichtungen auf Basis eines Wasserstoff-Silsesquioxanharzes

Country Status (7)

Country Link
US (2) US5238787A (de)
EP (1) EP0510872B1 (de)
JP (1) JP2997124B2 (de)
KR (1) KR100214111B1 (de)
CA (1) CA2064971A1 (de)
DE (1) DE69222461T2 (de)
TW (1) TW223153B (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5631120A (en) * 1994-09-02 1997-05-20 Motorola, Inc. Method of forming a pattern with step features in a photopolymer
US5693455A (en) * 1994-09-02 1997-12-02 Motorola, Inc. Method for creating a pattern having step features in a photopolymer using a thermal mask
JP3499032B2 (ja) * 1995-02-02 2004-02-23 ダウ コーニング アジア株式会社 放射線硬化性組成物、その硬化方法及びパターン形成方法
US5609925A (en) * 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
US5733698A (en) * 1996-09-30 1998-03-31 Minnesota Mining And Manufacturing Company Release layer for photoreceptors
EP0857705B1 (de) * 1997-02-07 2002-07-31 Dow Corning Corporation Verfahren zur Herstellung von Überzügen auf Elektronikteilen
JP3415741B2 (ja) * 1997-03-31 2003-06-09 東レ・ダウコーニング・シリコーン株式会社 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
EP0881668A3 (de) 1997-05-28 2000-11-15 Dow Corning Toray Silicone Company, Ltd. Abscheidung eines elektrisch isolierenden Dünnfilms mit einer niedrigen Dielektrizitätskonstante
US5958630A (en) * 1997-12-30 1999-09-28 Kabushiki Kaisha Toshiba Phase shifting mask and method of manufacturing the same
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
DE19815978B4 (de) * 1998-04-09 2004-01-08 Forschungszentrum Karlsruhe Gmbh Verfahren zur Herstellung von Klein- und Mikroteilen aus Keramik
GB9812425D0 (en) 1998-06-10 1998-08-05 Dow Corning Electroless metal disposition on silyl hyride functional resin
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
US6440550B1 (en) 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
US6335152B1 (en) * 2000-05-01 2002-01-01 Advanced Micro Devices, Inc. Use of RTA furnace for photoresist baking
KR20040050916A (ko) * 2001-10-19 2004-06-17 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 피처들의 패턴 및 이의 형성 방법
FR2872503B1 (fr) * 2004-07-05 2006-09-22 Commissariat Energie Atomique Procede de fabrication d'une ebauche de biopuce, ebauche et biopuce
US8088547B2 (en) * 2004-11-02 2012-01-03 Dow Corning Corporation Resist composition
WO2006073115A1 (ja) * 2005-01-05 2006-07-13 Sekisui Chemical Co., Ltd. シリコン含有感光性組成物、これを用いた薄膜パターンの製造方法、電子機器用保護膜、ゲート絶縁膜及び薄膜トランジスタ
JP4925084B2 (ja) * 2005-09-14 2012-04-25 独立行政法人日本原子力研究開発機構 ケイ素系混合高分子材料による炭化ケイ素（ＳｉＣ）薄膜の合成法
CN101622579B (zh) * 2007-03-01 2012-09-05 旭硝子株式会社 具有斥水性区域的图案的处理基材及其制造方法、以及形成有功能性材料的膜构成的图案的构件的制造方法
US8158338B2 (en) * 2008-07-08 2012-04-17 Massachusetts Institute Of Technology Resist sensitizer
US8323866B2 (en) * 2008-07-08 2012-12-04 Massachusetts Institute Of Technology Inorganic resist sensitizer
FI129480B (en) * 2018-08-10 2022-03-15 Pibond Oy Silanol-containing organic-inorganic hybrid coatings for high-resolution patterning
KR102155966B1 (ko) 2019-09-04 2020-09-14 성인식 농작물 지지대

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615272A (en) * 1968-11-04 1971-10-26 Dow Corning Condensed soluble hydrogensilsesquioxane resin
FR2507608A1 (fr) * 1981-06-15 1982-12-17 Rhone Poulenc Spec Chim Compositions organopolysiloxaniques liquides photopolymerisables pour enduction de materiaux
US4693960A (en) * 1985-03-29 1987-09-15 International Business Machines Corporation Photolithographic etching process using organosilicon polymer composition
FR2597110A1 (fr) * 1986-04-14 1987-10-16 Rhone Poulenc Multi Tech Composition organopolysiloxane, potentiellement reticulable et utilisable notamment en microlithographie, et son procede d'application
EP0255303B1 (de) * 1986-07-25 1989-10-11 Oki Electric Industry Company, Limited Negatives Resistmaterial, Methode zu seiner Herstellung und Methode zu seiner Verwendung
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4847162A (en) * 1987-12-28 1989-07-11 Dow Corning Corporation Multilayer ceramics coatings from the ceramification of hydrogen silsequioxane resin in the presence of ammonia
US4889901A (en) * 1988-11-16 1989-12-26 Desoto, Inc. Ultraviolet-curable blends of acrylated polyurethanes and silsesquioxane oligomers having improved adhesion to glass
US5063297A (en) * 1989-06-08 1991-11-05 Minnesota Mining And Manufacturing Company Apparatus for detecting fluorescence of a luminescent material
US4999397A (en) * 1989-07-28 1991-03-12 Dow Corning Corporation Metastable silane hydrolyzates and process for their preparation
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
US5098816A (en) * 1989-10-10 1992-03-24 International Business Machines Corporation Method for forming a pattern of a photoresist
US5021398A (en) * 1989-10-26 1991-06-04 Amp Incorporated Method of forming patterned oxide superconducting films

Also Published As

Publication number Publication date
TW223153B (de) 1994-05-01
JPH05204161A (ja) 1993-08-13
CA2064971A1 (en) 1992-10-23
DE69222461D1 (de) 1997-11-06
US5238787A (en) 1993-08-24
KR920020259A (ko) 1992-11-20
JP2997124B2 (ja) 2000-01-11
EP0510872B1 (de) 1997-10-01
US5348839A (en) 1994-09-20
EP0510872A1 (de) 1992-10-28
KR100214111B1 (ko) 1999-08-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee