DE69217330D1 - Verfahren zur Reinigung von Vinylphenolpolymeren zur Verwendung als Photoresistmaterial - Google Patents

Verfahren zur Reinigung von Vinylphenolpolymeren zur Verwendung als Photoresistmaterial

Info

Publication number
DE69217330D1
DE69217330D1 DE69217330T DE69217330T DE69217330D1 DE 69217330 D1 DE69217330 D1 DE 69217330D1 DE 69217330 T DE69217330 T DE 69217330T DE 69217330 T DE69217330 T DE 69217330T DE 69217330 D1 DE69217330 D1 DE 69217330D1
Authority
DE
Germany
Prior art keywords
photoresist material
vinyl phenol
phenol polymers
cleaning vinyl
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69217330T
Other languages
English (en)
Other versions
DE69217330T2 (de
Inventor
Tadashi Matsumoto
Mitsuru Akaho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maruzen Petrochemical Co Ltd
Original Assignee
Maruzen Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochemical Co Ltd filed Critical Maruzen Petrochemical Co Ltd
Publication of DE69217330D1 publication Critical patent/DE69217330D1/de
Application granted granted Critical
Publication of DE69217330T2 publication Critical patent/DE69217330T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/04—Reduction, e.g. hydrogenation

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69217330T 1991-11-28 1992-11-27 Verfahren zur Reinigung von Vinylphenolpolymeren zur Verwendung als Photoresistmaterial Expired - Fee Related DE69217330T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3339728A JPH0768297B2 (ja) 1991-11-28 1991-11-28 フォトレジスト用ビニルフェノール系重合体の精製方法

Publications (2)

Publication Number Publication Date
DE69217330D1 true DE69217330D1 (de) 1997-03-20
DE69217330T2 DE69217330T2 (de) 1997-06-12

Family

ID=18330248

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69217330T Expired - Fee Related DE69217330T2 (de) 1991-11-28 1992-11-27 Verfahren zur Reinigung von Vinylphenolpolymeren zur Verwendung als Photoresistmaterial

Country Status (4)

Country Link
US (1) US5284930A (de)
EP (1) EP0544325B1 (de)
JP (1) JPH0768297B2 (de)
DE (1) DE69217330T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5580949A (en) * 1991-12-18 1996-12-03 Hoechst Celanese Corporation Metal ion reduction in novolak resins and photoresists
SG48902A1 (en) * 1991-12-18 1998-05-18 Hoechst Celanese Corp Metal ion reduction in novolak resins
JP3184530B2 (ja) * 1992-03-06 2001-07-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド 金属イオンレベルが低いフォトレジスト
SG52770A1 (en) * 1992-07-10 1998-09-28 Hoechst Celanese Corp Metal ion reduction in top anti-reflective coatings for photoresists
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
JP3727335B2 (ja) * 1992-11-25 2005-12-14 Ａｚエレクトロニックマテリアルズ株式会社 フォトレジスト用底部反射防止塗料における金属イオンの低減
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
US5571657A (en) * 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
US5614352A (en) * 1994-12-30 1997-03-25 Hoechst Celanese Corporation Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
AU725939B2 (en) * 1996-07-30 2000-10-26 3M Innovative Properties Company Filter sheet and process for purifying photoresist composition employing the filter sheet
US6576139B1 (en) 1996-07-30 2003-06-10 Kenneth C. Hou Process for purifying photoresist composition employing a filter sheet
DE19643959A1 (de) * 1996-10-31 1998-05-07 Lohmann Therapie Syst Lts Kleber, enthaltend Polymere mit einem sehr geringen Gehalt an Restmonomeren, ein Verfahren zu ihrer Herstellung und ihre Verwendung
DK0935616T4 (da) * 1996-10-31 2010-07-26 Lohmann Therapie Syst Lts Fremgangsmåde til fremstilling af klæbere med lavt indhold af restmonomere
JP3363051B2 (ja) * 1997-02-21 2003-01-07 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去法
FR2763330B1 (fr) * 1997-05-15 1999-07-30 Atochem Elf Sa Procede de purification de liquides organiques quasi anhydres
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
US6660875B1 (en) 1998-06-09 2003-12-09 Ppt Technologies, Llc Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate (TEOS)
US7329354B2 (en) 1998-06-09 2008-02-12 Ppt Technologies, Llc Purification of organic solvent fluids
JP3348040B2 (ja) * 1999-06-04 2002-11-20 群栄化学工業株式会社 ノボラック型フェノール樹脂
JP3380960B2 (ja) * 2000-01-14 2003-02-24 日本電気株式会社 レジストパターンの形成方法
KR100979871B1 (ko) * 2002-04-01 2010-09-02 다이셀 가가꾸 고교 가부시끼가이샤 ＡｒＦ 엑시머 레이저 레지스트용 중합체 용액의 제조 방법
US7834113B2 (en) * 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
JP4825405B2 (ja) * 2003-05-08 2011-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトレジスト組成物およびそれらの調製方法
US8778447B2 (en) * 2011-03-09 2014-07-15 Electronics And Telecommunications Research Institute Hybrid compositions containing organic material and inorganic material, and hybrid dielectric layers including the same
FR3021551A1 (fr) 2014-06-03 2015-12-04 Arkema France Procede d'elimination d'ions metalliques dans une solution organique visqueuse
JP7258420B2 (ja) 2019-01-18 2023-04-17 株式会社ディスコ レーザーダイシング用保護膜剤、レーザーダイシング用保護膜剤の製造方法及びレーザーダイシング用保護膜剤を用いた被加工物の加工方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59117501A (ja) * 1982-12-23 1984-07-06 Nippon Zeon Co Ltd 共役ジエン系重合体の水素化方法
JPS643604A (en) * 1987-06-26 1989-01-09 Hitachi Ltd Formation of color filter

Also Published As

Publication number Publication date
EP0544325B1 (de) 1997-02-05
JPH0768297B2 (ja) 1995-07-26
US5284930A (en) 1994-02-08
DE69217330T2 (de) 1997-06-12
JPH05148309A (ja) 1993-06-15
EP0544325A1 (de) 1993-06-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee