DE69208051T2 - Verfahren zur Entfernung von Metallen aus Vinylphenolpolymeren - Google Patents

Verfahren zur Entfernung von Metallen aus Vinylphenolpolymeren

Info

Publication number
DE69208051T2
DE69208051T2 DE69208051T DE69208051T DE69208051T2 DE 69208051 T2 DE69208051 T2 DE 69208051T2 DE 69208051 T DE69208051 T DE 69208051T DE 69208051 T DE69208051 T DE 69208051T DE 69208051 T2 DE69208051 T2 DE 69208051T2
Authority
DE
Germany
Prior art keywords
removing metals
vinylphenol polymers
vinylphenol
polymers
metals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69208051T
Other languages
English (en)
Other versions
DE69208051D1 (de
Inventor
Tadashi Matsumoto
Mitsuru Akaho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maruzen Petrochemical Co Ltd
Original Assignee
Maruzen Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochemical Co Ltd filed Critical Maruzen Petrochemical Co Ltd
Publication of DE69208051D1 publication Critical patent/DE69208051D1/de
Application granted granted Critical
Publication of DE69208051T2 publication Critical patent/DE69208051T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
DE69208051T 1991-11-28 1992-11-27 Verfahren zur Entfernung von Metallen aus Vinylphenolpolymeren Expired - Fee Related DE69208051T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3339727A JPH0768296B2 (ja) 1991-11-28 1991-11-28 ビニルフェノール系重合体の金属除去方法

Publications (2)

Publication Number Publication Date
DE69208051D1 DE69208051D1 (de) 1996-03-14
DE69208051T2 true DE69208051T2 (de) 1996-05-30

Family

ID=18330239

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69208051T Expired - Fee Related DE69208051T2 (de) 1991-11-28 1992-11-27 Verfahren zur Entfernung von Metallen aus Vinylphenolpolymeren

Country Status (4)

Country Link
US (1) US5288850A (de)
EP (1) EP0544324B1 (de)
JP (1) JPH0768296B2 (de)
DE (1) DE69208051T2 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG48902A1 (en) * 1991-12-18 1998-05-18 Hoechst Celanese Corp Metal ion reduction in novolak resins
US5580949A (en) * 1991-12-18 1996-12-03 Hoechst Celanese Corporation Metal ion reduction in novolak resins and photoresists
DE69320468T2 (de) * 1992-03-06 1999-04-22 Clariant Finance Bvi Ltd Photoresists mit einem niedrigem grad metallionen
SG52770A1 (en) * 1992-07-10 1998-09-28 Hoechst Celanese Corp Metal ion reduction in top anti-reflective coatings for photoresists
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
DE69313132T2 (de) * 1992-11-25 1997-12-11 Hoechst Celanese Corp Metallionenreduzierung in antireflexunterschichten für photoresist
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
WO1994014858A1 (en) * 1992-12-29 1994-07-07 Hoechst Celanese Corporation Metal ion reduction in polyhydroxystyrene and photoresists
US5571657A (en) * 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
US5679766A (en) * 1993-12-07 1997-10-21 Shipley Company, L.L.C. Purification process of novolar resins using acid treated chelating cation exchange resin
US5614352A (en) * 1994-12-30 1997-03-25 Hoechst Celanese Corporation Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
CA2261862A1 (en) * 1996-07-30 1998-02-05 Cuno Incorporated Filter sheet and process for purifying photoresist composition employing the filter sheet
US6576139B1 (en) 1996-07-30 2003-06-10 Kenneth C. Hou Process for purifying photoresist composition employing a filter sheet
JP3363051B2 (ja) * 1997-02-21 2003-01-07 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去法
FR2763330B1 (fr) * 1997-05-15 1999-07-30 Atochem Elf Sa Procede de purification de liquides organiques quasi anhydres
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
ATE262542T1 (de) * 1998-05-05 2004-04-15 Triquest L P Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten
US6759483B2 (en) 1998-05-05 2004-07-06 Chemfirst Electronic Materials L.P. Preparation of homo-, co- and terpolymers of substituted styrenes
JP3348040B2 (ja) * 1999-06-04 2002-11-20 群栄化学工業株式会社 ノボラック型フェノール樹脂
US6787611B2 (en) * 2000-06-27 2004-09-07 Chemfirst Electronic Materials L.P. Purification means
US6593431B2 (en) 2000-06-27 2003-07-15 Chemfirst Electronic Materials Lp Purification means
US6864324B2 (en) 2002-04-19 2005-03-08 Chem First Electronic Materials L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
US7834113B2 (en) * 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
JP4825405B2 (ja) * 2003-05-08 2011-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトレジスト組成物およびそれらの調製方法
US20060073411A1 (en) * 2004-09-28 2006-04-06 Sumitomo Chemical Company, Limited Chemically amplified resist composition
US20070248913A1 (en) * 2006-04-24 2007-10-25 Rahman M Dalil Process for producing film forming resins for photoresist compositions
JP5551474B2 (ja) * 2010-03-03 2014-07-16 日本曹達株式会社 両親媒性化合物の製造方法
WO2015017295A1 (en) * 2013-07-29 2015-02-05 E. I. Du Pont De Nemours And Company Polymer purification
FR3021551A1 (fr) 2014-06-03 2015-12-04 Arkema France Procede d'elimination d'ions metalliques dans une solution organique visqueuse

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60258206A (ja) * 1984-06-01 1985-12-20 Cosmo Co Ltd ｐ−ビニルフエノ−ル重合体の低着色改質体の製造方法
US4636540A (en) * 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
JPH03128903A (ja) * 1989-07-13 1991-05-31 Fine Kurei:Kk 合成樹脂の改質方法および改質合成樹脂
US4985540A (en) * 1989-11-20 1991-01-15 Polysar Limited Process for removing rhodium-containing catalyst residue from hydrogenated nitrile rubber

Also Published As

Publication number Publication date
EP0544324A1 (de) 1993-06-02
EP0544324B1 (de) 1996-01-31
JPH0768296B2 (ja) 1995-07-26
DE69208051D1 (de) 1996-03-14
JPH05148308A (ja) 1993-06-15
US5288850A (en) 1994-02-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee