DE69128771D1 - Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme - Google Patents

Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme

Info

Publication number
DE69128771D1
DE69128771D1 DE69128771T DE69128771T DE69128771D1 DE 69128771 D1 DE69128771 D1 DE 69128771D1 DE 69128771 T DE69128771 T DE 69128771T DE 69128771 T DE69128771 T DE 69128771T DE 69128771 D1 DE69128771 D1 DE 69128771D1
Authority
DE
Germany
Prior art keywords
distance
position measurement
transverse position
lithography systems
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69128771T
Other languages
English (en)
Other versions
DE69128771T2 (de
Inventor
Francis S M Clube
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Holtronic Technologies Ltd
Original Assignee
Holtronic Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Holtronic Technologies Ltd filed Critical Holtronic Technologies Ltd
Publication of DE69128771D1 publication Critical patent/DE69128771D1/de
Application granted granted Critical
Publication of DE69128771T2 publication Critical patent/DE69128771T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/0408—Total internal reflection [TIR] holograms, e.g. edge lit or substrate mode holograms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69128771T 1990-10-11 1991-10-07 Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme Expired - Fee Related DE69128771T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9022154A GB2249387B (en) 1990-10-11 1990-10-11 Apparatus for and a method of transverse position measurement in proximity lithographic systems

Publications (2)

Publication Number Publication Date
DE69128771D1 true DE69128771D1 (de) 1998-02-26
DE69128771T2 DE69128771T2 (de) 1998-08-20

Family

ID=10683589

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128771T Expired - Fee Related DE69128771T2 (de) 1990-10-11 1991-10-07 Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme

Country Status (6)

Country Link
US (1) US5187372A (de)
EP (1) EP0493655B1 (de)
JP (1) JP3249154B2 (de)
KR (1) KR100209463B1 (de)
DE (1) DE69128771T2 (de)
GB (1) GB2249387B (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6329104B1 (en) * 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5504596A (en) * 1992-12-21 1996-04-02 Nikon Corporation Exposure method and apparatus using holographic techniques
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
US5519535A (en) * 1994-04-04 1996-05-21 Motorola, Inc. Precision placement apparatus having liquid crystal shuttered dual prism probe
JP4022398B2 (ja) * 2001-12-27 2007-12-19 株式会社 液晶先端技術開発センター 位相シフトマスクの作成方法及び装置
JP2003297718A (ja) * 2002-03-29 2003-10-17 Seiko Epson Corp 微細孔形成方法、半導体装置の製造方法、半導体装置、表示装置、および電子機器
US7394554B2 (en) * 2003-09-15 2008-07-01 Timbre Technologies, Inc. Selecting a hypothetical profile to use in optical metrology
US8227150B2 (en) * 2004-01-07 2012-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Holographic reticle and patterning method
US7312021B2 (en) * 2004-01-07 2007-12-25 Taiwan Semiconductor Manufacturing Company, Ltd. Holographic reticle and patterning method
US20060121357A1 (en) * 2004-12-02 2006-06-08 Holtronic Technologies Plc. Large pattern printing
US8749760B2 (en) 2009-03-03 2014-06-10 International Business Machines Corporation Asymmetric complementary dipole illuminator
CN102043341B (zh) * 2009-10-12 2012-10-03 上海微电子装备有限公司 用于光刻设备的对准信号采集系统与对准方法
CN102455600B (zh) * 2010-10-18 2014-07-23 中芯国际集成电路制造(上海)有限公司 检测晶片表面形貌的方法
CN107530034A (zh) 2015-03-16 2018-01-02 奇跃公司 增强现实脉冲血氧定量法
KR102359038B1 (ko) 2015-06-15 2022-02-04 매직 립, 인코포레이티드 멀티플렉싱된 광 스트림들을 인-커플링하기 위한 광학 엘리먼트들을 가진 디스플레이 시스템
KR20220040511A (ko) 2016-04-08 2022-03-30 매직 립, 인코포레이티드 가변 포커스 렌즈 엘리먼트들을 가진 증강 현실 시스템들 및 방법들
US10416471B2 (en) * 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
KR102533671B1 (ko) 2016-11-18 2023-05-16 매직 립, 인코포레이티드 공간 가변적 액정 회절 격자들
US11067860B2 (en) 2016-11-18 2021-07-20 Magic Leap, Inc. Liquid crystal diffractive devices with nano-scale pattern and methods of manufacturing the same
JP7237830B2 (ja) 2016-11-18 2023-03-13 マジック リープ， インコーポレイテッド 交差格子を用いた導波管光マルチプレクサ
WO2018106963A1 (en) 2016-12-08 2018-06-14 Magic Leap, Inc. Diffractive devices based on cholesteric liquid crystal
CN110291453B (zh) 2016-12-14 2022-11-01 奇跃公司 使用具有表面对准图案的软压印复制对液晶图案化
WO2018136892A1 (en) 2017-01-23 2018-07-26 Magic Leap, Inc. Eyepiece for virtual, augmented, or mixed reality systems
CN110546549B (zh) 2017-02-23 2022-06-07 奇跃公司 具有可变屈光力反射器的显示系统
US11073695B2 (en) 2017-03-21 2021-07-27 Magic Leap, Inc. Eye-imaging apparatus using diffractive optical elements
EP3685215B1 (de) 2017-09-21 2024-01-03 Magic Leap, Inc. Anzeige mit erweiterter realität mit wellenleiter zur erfassung von bildern des auges und/oder der umgebung
AU2018386296B2 (en) 2017-12-15 2023-11-23 Magic Leap, Inc. Eyepieces for augmented reality display system
EP3884337A4 (de) 2018-11-20 2022-08-17 Magic Leap, Inc. Okulare für erweiterte realitätsanzeigesysteme
WO2020257469A1 (en) 2019-06-20 2020-12-24 Magic Leap, Inc. Eyepieces for augmented reality display system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
DE2905635A1 (de) * 1979-02-14 1980-08-21 Censor Patent Versuch Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4814626A (en) * 1985-12-13 1989-03-21 Siemens Aktiengesellschaft Method for high precision position measurement of two-dimensional structures
JPS62172203A (ja) * 1986-01-27 1987-07-29 Agency Of Ind Science & Technol 相対変位測定方法
EP0243520B1 (de) * 1986-04-29 1991-11-27 Ibm Deutschland Gmbh Interferometrische Maskensubstratausrichtung
JPH01285803A (ja) * 1988-05-13 1989-11-16 Fujitsu Ltd フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法
JP2658051B2 (ja) * 1987-05-15 1997-09-30 株式会社ニコン 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法
US4988197A (en) * 1987-12-28 1991-01-29 Kabushiki Kaisha Toshiba Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects

Also Published As

Publication number Publication date
JPH056853A (ja) 1993-01-14
US5187372A (en) 1993-02-16
EP0493655A3 (en) 1992-09-02
EP0493655B1 (de) 1998-01-21
EP0493655A2 (de) 1992-07-08
KR100209463B1 (ko) 1999-07-15
JP3249154B2 (ja) 2002-01-21
KR920008464A (ko) 1992-05-28
DE69128771T2 (de) 1998-08-20
GB9022154D0 (en) 1990-11-21
GB2249387A (en) 1992-05-06
GB2249387B (en) 1995-01-25

Similar Documents

Publication Publication Date Title
DE69128771D1 (de) Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme
DE69132110D1 (de) Verfahren und vorrichtung zur belichtung
DE69317736T2 (de) Verfahren und Vorrichtung zur Dünnschichtdickenmessung
DE69530563T2 (de) Verfahren und Vorrichtung zur Messung der Chemilumineszenz
DE69133203D1 (de) Verfahren und vorrichtung zur kontinuierlichen volumendurchflussmessung
DE69208005D1 (de) Verfahren und Vorrichtung für Abstandsmessung
DE69128344D1 (de) Vorrichtung und verfahren für elektrochemische messungen
DE69124753T2 (de) Verfahren und Vorrichtung zur Messung interner Fehler
DE69115772T2 (de) Verfahren und Vorrichtung zur Distanzbestimmung für ein Fahrzeug
DE69504815D1 (de) Verfahren und vorrichtung zur messung von kenngrössen eines oszillierenden systems
DE68925091T2 (de) Verfahren und Vorrichtung zur Einschätzung des Fahrweges
DE69623248T2 (de) Verfahren und Vorrichtung zur Entfernungsmessung
DE69426761T2 (de) Verfahren und Vorrichtung zur Messung der Ionenkonzentration
DE59302962D1 (de) Verfahren und Vorrichtung zur Abstandsmessung
DE69009109T2 (de) Vorrichtung und Verfahren zur Lichtmessung.
DE69124843T2 (de) Verfahren und Vorrichtung zur Messung von Radwinkeln
DE69223207T2 (de) Verfahren und Vorrichtung zur Messung einer Verlagerung
DE69112090D1 (de) Verfahren und Vorrichtung zur Messung von Musterdimensionen.
DE69222382T2 (de) Verfahren und Vorrichtung zur Messung von Lageabweichungen
ATE261119T1 (de) Verfahren und vorrichtung zur messung der oktanzahl
DE59502277D1 (de) Verfahren und vorrichtung zur elektrooptischen entfernungsmessung
DE59307298D1 (de) Verfahren und Vorrichtung zur Phasenmessung
DE69017228T2 (de) Verfahren und vorrichtung zur entfernungsmessung.
ATA201590A (de) Verfahren und vorrichtung zur laengen- und winkelmessung
DE69325710T2 (de) Verfahren und Gerät zur Entfernungsmessung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee