DE69128771T2 - Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme - Google Patents

Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme

Info

Publication number
DE69128771T2
DE69128771T2 DE69128771T DE69128771T DE69128771T2 DE 69128771 T2 DE69128771 T2 DE 69128771T2 DE 69128771 T DE69128771 T DE 69128771T DE 69128771 T DE69128771 T DE 69128771T DE 69128771 T2 DE69128771 T2 DE 69128771T2
Authority
DE
Germany
Prior art keywords
distance
position measurement
transverse position
lithography systems
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69128771T
Other languages
English (en)
Other versions
DE69128771D1 (de
Inventor
Francis S M Clube
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Holtronic Technologies Ltd
Original Assignee
Holtronic Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Holtronic Technologies Ltd filed Critical Holtronic Technologies Ltd
Application granted granted Critical
Publication of DE69128771D1 publication Critical patent/DE69128771D1/de
Publication of DE69128771T2 publication Critical patent/DE69128771T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/0408—Total internal reflection [TIR] holograms, e.g. edge lit or substrate mode holograms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69128771T 1990-10-11 1991-10-07 Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme Expired - Fee Related DE69128771T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9022154A GB2249387B (en) 1990-10-11 1990-10-11 Apparatus for and a method of transverse position measurement in proximity lithographic systems

Publications (2)

Publication Number Publication Date
DE69128771D1 DE69128771D1 (de) 1998-02-26
DE69128771T2 true DE69128771T2 (de) 1998-08-20

Family

ID=10683589

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128771T Expired - Fee Related DE69128771T2 (de) 1990-10-11 1991-10-07 Vorrichtung und Verfahren zur transversalen Positionsmessung für Nah-Abstand-Lithographiesysteme

Country Status (6)

Country Link
US (1) US5187372A (de)
EP (1) EP0493655B1 (de)
JP (1) JP3249154B2 (de)
KR (1) KR100209463B1 (de)
DE (1) DE69128771T2 (de)
GB (1) GB2249387B (de)

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US6329104B1 (en) * 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5504596A (en) * 1992-12-21 1996-04-02 Nikon Corporation Exposure method and apparatus using holographic techniques
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
US5519535A (en) * 1994-04-04 1996-05-21 Motorola, Inc. Precision placement apparatus having liquid crystal shuttered dual prism probe
JP4022398B2 (ja) * 2001-12-27 2007-12-19 株式会社 液晶先端技術開発センター 位相シフトマスクの作成方法及び装置
JP2003297718A (ja) * 2002-03-29 2003-10-17 Seiko Epson Corp 微細孔形成方法、半導体装置の製造方法、半導体装置、表示装置、および電子機器
US7394554B2 (en) * 2003-09-15 2008-07-01 Timbre Technologies, Inc. Selecting a hypothetical profile to use in optical metrology
US7312021B2 (en) * 2004-01-07 2007-12-25 Taiwan Semiconductor Manufacturing Company, Ltd. Holographic reticle and patterning method
US8227150B2 (en) * 2004-01-07 2012-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Holographic reticle and patterning method
US20060121357A1 (en) * 2004-12-02 2006-06-08 Holtronic Technologies Plc. Large pattern printing
US8749760B2 (en) 2009-03-03 2014-06-10 International Business Machines Corporation Asymmetric complementary dipole illuminator
CN102043341B (zh) * 2009-10-12 2012-10-03 上海微电子装备有限公司 用于光刻设备的对准信号采集系统与对准方法
CN102455600B (zh) * 2010-10-18 2014-07-23 中芯国际集成电路制造(上海)有限公司 检测晶片表面形貌的方法
KR102564748B1 (ko) 2015-03-16 2023-08-07 매직 립, 인코포레이티드 건강 질환 진단과 치료를 위한 방법 및 시스템
AU2016278006B2 (en) 2015-06-15 2021-09-02 Magic Leap, Inc. Virtual and augmented reality systems and methods
EP3440497B1 (de) 2016-04-08 2023-08-16 Magic Leap, Inc. Systeme der erweiterten realität und verfahren mit linsenelementen mit veränderlicher brennweite
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
JP7116058B2 (ja) 2016-11-18 2022-08-09 マジック リープ， インコーポレイテッド 空間可変液晶回折格子
US11067860B2 (en) 2016-11-18 2021-07-20 Magic Leap, Inc. Liquid crystal diffractive devices with nano-scale pattern and methods of manufacturing the same
AU2017363078B2 (en) * 2016-11-18 2022-09-29 Magic Leap, Inc. Waveguide light multiplexer using crossed gratings
JP7069160B2 (ja) 2016-12-08 2022-05-17 マジック リープ， インコーポレイテッド コレステリック液晶に基づく回折デバイス
JP7164525B2 (ja) 2016-12-14 2022-11-01 マジック リープ， インコーポレイテッド 表面整合パターンのソフトインプリント複製を用いた液晶のパターン化
KR20230053724A (ko) 2017-01-23 2023-04-21 매직 립, 인코포레이티드 가상, 증강, 또는 혼합 현실 시스템들을 위한 접안렌즈
IL301881B1 (en) 2017-02-23 2024-04-01 Magic Leap Inc Display system with variable power reflector
IL269317B2 (en) 2017-03-21 2023-11-01 Magic Leap Inc An eye imaging device that uses optical refractive elements
IL273397B1 (en) 2017-09-21 2024-05-01 Magic Leap Inc An augmented reality display with a waveguide configured to capture images of an eye and/or environment
CN111683584A (zh) 2017-12-15 2020-09-18 奇跃公司 用于增强现实显示系统的目镜
JP2022509083A (ja) 2018-11-20 2022-01-20 マジック リープ， インコーポレイテッド 拡張現実ディスプレイシステムのための接眼レンズ
CN114286962A (zh) 2019-06-20 2022-04-05 奇跃公司 用于增强现实显示系统的目镜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
DE2905635A1 (de) * 1979-02-14 1980-08-21 Censor Patent Versuch Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4814626A (en) * 1985-12-13 1989-03-21 Siemens Aktiengesellschaft Method for high precision position measurement of two-dimensional structures
JPS62172203A (ja) * 1986-01-27 1987-07-29 Agency Of Ind Science & Technol 相対変位測定方法
EP0243520B1 (de) * 1986-04-29 1991-11-27 Ibm Deutschland Gmbh Interferometrische Maskensubstratausrichtung
JPH01285803A (ja) * 1988-05-13 1989-11-16 Fujitsu Ltd フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法
JP2658051B2 (ja) * 1987-05-15 1997-09-30 株式会社ニコン 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法
EP0323242A3 (de) * 1987-12-28 1989-10-18 Kabushiki Kaisha Toshiba Verfahren und Vorrichtung zum Ausrichten von zwei Objekten, und Verfahren und Vorrichtung zum Einstellen eines gewünschten Spaltes zwischen zwei Objekten

Also Published As

Publication number Publication date
KR100209463B1 (ko) 1999-07-15
US5187372A (en) 1993-02-16
JPH056853A (ja) 1993-01-14
EP0493655A3 (en) 1992-09-02
KR920008464A (ko) 1992-05-28
GB2249387B (en) 1995-01-25
EP0493655B1 (de) 1998-01-21
EP0493655A2 (de) 1992-07-08
GB2249387A (en) 1992-05-06
DE69128771D1 (de) 1998-02-26
GB9022154D0 (en) 1990-11-21
JP3249154B2 (ja) 2002-01-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee