DE69125915D1 - Verfahren zum Herstellen einer Dünnschicht aus einem Oxid-Supraleiter vom Wismuth-Typ - Google Patents

Verfahren zum Herstellen einer Dünnschicht aus einem Oxid-Supraleiter vom Wismuth-Typ

Info

Publication number
DE69125915D1
DE69125915D1 DE69125915T DE69125915T DE69125915D1 DE 69125915 D1 DE69125915 D1 DE 69125915D1 DE 69125915 T DE69125915 T DE 69125915T DE 69125915 T DE69125915 T DE 69125915T DE 69125915 D1 DE69125915 D1 DE 69125915D1
Authority
DE
Germany
Prior art keywords
bismuth
producing
thin film
type oxide
oxide superconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69125915T
Other languages
English (en)
Other versions
DE69125915T2 (de
Inventor
Hisao Hattori
Kenjiro Higaki
Hideo Itozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69125915D1 publication Critical patent/DE69125915D1/de
Application granted granted Critical
Publication of DE69125915T2 publication Critical patent/DE69125915T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/731—Sputter coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/775—High tc, above 30 k, superconducting material
    • Y10S505/776—Containing transition metal oxide with rare earth or alkaline earth
    • Y10S505/782—Bismuth-, e.g. BiCaSrCuO

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE69125915T 1990-11-21 1991-11-21 Verfahren zum Herstellen einer Dünnschicht aus einem Oxid-Supraleiter vom Wismuth-Typ Expired - Fee Related DE69125915T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2316748A JPH04187521A (ja) 1990-11-21 1990-11-21 酸化物超電導薄膜の作製方法

Publications (2)

Publication Number Publication Date
DE69125915D1 true DE69125915D1 (de) 1997-06-05
DE69125915T2 DE69125915T2 (de) 1997-11-06

Family

ID=18080476

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69125915T Expired - Fee Related DE69125915T2 (de) 1990-11-21 1991-11-21 Verfahren zum Herstellen einer Dünnschicht aus einem Oxid-Supraleiter vom Wismuth-Typ

Country Status (4)

Country Link
US (1) US5244873A (de)
EP (1) EP0487421B1 (de)
JP (1) JPH04187521A (de)
DE (1) DE69125915T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037313A (en) * 1994-09-16 2000-03-14 Sumitomo Electric Industries, Ltd. Method and apparatus for depositing superconducting layer onto the substrate surface via off-axis laser ablation
JP4452805B2 (ja) * 2004-09-21 2010-04-21 独立行政法人産業技術総合研究所 ビスマス系酸化物超電導薄膜及びその作製法
US7981840B2 (en) 2005-03-02 2011-07-19 National Institute Of Advanced Industrial Science And Technology Method of manufacturing Bi-based oxide superconductor thin films
CN111270214B (zh) * 2020-03-26 2022-03-18 郑州科之诚机床工具有限公司 一种磁控溅射制备c轴择优取向氮化铝多晶薄膜的方法和氮化铝多晶薄膜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4963524A (en) * 1987-09-24 1990-10-16 Semiconductor Energy Laboratory Co., Ltd. Sputtering device for manufacturing superconducting oxide material and method therefor
WO1989011736A1 (en) * 1988-05-24 1989-11-30 Siemens Aktiengesellschaft Process for producing thin films of a high-temperature superconductor and films thus produced
US5032571A (en) * 1988-07-05 1991-07-16 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing oxide superconducting materials
JPH02122067A (ja) * 1988-10-31 1990-05-09 Nippon Telegr & Teleph Corp <Ntt> 酸化物超伝導薄膜の作製方法

Also Published As

Publication number Publication date
EP0487421A2 (de) 1992-05-27
JPH04187521A (ja) 1992-07-06
EP0487421B1 (de) 1997-05-02
US5244873A (en) 1993-09-14
EP0487421A3 (en) 1992-11-19
DE69125915T2 (de) 1997-11-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee