DE69111593T2 - Vorrichtung zum Vakuum-Aufdampfen von einer sublimierbaren Substanz. - Google Patents

Vorrichtung zum Vakuum-Aufdampfen von einer sublimierbaren Substanz.

Info

Publication number
DE69111593T2
DE69111593T2 DE69111593T DE69111593T DE69111593T2 DE 69111593 T2 DE69111593 T2 DE 69111593T2 DE 69111593 T DE69111593 T DE 69111593T DE 69111593 T DE69111593 T DE 69111593T DE 69111593 T2 DE69111593 T2 DE 69111593T2
Authority
DE
Germany
Prior art keywords
vacuum evaporation
sublimable substance
sublimable
substance
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69111593T
Other languages
English (en)
Other versions
DE69111593D1 (de
Inventor
Toshio Taguchi
Minoru Sueda
Younosuke Hoshi
Susumu Kamikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Publication of DE69111593D1 publication Critical patent/DE69111593D1/de
Application granted granted Critical
Publication of DE69111593T2 publication Critical patent/DE69111593T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69111593T 1991-04-03 1991-12-20 Vorrichtung zum Vakuum-Aufdampfen von einer sublimierbaren Substanz. Expired - Fee Related DE69111593T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3070819A JPH04308076A (ja) 1991-04-03 1991-04-03 昇華性物質真空蒸着装置

Publications (2)

Publication Number Publication Date
DE69111593D1 DE69111593D1 (de) 1995-08-31
DE69111593T2 true DE69111593T2 (de) 1996-02-29

Family

ID=13442567

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69111593T Expired - Fee Related DE69111593T2 (de) 1991-04-03 1991-12-20 Vorrichtung zum Vakuum-Aufdampfen von einer sublimierbaren Substanz.

Country Status (5)

Country Link
US (1) US5272298A (de)
EP (1) EP0510259B1 (de)
JP (1) JPH04308076A (de)
KR (1) KR940011707B1 (de)
DE (1) DE69111593T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4310745C2 (de) * 1993-04-01 1999-07-08 Siemens Ag Verfahren zum Herstellen von SiC-Einkristallen und Vorrichtung zur Durchführung des Verfahrens
JPH08269696A (ja) * 1995-03-28 1996-10-15 Nisshin Steel Co Ltd Ｍｇの蒸発方法
CH692000A5 (de) * 1995-11-13 2001-12-31 Unaxis Balzers Ag Beschichtungskammer, Substratträger hierfür, Verfahren zum Vakuumbedampfen sowie Beschichtungsverfahren.
US6202591B1 (en) 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
AU2522299A (en) * 1999-02-05 2000-08-25 Applied Films Gmbh & Co. Kg Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source
AU2001277743A1 (en) * 2000-08-10 2002-02-25 Nippon Steel Chemical Co. Ltd. Method and device for producing organic el elements
KR100490537B1 (ko) * 2002-07-23 2005-05-17 삼성에스디아이 주식회사 가열용기와 이를 이용한 증착장치
US6797337B2 (en) * 2002-08-19 2004-09-28 Micron Technology, Inc. Method for delivering precursors
US7009519B2 (en) * 2002-11-21 2006-03-07 S.C. Johnson & Sons, Inc. Product dispensing controlled by RFID tags
KR100898072B1 (ko) 2003-04-09 2009-05-18 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
EP1496134B1 (de) * 2003-07-04 2015-03-25 Agfa HealthCare NV Gerät zur Dampfabscheidung
EP2369035B9 (de) * 2003-08-04 2014-05-21 LG Display Co., Ltd. Verdampfungsquelle
DE102004001884A1 (de) * 2004-01-14 2005-08-11 Applied Films Gmbh & Co. Kg Verdampfungseinrichtung für sublimierende Materialien
DE602005022665D1 (de) * 2004-10-21 2010-09-16 Lg Display Co Ltd Organische elektrolumineszente Vorrichtung und Herstellungsverfahren
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
JP6851143B2 (ja) * 2016-04-05 2021-03-31 株式会社アルバック 蒸発源、真空蒸着装置および真空蒸着方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL184420B (nl) * 1953-01-26 Farber Sidney Cancer Inst N-trifluoracetyladriamycinederivaten en werkwijze voor het bereiden van een farmaceutisch preparaat die ze bevatten.
US2875556A (en) * 1953-07-31 1959-03-03 Vig Corp Apparatus for molding refractory materials
US2743306A (en) * 1953-08-12 1956-04-24 Carborundum Co Induction furnace
CH406792A (de) * 1964-01-09 1966-01-31 Balzers Patent Beteilig Ag Ofen zur Behandlung von zu sinternden, wachsgebundenen Formkörpern
US3446936A (en) * 1966-01-03 1969-05-27 Sperry Rand Corp Evaporant source
JPS5941472A (ja) * 1982-08-31 1984-03-07 Ibiden Co Ltd 黒鉛ルツボ
US4550412A (en) * 1984-01-06 1985-10-29 The United States Of America As Represented By The United States Department Of Energy Carbon-free induction furnace
US5134261A (en) * 1990-03-30 1992-07-28 The United States Of America As Represented By The Secretary Of The Air Force Apparatus and method for controlling gradients in radio frequency heating

Also Published As

Publication number Publication date
DE69111593D1 (de) 1995-08-31
EP0510259A1 (de) 1992-10-28
JPH04308076A (ja) 1992-10-30
EP0510259B1 (de) 1995-07-26
KR940011707B1 (ko) 1994-12-23
US5272298A (en) 1993-12-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee