AU2522299A - Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source - Google Patents

Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source

Info

Publication number
AU2522299A
AU2522299A AU25222/99A AU2522299A AU2522299A AU 2522299 A AU2522299 A AU 2522299A AU 25222/99 A AU25222/99 A AU 25222/99A AU 2522299 A AU2522299 A AU 2522299A AU 2522299 A AU2522299 A AU 2522299A
Authority
AU
Australia
Prior art keywords
vaporized material
low pressure
under low
coating substrates
material under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
AU25222/99A
Inventor
Stefan Bangert
Thomas Baumecker
Elisabeth Budke
Reinhard Fischer
Helmut Grimm
Heinrich Grunwald
Franz-Joseph Helle
Jurgen Henrich
Jurgen Honekamp
Klaus Michael
Sonke Mitzlaff
Gert Rodling
Alexandra Rostek
Frank Schmidt
Jurgen Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Leybold Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Systems GmbH filed Critical Leybold Systems GmbH
Publication of AU2522299A publication Critical patent/AU2522299A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU25222/99A 1999-02-05 1999-02-05 Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source Withdrawn AU2522299A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP1999/000768 WO2000046418A1 (en) 1999-02-05 1999-02-05 Device for coating substrates with a vaporized material under low pressure or in a vacuum using a vaporized material source

Publications (1)

Publication Number Publication Date
AU2522299A true AU2522299A (en) 2000-08-25

Family

ID=8167209

Family Applications (1)

Application Number Title Priority Date Filing Date
AU25222/99A Withdrawn AU2522299A (en) 1999-02-05 1999-02-05 Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source

Country Status (2)

Country Link
AU (1) AU2522299A (en)
WO (1) WO2000046418A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10024827B4 (en) * 1999-11-17 2008-03-27 Applied Materials Gmbh & Co. Kg Electrode arrangement and its use
ATE256762T1 (en) 1999-11-17 2004-01-15 Applied Films Gmbh & Co Kg ELECTRODE ARRANGEMENT
FR2878863B1 (en) * 2004-12-07 2007-11-23 Addon Sa VACUUM DEPOSITION DEVICE WITH RECHARGEABLE RESERVOIR AND CORRESPONDING VACUUM DEPOSITION METHOD.

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60255971A (en) * 1984-05-30 1985-12-17 Mitsubishi Electric Corp Thin film forming apparatus
JPS63186865A (en) * 1987-01-28 1988-08-02 Ibiden Co Ltd Crucible for vapor deposition
JPH0247258A (en) * 1988-08-05 1990-02-16 Hitachi Ltd Evaporation source for forming thin film
CH678338A5 (en) * 1989-05-02 1991-08-30 Balzers Hochvakuum Vacuum deposition crucible preventing metal contamination - comprising insert of inner and outer vessels of different materials to prevent losses and stoppages
JPH04308076A (en) * 1991-04-03 1992-10-30 Mitsubishi Heavy Ind Ltd Vacuum deposition device for sublimable substance
DE4204938C1 (en) * 1992-02-19 1993-06-24 Leybold Ag, 6450 Hanau, De
DE4225169C2 (en) * 1992-07-30 1994-09-22 Juergen Dipl Phys Dr Gspann Device and method for generating agglomerate jets
DE4404550C2 (en) * 1994-02-12 2003-10-30 Applied Films Gmbh & Co Kg Arrangement for controlling the evaporation rate of crucibles
US6223683B1 (en) * 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating

Also Published As

Publication number Publication date
WO2000046418A1 (en) 2000-08-10

Similar Documents

Publication Publication Date Title
AU5733800A (en) A vacuum device for peeling off thin sheets
AU4204297A (en) Device for affixing a flat plate-shaped body onto a support
AU2001246414A1 (en) Process for coating a surface
AU1625901A (en) Flexible vacuum grabber for holding lesions
AU2163801A (en) Method and device for coating a substrate
AU2351000A (en) Acrylic terpolymer for the use as a self-fixturing adhesive
AU1604301A (en) Hydrophobic coating including dlc on substrate
AU2002224820A1 (en) Uv-resistant flocking adhesive for polymer substrates
AU1339401A (en) Method and apparatus for coating a substrate in a vacuum
AU2499501A (en) Method for forming a TIO2-x film on a material surface by using plasma immersion ion implantation and the use thereof
AU4183000A (en) Polyolefin film with embossed surface
AU1590701A (en) Method and apparatus for dynamically coating a substrate
AU1753601A (en) Apparatus for maintaining a fluid seal with a moving substrate
AU5599900A (en) Process for coating olefinic substrates
AU3717599A (en) A vacuum apparatus
CA2354925A1 (en) Apparatus and method for coating substrates
AU7553000A (en) Gumming device
AU2355901A (en) Plasma coating metals at atmospheric pressure
AU3359799A (en) Wearable clamp for releasably holding a napkin or other flexible substrate
AU2522299A (en) Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source
AU3969300A (en) Coating device
EP0953657A3 (en) Vaccum coating apparatus
AU7656600A (en) Adhesives for frozen substrates
AU5135598A (en) Process and device supplying substrates for vacuum coating
AU5732900A (en) A device for controllable stretching of thin materials

Legal Events

Date Code Title Description
MK13 Application withdrawn section 141(2)/reg 8.3(2) - pct appl. non-entering nat. phase, withdrawn by applicant