DE69200451D1 - Vorrichtung zum Verdampfen und Einspeisen einer Flüssigkeit. - Google Patents
Vorrichtung zum Verdampfen und Einspeisen einer Flüssigkeit.Info
- Publication number
- DE69200451D1 DE69200451D1 DE69200451T DE69200451T DE69200451D1 DE 69200451 D1 DE69200451 D1 DE 69200451D1 DE 69200451 T DE69200451 T DE 69200451T DE 69200451 T DE69200451 T DE 69200451T DE 69200451 D1 DE69200451 D1 DE 69200451D1
- Authority
- DE
- Germany
- Prior art keywords
- evaporating
- feeding
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/02—Feed or outlet devices therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/12—Mixing gases with gases with vaporisation of a liquid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3036707A JPH0795527B2 (ja) | 1991-02-05 | 1991-02-05 | 液体原料用気化供給器 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69200451D1 true DE69200451D1 (de) | 1994-11-03 |
DE69200451T2 DE69200451T2 (de) | 1995-02-02 |
Family
ID=12477244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69200451T Expired - Fee Related DE69200451T2 (de) | 1991-02-05 | 1992-02-04 | Vorrichtung zum Verdampfen und Einspeisen einer Flüssigkeit. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5272880A (de) |
EP (1) | EP0498622B1 (de) |
JP (1) | JPH0795527B2 (de) |
DE (1) | DE69200451T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69312436T2 (de) * | 1992-12-15 | 1998-02-05 | Applied Materials Inc | Verdampfung von flüssigen Reaktionspartnern für CVD |
US5455014A (en) * | 1993-07-20 | 1995-10-03 | Hughes Aircraft Company | Liquid deposition source gas delivery system |
US5520001A (en) * | 1994-02-20 | 1996-05-28 | Stec, Inc. | Vapor controller |
US5925189A (en) | 1995-12-06 | 1999-07-20 | Applied Materials, Inc. | Liquid phosphorous precursor delivery apparatus |
US5862605A (en) * | 1996-05-24 | 1999-01-26 | Ebara Corporation | Vaporizer apparatus |
KR100228768B1 (ko) * | 1996-10-02 | 1999-11-01 | 김영환 | 화학 기상증착 장치 및 증착방법 |
US6179277B1 (en) | 1998-02-27 | 2001-01-30 | Applied Materials, Inc. | Liquid vaporizer systems and methods for their use |
US6153540A (en) * | 1998-03-04 | 2000-11-28 | Applied Materials, Inc. | Method of forming phosphosilicate glass having a high wet-etch rate |
JP4393677B2 (ja) * | 1999-09-14 | 2010-01-06 | 株式会社堀場エステック | 液体材料気化方法および装置並びに制御バルブ |
US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
US7031600B2 (en) * | 2003-04-07 | 2006-04-18 | Applied Materials, Inc. | Method and apparatus for silicon oxide deposition on large area substrates |
US7253084B2 (en) * | 2004-09-03 | 2007-08-07 | Asm America, Inc. | Deposition from liquid sources |
JP4696561B2 (ja) * | 2005-01-14 | 2011-06-08 | 東京エレクトロン株式会社 | 気化装置及び処理装置 |
US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
US8328938B2 (en) | 2008-08-21 | 2012-12-11 | United Microelectronics Corp. | Buffer apparatus and thin film deposition system |
SG160262A1 (en) * | 2008-10-02 | 2010-04-29 | United Microelectronics Corp | Buffer apparatus and thin film deposition system |
US8012876B2 (en) | 2008-12-02 | 2011-09-06 | Asm International N.V. | Delivery of vapor precursor from solid source |
DE102011051931A1 (de) * | 2011-07-19 | 2013-01-24 | Aixtron Se | Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes |
JP6877188B2 (ja) * | 2017-03-02 | 2021-05-26 | 東京エレクトロン株式会社 | ガス供給装置、ガス供給方法及び成膜方法 |
JP6948803B2 (ja) | 2017-03-02 | 2021-10-13 | 東京エレクトロン株式会社 | ガス供給装置、ガス供給方法及び成膜方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1190436B (de) * | 1958-07-21 | 1965-04-08 | Renault | Vorrichtung zur Herstellung einer Gasatmosphaere |
FR2173378A5 (de) * | 1972-02-22 | 1973-10-05 | Coureau Jean Claude | |
GB2092908A (en) * | 1981-02-18 | 1982-08-25 | Nat Res Dev | Method and apparatus for delivering a controlled flow rate of reactant to a vapour deposition process |
US4450718A (en) * | 1982-04-19 | 1984-05-29 | Advanced Semiconductor Materials N.V. | Flow meter including improved laminar flow restrictor device therefor |
US4800754A (en) * | 1987-10-07 | 1989-01-31 | Sierra Instruments, Inc. | Wide-range, adjustable flowmeter |
DE3932151A1 (de) * | 1989-09-22 | 1991-04-04 | Peter Rohleder | Vorrichtung zur scannenden erfassung eines innenraums |
US5098741A (en) * | 1990-06-08 | 1992-03-24 | Lam Research Corporation | Method and system for delivering liquid reagents to processing vessels |
-
1991
- 1991-02-05 JP JP3036707A patent/JPH0795527B2/ja not_active Expired - Lifetime
-
1992
- 1992-01-16 US US07/822,179 patent/US5272880A/en not_active Expired - Lifetime
- 1992-02-04 EP EP92300942A patent/EP0498622B1/de not_active Expired - Lifetime
- 1992-02-04 DE DE69200451T patent/DE69200451T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0498622A2 (de) | 1992-08-12 |
JPH0795527B2 (ja) | 1995-10-11 |
EP0498622A3 (en) | 1993-03-17 |
JPH06132226A (ja) | 1994-05-13 |
EP0498622B1 (de) | 1994-09-28 |
DE69200451T2 (de) | 1995-02-02 |
US5272880A (en) | 1993-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |