DE69109503D1 - Verfahren zum Verbinden eines Diamantenfilms mit einem Substrat. - Google Patents

Verfahren zum Verbinden eines Diamantenfilms mit einem Substrat.

Info

Publication number
DE69109503D1
DE69109503D1 DE69109503T DE69109503T DE69109503D1 DE 69109503 D1 DE69109503 D1 DE 69109503D1 DE 69109503 T DE69109503 T DE 69109503T DE 69109503 T DE69109503 T DE 69109503T DE 69109503 D1 DE69109503 D1 DE 69109503D1
Authority
DE
Germany
Prior art keywords
substrate
diamond film
bonding
metal layer
cvd diamond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69109503T
Other languages
English (en)
Other versions
DE69109503T2 (de
Inventor
Ricardo Simon Sussmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Beers Industrial Diamond Division Pty Ltd
Original Assignee
De Beers Industrial Diamond Division Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Beers Industrial Diamond Division Pty Ltd filed Critical De Beers Industrial Diamond Division Pty Ltd
Publication of DE69109503D1 publication Critical patent/DE69109503D1/de
Application granted granted Critical
Publication of DE69109503T2 publication Critical patent/DE69109503T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
DE69109503T 1990-01-26 1991-01-25 Verfahren zum Verbinden eines Diamantenfilms mit einem Substrat. Expired - Fee Related DE69109503T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB909001833A GB9001833D0 (en) 1990-01-26 1990-01-26 Method of bonding a diamond film to a substrate

Publications (2)

Publication Number Publication Date
DE69109503D1 true DE69109503D1 (de) 1995-06-14
DE69109503T2 DE69109503T2 (de) 1995-11-09

Family

ID=10669965

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69109503T Expired - Fee Related DE69109503T2 (de) 1990-01-26 1991-01-25 Verfahren zum Verbinden eines Diamantenfilms mit einem Substrat.

Country Status (5)

Country Link
EP (1) EP0440384B1 (de)
AT (1) ATE122404T1 (de)
DE (1) DE69109503T2 (de)
GB (1) GB9001833D0 (de)
ZA (1) ZA91487B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2076086A1 (en) * 1991-09-27 1993-03-28 Randall J. Kehl Method for obtaining thick, adherent diamond coatings using metal interface screens
EP0589641A3 (en) * 1992-09-24 1995-09-27 Gen Electric Method of producing wear resistant articles
JPH0948694A (ja) * 1995-08-04 1997-02-18 Kobe Steel Ltd 単結晶ダイヤモンド膜の形成方法
JP3728467B2 (ja) * 1995-08-04 2005-12-21 株式会社神戸製鋼所 単結晶ダイヤモンド膜の形成方法
EP1419036A1 (de) * 2001-07-11 2004-05-19 Koninklijke Philips Electronics N.V. Schneidelement mit spitze mit zwei profilen
US7419702B2 (en) * 2004-03-31 2008-09-02 Tokyo Electron Limited Method for processing a substrate
US7812327B2 (en) 2004-10-01 2010-10-12 Bae Systems Plc High-emissivity radiator
EP1891429B1 (de) * 2006-04-20 2009-10-07 Delaware Capital Formation, Inc. Beschichtung für raue umgebungen und sensoren unter verwendung derselben
WO2015023356A1 (en) * 2013-08-12 2015-02-19 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Thin diamond film bonding providing low vapor pressure at high temperature

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE453474B (sv) * 1984-06-27 1988-02-08 Santrade Ltd Kompoundkropp belagd med skikt av polykristallin diamant
JPS622133A (ja) * 1985-06-28 1987-01-08 Shin Etsu Chem Co Ltd ミクロト−ム用ダイヤモンドコ−テイング刃およびその製造方法
JPH01153228A (ja) * 1987-12-10 1989-06-15 Asahi Daiyamondo Kogyo Kk 気相合成ダイヤモンド工具の製造法

Also Published As

Publication number Publication date
EP0440384A1 (de) 1991-08-07
DE69109503T2 (de) 1995-11-09
ZA91487B (en) 1991-11-27
GB9001833D0 (en) 1990-03-28
ATE122404T1 (de) 1995-05-15
EP0440384B1 (de) 1995-05-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee