DE69028248T2 - Elektronenstrahl-Belichtungsgerät - Google Patents
Elektronenstrahl-BelichtungsgerätInfo
- Publication number
- DE69028248T2 DE69028248T2 DE69028248T DE69028248T DE69028248T2 DE 69028248 T2 DE69028248 T2 DE 69028248T2 DE 69028248 T DE69028248 T DE 69028248T DE 69028248 T DE69028248 T DE 69028248T DE 69028248 T2 DE69028248 T2 DE 69028248T2
- Authority
- DE
- Germany
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- electron
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1144415A JPH039510A (ja) | 1989-06-07 | 1989-06-07 | 電子ビーム露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69028248D1 DE69028248D1 (de) | 1996-10-02 |
DE69028248T2 true DE69028248T2 (de) | 1997-01-30 |
Family
ID=15361642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69028248T Expired - Fee Related DE69028248T2 (de) | 1989-06-07 | 1990-06-07 | Elektronenstrahl-Belichtungsgerät |
Country Status (4)
Country | Link |
---|---|
US (1) | US5368613A (de) |
EP (1) | EP0402125B1 (de) |
JP (1) | JPH039510A (de) |
DE (1) | DE69028248T2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5546319A (en) * | 1994-01-28 | 1996-08-13 | Fujitsu Limited | Method of and system for charged particle beam exposure |
US5689117A (en) * | 1994-11-22 | 1997-11-18 | Nikon Corporation | Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus |
JPH09260243A (ja) * | 1996-03-19 | 1997-10-03 | Fujitsu Ltd | 荷電粒子ビーム露光方法及び装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3911321A (en) * | 1971-11-26 | 1975-10-07 | Ibm | Error compensating deflection coils in a conducting magnetic tube |
US4117339A (en) * | 1977-07-01 | 1978-09-26 | Burroughs Corporation | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices |
JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
JPS57112017A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Exposing device for electron beam |
US4395691A (en) * | 1982-03-04 | 1983-07-26 | Hughes Aircraft Company | Beam deflection system |
JPS60231324A (ja) * | 1984-04-28 | 1985-11-16 | Fujitsu Ltd | 電子ビ−ム露光装置 |
US4692579A (en) * | 1984-05-18 | 1987-09-08 | Hitachi, Ltd. | Electron beam lithography apparatus |
US4945246A (en) * | 1989-03-24 | 1990-07-31 | International Business Machines Corporation | Tri-deflection electron beam system |
-
1989
- 1989-06-07 JP JP1144415A patent/JPH039510A/ja active Pending
-
1990
- 1990-06-07 EP EP90306176A patent/EP0402125B1/de not_active Expired - Lifetime
- 1990-06-07 DE DE69028248T patent/DE69028248T2/de not_active Expired - Fee Related
-
1992
- 1992-09-21 US US07/947,963 patent/US5368613A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0402125A3 (de) | 1991-08-07 |
US5368613A (en) | 1994-11-29 |
EP0402125A2 (de) | 1990-12-12 |
DE69028248D1 (de) | 1996-10-02 |
JPH039510A (ja) | 1991-01-17 |
EP0402125B1 (de) | 1996-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |