DE69020704D1 - Verfahren zur Herstellung einer Anordnung und Maskgruppe dazu. - Google Patents

Verfahren zur Herstellung einer Anordnung und Maskgruppe dazu.

Info

Publication number
DE69020704D1
DE69020704D1 DE69020704T DE69020704T DE69020704D1 DE 69020704 D1 DE69020704 D1 DE 69020704D1 DE 69020704 T DE69020704 T DE 69020704T DE 69020704 T DE69020704 T DE 69020704T DE 69020704 D1 DE69020704 D1 DE 69020704D1
Authority
DE
Germany
Prior art keywords
producing
arrangement
mask group
group therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69020704T
Other languages
English (en)
Other versions
DE69020704T2 (de
Inventor
Jan Willem Gemmink
Wilhelmus Hendrikus Mar Geerts
Marcel Dissel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teledyne Dalsa Inc
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Publication of DE69020704D1 publication Critical patent/DE69020704D1/de
Application granted granted Critical
Publication of DE69020704T2 publication Critical patent/DE69020704T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/13625—Patterning using multi-mask exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69020704T 1989-12-20 1990-12-13 Verfahren zur Herstellung einer Anordnung und Maskgruppe dazu. Expired - Lifetime DE69020704T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8903108A NL8903108A (nl) 1989-12-20 1989-12-20 Werkwijze voor de vervaardiging van een inrichting en maskergroep voor de werkwijze.

Publications (2)

Publication Number Publication Date
DE69020704D1 true DE69020704D1 (de) 1995-08-10
DE69020704T2 DE69020704T2 (de) 1996-03-07

Family

ID=19855803

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69020704T Expired - Lifetime DE69020704T2 (de) 1989-12-20 1990-12-13 Verfahren zur Herstellung einer Anordnung und Maskgruppe dazu.

Country Status (5)

Country Link
EP (1) EP0434142B1 (de)
JP (1) JPH0772791B2 (de)
KR (1) KR100204194B1 (de)
DE (1) DE69020704T2 (de)
NL (1) NL8903108A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0683507B1 (de) * 1993-12-07 2002-05-29 Kabushiki Kaisha Toshiba Herstellungsverfahren für eine anzeigeanordnung
BE1007860A3 (nl) * 1993-12-08 1995-11-07 Koninkl Philips Electronics Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij deelpatronen bevattende fotomaskers op elkaar aansluitend worden geprojecteerd op een laag fotolak.
US5792591A (en) * 1993-12-08 1998-08-11 U.S. Philips Corporation Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
US5523580A (en) * 1993-12-23 1996-06-04 International Business Machines Corporation Reticle having a number of subfields
US5914205A (en) * 1996-12-27 1999-06-22 U.S. Philips Corporation Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
GB2382156A (en) * 2001-11-15 2003-05-21 Marconi Optical Components Ltd Manufacture of optical devices
KR100784665B1 (ko) * 2005-12-22 2007-12-12 두산메카텍 주식회사 기판의 분할증착용 마스크 장치 및 이를 이용한패턴형성방법
JP2011205042A (ja) * 2010-03-26 2011-10-13 Panasonic Electric Works Co Ltd プリント配線板の製造方法
FR2993097B1 (fr) * 2012-07-05 2015-05-22 Commissariat Energie Atomique Dispositif imageur cmos a geometrie optimisee et procede de realisation d'un tel dispositif par photocomposition
JP6745712B2 (ja) * 2016-11-30 2020-08-26 日東電工株式会社 配線回路基板およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4231811A (en) * 1979-09-13 1980-11-04 Intel Corporation Variable thickness self-aligned photoresist process
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
JP2794794B2 (ja) * 1989-06-19 1998-09-10 富士通株式会社 フォトマスク及びその製造方法

Also Published As

Publication number Publication date
KR910013480A (ko) 1991-08-08
KR100204194B1 (ko) 1999-06-15
EP0434142B1 (de) 1995-07-05
JPH0772791B2 (ja) 1995-08-02
JPH049846A (ja) 1992-01-14
NL8903108A (nl) 1991-07-16
EP0434142A1 (de) 1991-06-26
DE69020704T2 (de) 1996-03-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8327 Change in the person/name/address of the patent owner

Owner name: DALSA CORP., WATERLOO, ONTARIO, CA

8328 Change in the person/name/address of the agent

Representative=s name: W. KOENIG UND KOLLEGEN, 52072 AACHEN