DE69020534D1 - Polysilanzusammensetzung. - Google Patents

Polysilanzusammensetzung.

Info

Publication number
DE69020534D1
DE69020534D1 DE69020534T DE69020534T DE69020534D1 DE 69020534 D1 DE69020534 D1 DE 69020534D1 DE 69020534 T DE69020534 T DE 69020534T DE 69020534 T DE69020534 T DE 69020534T DE 69020534 D1 DE69020534 D1 DE 69020534D1
Authority
DE
Germany
Prior art keywords
polysilane composition
polysilane
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69020534T
Other languages
English (en)
Other versions
DE69020534T2 (de
Inventor
Masahiro Canon Kabushiki Kanai
Hisami Canon Kabushiki Tanaka
Harumi Canon Kabushiki K Sakou
Tatuyuki Canon Kabushiki Aoike
Kouichi Canon Kabushiki Matuda
Keishi Canon Kabushiki Saitou
Mituyuki Canon Kabushiki Niwa
Masafumi Canon Kabushiki Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1249021A external-priority patent/JPH03111854A/ja
Priority claimed from JP31900489A external-priority patent/JPH03181563A/ja
Priority claimed from JP1319003A external-priority patent/JPH03181562A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69020534D1 publication Critical patent/DE69020534D1/de
Application granted granted Critical
Publication of DE69020534T2 publication Critical patent/DE69020534T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/16—Halogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
DE69020534T 1989-09-27 1990-09-27 Polysilanzusammensetzung. Expired - Fee Related DE69020534T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP1249021A JPH03111854A (ja) 1989-09-27 1989-09-27 ポリシラン化合物を含有する表面層を有する電子写真用光受容部材
JP31900489A JPH03181563A (ja) 1989-12-11 1989-12-11 新規なポリシラン組成物
JP1319003A JPH03181562A (ja) 1989-12-11 1989-12-11 新規なポリシラン組成物
PCT/JP1990/001241 WO1991005018A1 (en) 1989-09-27 1990-09-27 Novel polysilane composition

Publications (2)

Publication Number Publication Date
DE69020534D1 true DE69020534D1 (de) 1995-08-03
DE69020534T2 DE69020534T2 (de) 1995-11-23

Family

ID=27333783

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69020534T Expired - Fee Related DE69020534T2 (de) 1989-09-27 1990-09-27 Polysilanzusammensetzung.

Country Status (4)

Country Link
US (1) US5358987A (de)
EP (1) EP0445306B1 (de)
DE (1) DE69020534T2 (de)
WO (1) WO1991005018A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5482656A (en) * 1993-03-04 1996-01-09 Kabushiki Kaisha Toshiba Non-linear optical devices employing a polysilane composition and a polysilane composition therefor
JP3098651B2 (ja) * 1993-03-31 2000-10-16 松下電器産業株式会社 高分子電気デバイス
DE69421007T2 (de) * 1993-06-18 2000-01-27 Nippon Oil Co Ltd Verfahren zur Herstellung eines Halbleitermaterials
US5997637A (en) * 1993-06-18 1999-12-07 Nippon Oil Co., Ltd. Method of producing a semiconducting material
US5549851A (en) * 1994-01-25 1996-08-27 Shin-Etsu Chemical Co., Ltd. Conductive polymer composition
JPH08167728A (ja) * 1994-12-14 1996-06-25 Nippon Oil Co Ltd 光起電力素子
DE10207859A1 (de) * 2002-02-20 2003-09-04 Univ Dresden Tech Dotiertes organisches Halbleitermaterial sowie Verfahren zu dessen Herstellung
JP2004091736A (ja) * 2002-09-03 2004-03-25 Nara Institute Of Science & Technology 光学活性ポリシラン、光学活性膜、および固体薄膜の光学特性の制御方法
JP4997688B2 (ja) * 2003-08-19 2012-08-08 セイコーエプソン株式会社 電極、薄膜トランジスタ、電子回路、表示装置および電子機器
US7485691B1 (en) * 2004-10-08 2009-02-03 Kovio, Inc Polysilane compositions, methods for their synthesis and films formed therefrom
WO2008045327A2 (en) 2006-10-06 2008-04-17 Kovio, Inc. Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers
JP4305513B2 (ja) * 2007-01-18 2009-07-29 セイコーエプソン株式会社 高次シラン組成物、膜付基板の製造方法、電気光学装置および電子デバイス

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588801A (en) * 1984-04-05 1986-05-13 The United States Of America As Represented By The United States Department Of Energy Polysilane positive photoresist materials and methods for their use
US4558801A (en) * 1984-08-09 1985-12-17 Vilutis & Co., Inc. Conforming liner
US4618551A (en) * 1985-01-25 1986-10-21 Xerox Corporation Photoresponsive imaging members with polysilylenes hole transporting compositions
JPS62269964A (ja) * 1986-05-19 1987-11-24 Mitsui Toatsu Chem Inc 電子写真感光体
DE3634281A1 (de) * 1986-10-08 1988-04-21 Basf Ag Elektrisch leitfaehige polysilane
JPH0820742B2 (ja) * 1987-03-30 1996-03-04 三井東圧化学株式会社 電子写真感光体
US4772525A (en) * 1987-05-01 1988-09-20 Xerox Corporation Photoresponsive imaging members with high molecular weight polysilylene hole transporting compositions
JPH01231059A (ja) * 1988-03-11 1989-09-14 Nippon Telegr & Teleph Corp <Ntt> 電子写真感光体
DE68921884T2 (de) * 1988-12-29 1995-08-10 Canon Kk Polysilanverbindung und daraus hergestellter elektrophotographischer photorezeptor.

Also Published As

Publication number Publication date
EP0445306A4 (en) 1992-03-11
DE69020534T2 (de) 1995-11-23
US5358987A (en) 1994-10-25
WO1991005018A1 (en) 1991-04-18
EP0445306A1 (de) 1991-09-11
EP0445306B1 (de) 1995-06-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee