DE69016076D1 - Verfahren zur Behandlung einer Metallfläche. - Google Patents

Verfahren zur Behandlung einer Metallfläche.

Info

Publication number
DE69016076D1
DE69016076D1 DE69016076T DE69016076T DE69016076D1 DE 69016076 D1 DE69016076 D1 DE 69016076D1 DE 69016076 T DE69016076 T DE 69016076T DE 69016076 T DE69016076 T DE 69016076T DE 69016076 D1 DE69016076 D1 DE 69016076D1
Authority
DE
Germany
Prior art keywords
treating
metal surface
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69016076T
Other languages
English (en)
Other versions
DE69016076T2 (de
Inventor
Nobuyuki Nishimiya
Toshiyuki Sekiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69016076D1 publication Critical patent/DE69016076D1/de
Application granted granted Critical
Publication of DE69016076T2 publication Critical patent/DE69016076T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/04—Esters of silicic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
DE69016076T 1989-04-03 1990-04-03 Verfahren zur Behandlung einer Metallfläche. Expired - Fee Related DE69016076T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8419389 1989-04-03

Publications (2)

Publication Number Publication Date
DE69016076D1 true DE69016076D1 (de) 1995-03-02
DE69016076T2 DE69016076T2 (de) 1995-06-01

Family

ID=13823637

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69016076T Expired - Fee Related DE69016076T2 (de) 1989-04-03 1990-04-03 Verfahren zur Behandlung einer Metallfläche.

Country Status (3)

Country Link
US (1) US5204143A (de)
EP (1) EP0391365B1 (de)
DE (1) DE69016076T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5360834A (en) * 1989-08-01 1994-11-01 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Process for photoinitiated control of inorganic network formation in the sol-gel process
JP2907643B2 (ja) * 1992-07-16 1999-06-21 富士写真フイルム株式会社 感光性平版印刷版およびその処理方法
US5378502A (en) * 1992-09-09 1995-01-03 U.S. Philips Corporation Method of chemically modifying a surface in accordance with a pattern
TW257785B (de) * 1993-05-17 1995-09-21 Dow Corning
US5637346A (en) * 1993-12-21 1997-06-10 Fuji Xerox Co., Ltd. Process for preparing a thin ferroelectric or para-dielectric oxide film
JPH09269593A (ja) * 1996-04-01 1997-10-14 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4096138B2 (ja) * 1999-04-12 2008-06-04 Ｊｓｒ株式会社 レジスト下層膜用組成物の製造方法
US6284391B1 (en) 1999-07-12 2001-09-04 Corning Incorporated Mercaptofunctional silanes to deposit sol-gel coatings on metals
FR2804973B1 (fr) * 2000-02-11 2002-09-20 Univ Paris 7 Denis Diderot Materiau metallique dont la surface est modifiee, son procede de preparation et utilisation du materiau modifie
US7063935B2 (en) * 2002-03-26 2006-06-20 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
DE10300751A1 (de) * 2003-01-11 2004-07-22 Chemetall Gmbh Verfahren zur Beschichtung von metallischen Oberflächen, Beschichtungszusammensetzung und derart hergestellte Überzüge
US20040225079A1 (en) * 2003-05-05 2004-11-11 Analytical Services And Materials Inc. Erosion-resistant silicone coatings
US7033673B2 (en) * 2003-07-25 2006-04-25 Analytical Services & Materials, Inc. Erosion-resistant silicone coatings for protection of fluid-handling parts
US7829410B2 (en) * 2007-11-26 2010-11-09 Micron Technology, Inc. Methods of forming capacitors, and methods of forming DRAM arrays
EP2651569B1 (de) * 2010-12-15 2017-03-08 Advanced Bionics AG Schutz für implantierte goldschichten
CN104334351B (zh) 2012-06-05 2016-08-17 爱克发印艺公司 平版印刷版前体
CN105369232B (zh) * 2015-02-16 2018-09-28 许昌学院 基于铅单质薄膜原位大面积控制合成钙钛矿型CH3NH3PbBr3薄膜材料的化学方法
CN115161647B (zh) * 2022-07-13 2023-07-21 江苏富乐华半导体科技股份有限公司 一种改善覆铜陶瓷基板焊接后铜面氧化的方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170157A (ja) * 1983-03-18 1984-09-26 Toray Silicone Co Ltd プライマ−組成物
US4529659A (en) * 1983-11-05 1985-07-16 Nippon Telegraph & Telephone Public Corporation Magnetic recording member and process for manufacturing the same
DE3407093A1 (de) * 1984-02-28 1985-08-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur passivierung einer metallischen oberflaeche
US4656097A (en) * 1985-08-19 1987-04-07 Claffey William J Post treatment of phosphated metal surfaces by organic titanates
US4753827A (en) * 1986-10-03 1988-06-28 Ppg Industries, Inc. Abrasion-resistant organosiloxane/metal oxide coating
WO1988005473A1 (en) * 1987-01-27 1988-07-28 Dynamic Disk, Inc. Metal surface coating

Also Published As

Publication number Publication date
EP0391365A1 (de) 1990-10-10
US5204143A (en) 1993-04-20
DE69016076T2 (de) 1995-06-01
EP0391365B1 (de) 1995-01-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee