DE68926549D1 - Tl-Kupferoxid-Supraleiter - Google Patents

Tl-Kupferoxid-Supraleiter

Info

Publication number
DE68926549D1
DE68926549D1 DE68926549T DE68926549T DE68926549D1 DE 68926549 D1 DE68926549 D1 DE 68926549D1 DE 68926549 T DE68926549 T DE 68926549T DE 68926549 T DE68926549 T DE 68926549T DE 68926549 D1 DE68926549 D1 DE 68926549D1
Authority
DE
Germany
Prior art keywords
copper oxide
oxide superconductor
superconductor
copper
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68926549T
Other languages
English (en)
Other versions
DE68926549T2 (de
Inventor
Hideo C O Electrotechnic Ihara
Masayuki C O Elect Hirabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Application granted granted Critical
Publication of DE68926549D1 publication Critical patent/DE68926549D1/de
Publication of DE68926549T2 publication Critical patent/DE68926549T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/45—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides
    • C04B35/4512—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides containing thallium oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0436—Processes for depositing or forming copper oxide superconductor layers by chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic superconductors
    • H10N60/857—Ceramic superconductors comprising copper oxide

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
DE68926549T 1988-06-01 1989-02-16 Tl-Kupferoxid-Supraleiter Expired - Fee Related DE68926549T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63134909A JPH01305816A (ja) 1988-06-01 1988-06-01 高温超伝導体

Publications (2)

Publication Number Publication Date
DE68926549D1 true DE68926549D1 (de) 1996-07-04
DE68926549T2 DE68926549T2 (de) 1996-10-31

Family

ID=15139365

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68926549T Expired - Fee Related DE68926549T2 (de) 1988-06-01 1989-02-16 Tl-Kupferoxid-Supraleiter

Country Status (3)

Country Link
EP (1) EP0344406B1 (de)
JP (1) JPH01305816A (de)
DE (1) DE68926549T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68914817T2 (de) * 1988-12-05 1994-10-27 Sumitomo Electric Industries Oxydisches supraleitendes Material, dessen Herstellungsprozess und Anwendung.
GB2232664A (en) * 1989-06-17 1990-12-19 Atomic Energy Authority Uk Oxide materials
JPH0365512A (ja) * 1989-08-02 1991-03-20 Sumitomo Electric Ind Ltd 高温超電導材料およびその作製方法
JP2748161B2 (ja) * 1989-09-04 1998-05-06 株式会社日立製作所 Ｉｎ―Ｂａ―Ｙ及び／又はＣａ―Ｃｕ―Ｏ系超電導物質

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061683A (en) * 1987-06-09 1991-10-29 E. I. Du Pont De Nemours And Company Process for making superconductors using barium hydroxide
DE3889024T2 (de) * 1987-07-13 1994-10-13 Sumitomo Electric Industries Verfahren zum Herstellen einer supraleitenden Dünnschicht.
US4870052A (en) * 1988-03-08 1989-09-26 International Business Machines Corporation Tl-Ca-Ba-Cu-O compositions electrically superconducting above 120 degree K and processes for their preparation
JP2634187B2 (ja) * 1988-04-13 1997-07-23 株式会社フジクラ タリウム系酸化物超電導体の製造方法
JP2509672B2 (ja) * 1988-05-20 1996-06-26 住友電気工業株式会社 複合酸化物系超電導材料の製造方法
JP2656855B2 (ja) * 1989-12-28 1997-09-24 ローガン，キャスリン・ブイ ＴｉＢ▲下２▼及びＡｌ▲下２▼Ｏ▲下３▼の造形された発泡耐火性生成物並びにその製造方法

Also Published As

Publication number Publication date
EP0344406A3 (en) 1990-07-18
DE68926549T2 (de) 1996-10-31
JPH0574531B2 (de) 1993-10-18
EP0344406B1 (de) 1996-05-29
EP0344406A2 (de) 1989-12-06
JPH01305816A (ja) 1989-12-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee