DE68925605D1 - Belichtungsvorrichtung und Steuerung derselben - Google Patents

Belichtungsvorrichtung und Steuerung derselben

Info

Publication number
DE68925605D1
DE68925605D1 DE68925605T DE68925605T DE68925605D1 DE 68925605 D1 DE68925605 D1 DE 68925605D1 DE 68925605 T DE68925605 T DE 68925605T DE 68925605 T DE68925605 T DE 68925605T DE 68925605 D1 DE68925605 D1 DE 68925605D1
Authority
DE
Germany
Prior art keywords
control
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68925605T
Other languages
English (en)
Other versions
DE68925605T2 (de
Inventor
Eigo Kawakami
Kunitaka Ozawa
Koji Uda
Isamu Shimoda
Shunichi Uzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68925605D1 publication Critical patent/DE68925605D1/de
Application granted granted Critical
Publication of DE68925605T2 publication Critical patent/DE68925605T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
DE68925605T 1988-09-09 1989-09-06 Belichtungsvorrichtung und Steuerung derselben Expired - Fee Related DE68925605T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63224711A JP2631395B2 (ja) 1988-09-09 1988-09-09 露光装置の制御方法

Publications (2)

Publication Number Publication Date
DE68925605D1 true DE68925605D1 (de) 1996-03-21
DE68925605T2 DE68925605T2 (de) 1996-07-04

Family

ID=16818051

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68925605T Expired - Fee Related DE68925605T2 (de) 1988-09-09 1989-09-06 Belichtungsvorrichtung und Steuerung derselben

Country Status (4)

Country Link
US (1) US5008703A (de)
EP (1) EP0358467B1 (de)
JP (1) JP2631395B2 (de)
DE (1) DE68925605T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69123610T2 (de) * 1990-02-02 1997-04-24 Canon Kk Belichtungsverfahren
JPH03273663A (ja) * 1990-03-23 1991-12-04 Canon Inc 基板保持装置
DE59105735D1 (de) * 1990-05-02 1995-07-20 Fraunhofer Ges Forschung Belichtungsvorrichtung.
JPH0737786A (ja) * 1993-07-21 1995-02-07 Canon Inc ステージ位置決め制御方法
EP0715215B1 (de) * 1994-11-29 2001-05-30 Canon Kabushiki Kaisha Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3391940B2 (ja) * 1995-06-26 2003-03-31 キヤノン株式会社 照明装置及び露光装置
JP3320275B2 (ja) * 1995-08-29 2002-09-03 キヤノン株式会社 露光装置
JP3634487B2 (ja) * 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
US5920398A (en) * 1996-03-01 1999-07-06 Canon Kabushiki Kaisha Surface position detecting method and scanning exposure method using the same
US6559465B1 (en) * 1996-08-02 2003-05-06 Canon Kabushiki Kaisha Surface position detecting method having a detection timing determination
JP3337921B2 (ja) 1996-08-23 2002-10-28 キヤノン株式会社 投影露光装置および位置合せ方法
KR20010032714A (ko) * 1997-12-03 2001-04-25 오노 시게오 기판 반송방법 및 기판 반송장치, 이것을 구비한 노광장치및 이 노광장치를 이용한 디바이스 제조방법
US6195621B1 (en) * 1999-02-09 2001-02-27 Roger L. Bottomfield Non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components
JP6308715B2 (ja) * 2012-09-27 2018-04-11 株式会社アドテックエンジニアリング 露光描画装置、移動制御方法およびプログラム
CN110850687B (zh) * 2019-11-27 2021-06-11 江苏影速集成电路装备股份有限公司 一种控制平台出板距离的激光直写曝光系统及曝光方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6032050A (ja) * 1983-08-02 1985-02-19 Canon Inc 露光装置
US4653903A (en) * 1984-01-24 1987-03-31 Canon Kabushiki Kaisha Exposure apparatus
US4669867A (en) * 1984-02-20 1987-06-02 Canon Kabushiki Kaisha Alignment and exposure apparatus
WO1986000427A1 (en) * 1984-06-21 1986-01-16 American Telephone & Telegraph Company Deep-uv lithography
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPS6225418A (ja) * 1985-07-25 1987-02-03 Canon Inc 半導体製造装置
JPS6370436A (ja) * 1986-09-11 1988-03-30 Canon Inc ウエハ位置決め装置

Also Published As

Publication number Publication date
EP0358467A2 (de) 1990-03-14
JP2631395B2 (ja) 1997-07-16
US5008703A (en) 1991-04-16
EP0358467B1 (de) 1996-02-07
DE68925605T2 (de) 1996-07-04
JPH0273616A (ja) 1990-03-13
EP0358467A3 (en) 1990-10-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee