DE68922459T2 - Copolymere aus 4-Hydroxystyren und alkylsubstituiertem 4-Hydroxystyren. - Google Patents

Copolymere aus 4-Hydroxystyren und alkylsubstituiertem 4-Hydroxystyren.

Info

Publication number
DE68922459T2
DE68922459T2 DE68922459T DE68922459T DE68922459T2 DE 68922459 T2 DE68922459 T2 DE 68922459T2 DE 68922459 T DE68922459 T DE 68922459T DE 68922459 T DE68922459 T DE 68922459T DE 68922459 T2 DE68922459 T2 DE 68922459T2
Authority
DE
Germany
Prior art keywords
hydroxystyrene
alkyl
substituted
copolymers
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68922459T
Other languages
English (en)
Other versions
DE68922459D1 (de
Inventor
Richard Vicari
Douglas J Gordon
William D Hinsberg
Kean Dennis R Mc
Carlton G Willson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant Finance BVI Ltd
Original Assignee
Hoechst Celanese Corp
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp, International Business Machines Corp filed Critical Hoechst Celanese Corp
Application granted granted Critical
Publication of DE68922459D1 publication Critical patent/DE68922459D1/de
Publication of DE68922459T2 publication Critical patent/DE68922459T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/22—Oxygen
    • C08F212/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68922459T 1988-10-21 1989-10-20 Copolymere aus 4-Hydroxystyren und alkylsubstituiertem 4-Hydroxystyren. Expired - Fee Related DE68922459T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26084188A 1988-10-21 1988-10-21

Publications (2)

Publication Number Publication Date
DE68922459D1 DE68922459D1 (de) 1995-06-08
DE68922459T2 true DE68922459T2 (de) 1995-11-09

Family

ID=22990841

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68922459T Expired - Fee Related DE68922459T2 (de) 1988-10-21 1989-10-20 Copolymere aus 4-Hydroxystyren und alkylsubstituiertem 4-Hydroxystyren.

Country Status (5)

Country Link
EP (1) EP0365340B1 (de)
JP (2) JP2524228B2 (de)
AT (1) ATE122061T1 (de)
CA (1) CA2000710A1 (de)
DE (1) DE68922459T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950004908B1 (ko) * 1992-09-09 1995-05-15 삼성전자주식회사 포토 레지스트 조성물 및 이를 이용한 패턴형성방법
WO1995010073A1 (en) * 1993-10-04 1995-04-13 Hoechst Celanese Corporation Novolak/polyhydroxystyrene copolymer and photoresist compositions
ES2533713T3 (es) * 2009-07-01 2015-04-14 Bridgestone Corporation Procedimiento para producir un interpolímero funcionalizado con hidroxiarilo por polimerización iniciada por radicales libres
JP7215005B2 (ja) * 2018-07-23 2023-01-31 日本ゼオン株式会社 重合体及びその製造方法、ポジ型レジスト組成物、並びにレジストパターン形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB948961A (en) * 1960-01-22 1964-02-05 Nat Res Dev Polymers derived from polyvinyl phenol
GB1509354A (en) * 1976-04-24 1978-05-04 Maruzen Oil Co Ltd Process for purifying halogenated alkenyl-phenol polymers
JPS6059259B2 (ja) * 1977-07-11 1985-12-24 丸善石油株式会社 安定化された合成樹脂組成物
GB2000785B (en) * 1977-07-04 1982-01-27 Maruzen Oil Co Ltd Stabilized polymer composition
JPS5414451A (en) * 1977-07-04 1979-02-02 Cosmo Co Ltd Stabilized synthetic resin composition
JPS5631405A (en) * 1979-08-22 1981-03-30 Asahi Glass Co Ltd Selective perameable membrane
EP0260104A3 (de) * 1986-09-09 1989-03-15 Celanese Corporation Verfahren zur Herstellung von Polyvinylphenol durch gleichzeitige Methanolyse und Polymerisation von 4-Acetoxystyren
EP0361907A3 (de) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photolack-Zusammensetzung mit Bildumkehr für tiefes UV

Also Published As

Publication number Publication date
EP0365340A3 (de) 1991-05-29
JPH0770241A (ja) 1995-03-14
JP2524228B2 (ja) 1996-08-14
ATE122061T1 (de) 1995-05-15
CA2000710A1 (en) 1990-04-21
EP0365340B1 (de) 1995-05-03
EP0365340A2 (de) 1990-04-25
JPH02166105A (ja) 1990-06-26
DE68922459D1 (de) 1995-06-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CLARIANT FINANCE (BVI) LTD., ROAD TOWN, TORTOLA, V

8328 Change in the person/name/address of the agent

Free format text: SPOTT WEINMILLER & PARTNER, 80336 MUENCHEN

8339 Ceased/non-payment of the annual fee