DE68919299D1 - Sinterkörper aus Zinkoxid und seine Herstellung. - Google Patents
Sinterkörper aus Zinkoxid und seine Herstellung.Info
- Publication number
- DE68919299D1 DE68919299D1 DE68919299T DE68919299T DE68919299D1 DE 68919299 D1 DE68919299 D1 DE 68919299D1 DE 68919299 T DE68919299 T DE 68919299T DE 68919299 T DE68919299 T DE 68919299T DE 68919299 D1 DE68919299 D1 DE 68919299D1
- Authority
- DE
- Germany
- Prior art keywords
- zinc oxide
- sintered body
- oxide sintered
- valency
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
- H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Insulating Materials (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19715788 | 1988-08-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68919299D1 true DE68919299D1 (de) | 1994-12-15 |
DE68919299T2 DE68919299T2 (de) | 1995-04-06 |
Family
ID=16369716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68919299T Expired - Lifetime DE68919299T2 (de) | 1988-08-09 | 1989-08-09 | Sinterkörper aus Zinkoxid und seine Herstellung. |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0354769B1 (de) |
KR (1) | KR950006208B1 (de) |
AT (1) | ATE113932T1 (de) |
DE (1) | DE68919299T2 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4853594A (en) * | 1988-08-10 | 1989-08-01 | Rogers Corporation | Electroluminescent lamp |
JP2707325B2 (ja) * | 1989-06-21 | 1998-01-28 | 三井金属鉱業株式会社 | 白色導電性酸化亜鉛の製造方法 |
JP2840856B2 (ja) * | 1989-06-26 | 1998-12-24 | 三井金属鉱業株式会社 | 針状導電性酸化亜鉛及びその製造方法 |
JPH0688218A (ja) * | 1990-11-15 | 1994-03-29 | Tosoh Corp | 酸化亜鉛系焼結体及びその製造方法並びに用途 |
US5171411A (en) * | 1991-05-21 | 1992-12-15 | The Boc Group, Inc. | Rotating cylindrical magnetron structure with self supporting zinc alloy target |
DE10306925A1 (de) * | 2003-02-19 | 2004-09-02 | GfE Gesellschaft für Elektrometallurgie mbH | PVD-Beschichtungsmaterial |
JP5125162B2 (ja) | 2007-03-16 | 2013-01-23 | 住友化学株式会社 | 透明導電膜用材料 |
EP2301904B1 (de) | 2008-07-15 | 2012-11-07 | Tosoh Corporation | Gesintertes komplexes oxid, verfahren zur herstellung des gesinterten komplexen oxids, sputtering-target und verfahren zur dünnfilmherstellung |
FR2972440B1 (fr) | 2011-03-07 | 2013-03-29 | Commissariat Energie Atomique | Procede de formation d'un oxyde metallique dope |
KR101731847B1 (ko) * | 2011-07-01 | 2017-05-08 | 우베 마테리알즈 가부시키가이샤 | 스퍼터링용 MgO 타겟 |
KR20190065483A (ko) * | 2012-03-30 | 2019-06-11 | 제이엑스금속주식회사 | 스퍼터링 타깃 및 그 제조 방법 |
CN108546936B (zh) * | 2018-05-09 | 2020-01-31 | 武汉理工大学 | 一种低温制备高性能ZnO基透明导电氧化物薄膜的方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0731950B2 (ja) * | 1985-11-22 | 1995-04-10 | 株式会社リコー | 透明導電膜の製造方法 |
JPS63175304A (ja) * | 1987-01-14 | 1988-07-19 | 富士通株式会社 | 透明電極用スパツタタ−ゲツトの製造方法 |
-
1989
- 1989-08-09 EP EP89308069A patent/EP0354769B1/de not_active Expired - Lifetime
- 1989-08-09 AT AT89308069T patent/ATE113932T1/de not_active IP Right Cessation
- 1989-08-09 KR KR1019890011327A patent/KR950006208B1/ko not_active IP Right Cessation
- 1989-08-09 DE DE68919299T patent/DE68919299T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR900003064A (ko) | 1990-03-23 |
DE68919299T2 (de) | 1995-04-06 |
ATE113932T1 (de) | 1994-11-15 |
EP0354769A3 (de) | 1991-11-21 |
EP0354769A2 (de) | 1990-02-14 |
EP0354769B1 (de) | 1994-11-09 |
KR950006208B1 (ko) | 1995-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |