DE68915168D1 - Wärmestabile phenol-harzzusammensetzungen und deren verwendung bei lichtempfindlichen zusammensetzungen. - Google Patents

Wärmestabile phenol-harzzusammensetzungen und deren verwendung bei lichtempfindlichen zusammensetzungen.

Info

Publication number
DE68915168D1
DE68915168D1 DE68915168T DE68915168T DE68915168D1 DE 68915168 D1 DE68915168 D1 DE 68915168D1 DE 68915168 T DE68915168 T DE 68915168T DE 68915168 T DE68915168 T DE 68915168T DE 68915168 D1 DE68915168 D1 DE 68915168D1
Authority
DE
Germany
Prior art keywords
compositions
heat
light
phenol resin
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68915168T
Other languages
English (en)
Other versions
DE68915168T2 (de
Inventor
Andrew Blakeney
Thomas Sarubbi
Joseph Sizensky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OCG Microelectronic Materials Inc
Original Assignee
OCG Microelectronic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OCG Microelectronic Materials Inc filed Critical OCG Microelectronic Materials Inc
Application granted granted Critical
Publication of DE68915168D1 publication Critical patent/DE68915168D1/de
Publication of DE68915168T2 publication Critical patent/DE68915168T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • C08K5/42—Sulfonic acids; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/06—Unsaturated polyesters having carbon-to-carbon unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
DE68915168T 1988-07-11 1989-07-07 Wärmestabile phenol-harzzusammensetzungen und deren verwendung bei lichtempfindlichen zusammensetzungen. Expired - Fee Related DE68915168T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/217,512 US4959292A (en) 1988-07-11 1988-07-11 Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde
PCT/US1989/002961 WO1990000571A1 (en) 1988-07-11 1989-07-07 Thermally stable phenolic resin compositions and their use in light-sensitive compositions

Publications (2)

Publication Number Publication Date
DE68915168D1 true DE68915168D1 (de) 1994-06-09
DE68915168T2 DE68915168T2 (de) 1994-12-01

Family

ID=22811389

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68915168T Expired - Fee Related DE68915168T2 (de) 1988-07-11 1989-07-07 Wärmestabile phenol-harzzusammensetzungen und deren verwendung bei lichtempfindlichen zusammensetzungen.

Country Status (6)

Country Link
US (1) US4959292A (de)
EP (1) EP0424464B1 (de)
JP (1) JP2617594B2 (de)
AU (1) AU4033689A (de)
DE (1) DE68915168T2 (de)
WO (1) WO1990000571A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JPH03294861A (ja) * 1990-04-13 1991-12-26 Mitsubishi Petrochem Co Ltd ポジ型フォトレジスト組成物
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
JP3324898B2 (ja) * 1995-02-24 2002-09-17 東京応化工業株式会社 ポジ型レジストパターンの製造方法
JP3666839B2 (ja) * 1998-01-23 2005-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物およびその製造方法
FR2813886B1 (fr) * 2000-09-08 2005-04-15 Ceca Sa Resines novolaques, leur procede de preparation et leurs utilisations
US6790582B1 (en) * 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6905809B2 (en) * 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051335A (de) * 1962-07-27
GB1069983A (en) * 1962-11-19 1967-05-24 Hooker Chemical Corp Phenolic resins for elastomer compositions
NL6711158A (de) * 1966-08-17 1968-02-19
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
US4189610A (en) * 1977-10-31 1980-02-19 Monsanto Company Preparation of 4,4-dioxy-substituted stilbenes
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
EP0032060B1 (de) * 1979-12-27 1984-10-24 Mitsui Petrochemical Industries, Ltd. Novolakharz enthaltende Zusammensetzung und daraus gebildete Gegenstände
EP0054258B1 (de) * 1980-12-17 1986-03-05 Konica Corporation Lichtempfindliche Zusammensetzungen
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
CA1279430C (en) * 1985-12-06 1991-01-22 Takashi Kubota High-molecular-weight soluble novolak resin and process for preparation thereof

Also Published As

Publication number Publication date
JPH04500533A (ja) 1992-01-30
AU4033689A (en) 1990-02-05
WO1990000571A1 (en) 1990-01-25
JP2617594B2 (ja) 1997-06-04
DE68915168T2 (de) 1994-12-01
US4959292A (en) 1990-09-25
EP0424464A1 (de) 1991-05-02
EP0424464B1 (de) 1994-05-04
EP0424464A4 (en) 1991-09-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee