DE60324157D1 - Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster. - Google Patents

Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster.

Info

Publication number
DE60324157D1
DE60324157D1 DE60324157T DE60324157T DE60324157D1 DE 60324157 D1 DE60324157 D1 DE 60324157D1 DE 60324157 T DE60324157 T DE 60324157T DE 60324157 T DE60324157 T DE 60324157T DE 60324157 D1 DE60324157 D1 DE 60324157D1
Authority
DE
Germany
Prior art keywords
resistant
alkali
liquid
coating composition
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60324157T
Other languages
English (en)
Inventor
Helmut Schmidt
Carsten Becker-Willinger
Pamela Kalmes
Etsuko Hino
Norio Ohkuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Canon Inc
Original Assignee
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH, Canon Inc filed Critical Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Application granted granted Critical
Publication of DE60324157D1 publication Critical patent/DE60324157D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31525—Next to glass or quartz
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31529—Next to metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
DE60324157T 2003-07-22 2003-07-22 Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster. Expired - Lifetime DE60324157D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2003/007998 WO2005014745A1 (en) 2003-07-22 2003-07-22 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming

Publications (1)

Publication Number Publication Date
DE60324157D1 true DE60324157D1 (de) 2008-11-27

Family

ID=34129880

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60324157T Expired - Lifetime DE60324157D1 (de) 2003-07-22 2003-07-22 Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster.

Country Status (10)

Country Link
US (1) US7985477B2 (de)
EP (1) EP1532219B1 (de)
JP (1) JP4773825B2 (de)
CN (1) CN100404633C (de)
AT (1) ATE411367T1 (de)
AU (1) AU2003257490A1 (de)
DE (1) DE60324157D1 (de)
ES (1) ES2316877T3 (de)
TW (1) TWI339673B (de)
WO (1) WO2005014745A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100404633C (zh) 2003-07-22 2008-07-23 佳能株式会社 抗液性、耐碱性涂料组合物和适用于图案形成的涂层
AU2003254564A1 (en) * 2003-07-22 2005-02-25 Canon Kabushiki Kaisha Liquid-repellent coating composition and coating having high alkali resistance
CN1741905B (zh) * 2003-07-22 2012-11-28 佳能株式会社 喷墨头及其制造方法
ATE465008T1 (de) 2003-07-22 2010-05-15 Canon Kk Tintenstrahlkopf und herstellungsverfahren dafür
DE102005002960A1 (de) 2005-01-21 2006-08-03 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität
GB2425508A (en) * 2005-04-28 2006-11-01 Lafarge Roofing Technical Centers Ltd Method and plant for manufacture of cementitious products
GB0513910D0 (en) 2005-07-07 2005-08-10 Univ Newcastle Immobilisation of biological molecules
US8722074B2 (en) 2005-07-19 2014-05-13 Boston Scientific Scimed, Inc. Medical devices containing radiation resistant polymers
GB2428604B (en) * 2005-08-05 2010-12-08 Visteon Global Tech Inc Anti-Fouling coating
DE102006033280A1 (de) 2006-07-18 2008-01-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrostrukturierte Schichten
US8322754B2 (en) * 2006-12-01 2012-12-04 Tenaris Connections Limited Nanocomposite coatings for threaded connections
DE102007016659B8 (de) * 2007-04-04 2015-12-03 Tricumed Medizintechnik Gmbh Infusionspumpe, Kanalplatte für eine Infusionspumpe und Verfahren zu ihrer Herstellung
WO2009013872A1 (ja) * 2007-07-23 2009-01-29 Panasonic Corporation 保護膜付きレンズ及びその製造方法
EP2712900A1 (de) * 2008-03-11 2014-04-02 3M Innovative Properties Company Fotomasken mit Schutzschicht
TWI388929B (zh) 2008-08-01 2013-03-11 Asahi Glass Co Ltd A negative photosensitive composition, a partition member for an optical element using the same, and an optical element having the partition wall
JP2010138372A (ja) * 2008-11-13 2010-06-24 Seiko Epson Corp 樹脂組成物
EP2456823A4 (de) 2009-07-21 2012-12-26 3M Innovative Properties Co Härtbare zusammensetzung, verfahren zur beschichtung eines lichtwerkzeugs und beschichtetes lichtwerkzeug
US8420281B2 (en) 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
US8748060B2 (en) 2009-09-16 2014-06-10 3M Innovative Properties Company Fluorinated coating and phototools made therewith
CN102549042B (zh) 2009-09-16 2015-01-28 3M创新有限公司 氟化涂料和用其制作的底片
DE102009058651A1 (de) 2009-12-16 2011-06-22 Leibniz-Institut für Neue Materialien gemeinnützige GmbH, 66123 Vorrichtung mit steuerbarer Adhäsion
WO2012077770A1 (ja) * 2010-12-10 2012-06-14 旭硝子株式会社 ネガ型感光性樹脂組成物、光学素子用隔壁およびその製造方法、該隔壁を有する光学素子の製造方法、ならびに、撥インク剤溶液
US10244882B2 (en) * 2013-12-06 2019-04-02 Kims Holding Co., Ltd. Cooking vessel and method for manufacturing the same
AR100953A1 (es) 2014-02-19 2016-11-16 Tenaris Connections Bv Empalme roscado para una tubería de pozo de petróleo
EP3152620B1 (de) * 2014-06-03 2018-08-01 The Chemours Company FC, LLC Passivierungsschicht mit einem photovernetzten fluorpolymer
MX2017001304A (es) * 2014-08-15 2017-04-27 Halliburton Energy Services Inc Aditivos de resina epoxi a base de naftol para uso en la cementacion de pozos.
EP3035122B1 (de) 2014-12-16 2019-03-20 ATOTECH Deutschland GmbH Verfahren zur Feinleiterherstellung
CN104962141B (zh) * 2015-07-02 2017-05-03 上海嘉宝莉涂料有限公司 一种内墙抗碱底漆及其制造方法
ES2597749B1 (es) * 2015-07-20 2017-12-26 Bsh Electrodomésticos España, S.A. Componente de aparato doméstico que comprende un elemento base con un recubrimiento funcional
US11059740B2 (en) 2017-06-02 2021-07-13 Guardian Glass, LLC Glass article containing a coating with an interpenetrating polymer network
CN109536014A (zh) * 2017-09-22 2019-03-29 北京大学深圳研究生院 一种超硬韧性涂层的制备方法
KR20200054551A (ko) * 2018-11-12 2020-05-20 주식회사 포스코 유-무기 복합코팅 조성물 및 이를 이용하여 표면처리된 아연도금강판
KR20200090586A (ko) * 2019-01-21 2020-07-29 삼성전자주식회사 코팅액, 필름, 박막 트랜지스터 및 전자 장치
CN110818448A (zh) * 2019-11-19 2020-02-21 石家庄市油漆厂 一种混凝土表面渗透固结型自修复涂料及其制备方法
US20210364916A1 (en) * 2020-05-21 2021-11-25 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist composition and method of forming photoresist pattern
NL2033409B1 (en) * 2022-10-28 2024-05-17 Erich Grafmonumenten Improved gravestones

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0830169B2 (ja) 1986-08-19 1996-03-27 日本合成ゴム株式会社 コ−テイング用組成物
US4994299A (en) * 1989-06-22 1991-02-19 General Electric Company Substantially odor free, UV curable organopolysiloxane release coating compositions and coating method
US5057550A (en) * 1989-12-04 1991-10-15 Dow Corning Corporation Epoxy-silanol functional uv curable polymers
JPH03293067A (ja) 1990-04-10 1991-12-24 Mitsui Toatsu Chem Inc 塗膜硬化方法
DE69130966T2 (de) 1990-07-06 1999-09-16 Nippon Telegraph And Telephone Corp., Tokio/Tokyo Resistmaterial, Methode zu seiner Herstellung und Verfahren zum Herstellen von Resistbildern mit diesem Material
US5457003A (en) * 1990-07-06 1995-10-10 Nippon Telegraph And Telephone Corporation Negative working resist material, method for the production of the same and process of forming resist patterns using the same
US5178959A (en) * 1991-03-27 1993-01-12 General Electric Company Epoxy-functional fluorosilicones
DE4118184A1 (de) * 1991-06-03 1992-12-10 Inst Neue Mat Gemein Gmbh Beschichtungszusammensetzungen auf der basis von fluorhaltigen anorganischen polykondensaten, deren herstellung und deren verwendung
US5217805A (en) * 1991-10-15 1993-06-08 Minnesota Mining And Manufacturing Company Uv-curable silicon release compositions
US5260348A (en) * 1992-01-31 1993-11-09 General Electric Company Silicone compositions which exhibit enhanced cure characteristics
JP2748769B2 (ja) * 1992-03-19 1998-05-13 信越化学工業株式会社 熱硬化性樹脂組成物及び硬化物
US5290900A (en) 1992-04-27 1994-03-01 Dow Corning Toray Silicone, Ltd. Curable fluorosilicone resin composition
US5411996A (en) * 1992-06-25 1995-05-02 General Electric Company One-part UV-curable epoxy silicone compositions containing a fluorinated alcohol
DE4310733A1 (de) * 1993-04-01 1994-10-06 Fraunhofer Ges Forschung Selbsthärtende Systeme
JP3143308B2 (ja) * 1994-01-31 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
JP3609480B2 (ja) 1995-03-31 2005-01-12 大日本インキ化学工業株式会社 塗膜形成方法及びそれに使用されるベースコート塗料
DE19512427A1 (de) * 1995-04-03 1996-10-10 Inst Neue Mat Gemein Gmbh Kompositklebstoff für optische und optoelektronische Anwendungen
US5656336A (en) * 1996-03-08 1997-08-12 Revlon Consumer Products Corporation Glass decorating method using bis-phenol-a epoxy resins and related compositions and articles
JP3289125B2 (ja) * 1996-03-15 2002-06-04 ソニーケミカル株式会社 光情報記録媒体
DE19613650C1 (de) * 1996-04-04 1997-04-10 Fraunhofer Ges Forschung Hydrolisierbare, fluorierte Silane, Verfahren zu deren Herstellung und deren Verwendung zur Herstellung von Kieselsäurepolykondensaten und Kieselsäureheteropolykondensaten
DE19630319C1 (de) * 1996-07-26 1998-04-23 Siemens Ag Modifiziertes Epoxysiloxan Kondensat, Verfahren zu dessen Herstellung und dessen Einsatz als Low-Stress-Gießharz für die Elektronik und Elektrotechnik
FR2757870B1 (fr) * 1996-12-30 1999-03-26 Rhodia Chimie Sa Utilisation de compositions silicones reticulables par voie cationique sous uv et d'un photoamorceur du type borate d'onium, pour le revetements de joints plats, notamment de joints de culasse
MY122234A (en) 1997-05-13 2006-04-29 Inst Neue Mat Gemein Gmbh Nanostructured moulded bodies and layers and method for producing same
DE19726829A1 (de) * 1997-06-24 1999-01-07 Inst Neue Mat Gemein Gmbh Verwendung von nanoskaligen Metalloxid-Teilchen als Polymerisationskatalysatoren
DE19737328A1 (de) * 1997-08-27 1999-03-04 Bayer Ag Beschichtungszusammensetzungen auf der Basis von Epoxidgruppen enthaltenden Silanen
JPH11131022A (ja) * 1997-10-31 1999-05-18 Sho Bond Constr Co Ltd 落書き除去方法
JP3559697B2 (ja) * 1997-12-01 2004-09-02 キヤノン株式会社 インクジェット記録ヘッドの製造方法
US6391999B1 (en) * 1998-02-06 2002-05-21 Rensselaer Polytechnic Institute Epoxy alkoxy siloxane oligomers
WO1999063022A1 (fr) 1998-06-04 1999-12-09 Nippon Sheet Glass Co., Ltd. Procede pour produire un article recouvert d'un film hydrofuge, article recouvert d'un film hydrofuge, et composition liquide pour revetement a base d'un film hydrofuge
TW482817B (en) * 1998-06-18 2002-04-11 Jsr Corp Photosetting compositions and photoset articles
JP2000212443A (ja) * 1999-01-27 2000-08-02 Toagosei Co Ltd 光カチオン硬化性樹脂組成物
JP4096138B2 (ja) * 1999-04-12 2008-06-04 Ｊｓｒ株式会社 レジスト下層膜用組成物の製造方法
JP2000347001A (ja) 1999-06-03 2000-12-15 Asahi Denka Kogyo Kk 光重合性組成物およびハードコート剤
JP3450251B2 (ja) 2000-01-28 2003-09-22 大日本塗料株式会社 水性塗料組成物
FR2805273B1 (fr) * 2000-02-18 2006-08-11 Rhodia Chimie Sa Traitement de surface de materiau plastique avec une composition a fonctions reactives polymerisable et/ou reticulable
DE60130187T2 (de) 2000-12-13 2008-05-21 Shin-Etsu Chemical Co., Ltd. Strahlenhärtbare Siliconzusammensetzungen
US6476174B1 (en) * 2001-06-15 2002-11-05 Industrial Technology Research Institute Process for preparing a silica-based organic-inorganic hybrid resin and the organic-inorganic hybrid resin prepared therefrom
US6743510B2 (en) 2001-11-13 2004-06-01 Sumitomo Chemical Company, Limited Composition comprising a cationic polymerization compound and coating obtained from the same
US6992117B2 (en) * 2002-01-17 2006-01-31 Canon Kabushiki Kaisha Epoxy resin composition, surface treatment method, liquid-jet recording head and liquid-jet recording apparatus
JP2004038142A (ja) * 2002-03-03 2004-02-05 Shipley Co Llc ポリシロキサンを製造する方法及びそれを含むフォトレジスト組成物
JP2004027145A (ja) * 2002-06-28 2004-01-29 Tamura Kaken Co Ltd 塗工用硬化性樹脂組成物、多層プリント配線板、プリント配線板及びドライフィルム
JP3898623B2 (ja) 2002-11-06 2007-03-28 日本ポリオレフィン株式会社 断熱性ポリエチレン容器およびその製造方法
JP2004155954A (ja) 2002-11-07 2004-06-03 Mitsubishi Chemicals Corp 光硬化性組成物及びその製造方法、並びに硬化物
JPWO2004072150A1 (ja) * 2003-02-12 2006-06-01 日本化薬株式会社 エポキシ基含有ケイ素化合物及び熱硬化性樹脂組成物
DE10323729A1 (de) 2003-05-26 2004-12-16 Institut Für Neue Materialien Gem. Gmbh Zusammensetzung mit Nichtnewtonschem Verhalten
JP4110401B2 (ja) 2003-06-13 2008-07-02 信越化学工業株式会社 感光性シリコーン樹脂組成物及びその硬化物並びにネガ型微細パターンの形成方法
JP4412705B2 (ja) 2003-06-25 2010-02-10 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム
AU2003254564A1 (en) * 2003-07-22 2005-02-25 Canon Kabushiki Kaisha Liquid-repellent coating composition and coating having high alkali resistance
CN1741905B (zh) * 2003-07-22 2012-11-28 佳能株式会社 喷墨头及其制造方法
CN100404633C (zh) 2003-07-22 2008-07-23 佳能株式会社 抗液性、耐碱性涂料组合物和适用于图案形成的涂层
JP2005089697A (ja) 2003-09-19 2005-04-07 Toagosei Co Ltd 活性エネルギー線硬化型組成物
DE102005002960A1 (de) 2005-01-21 2006-08-03 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität
DE102006033280A1 (de) 2006-07-18 2008-01-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrostrukturierte Schichten

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CN100404633C (zh) 2008-07-23
ATE411367T1 (de) 2008-10-15
WO2005014745A1 (en) 2005-02-17
TW200516117A (en) 2005-05-16
JP4773825B2 (ja) 2011-09-14
EP1532219A1 (de) 2005-05-25
US7985477B2 (en) 2011-07-26
US20060154091A1 (en) 2006-07-13
AU2003257490A1 (en) 2005-02-25
ES2316877T3 (es) 2009-04-16
JP2007515497A (ja) 2007-06-14
CN1703474A (zh) 2005-11-30
EP1532219B1 (de) 2008-10-15

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