DE60322061D1 - Tieftemperatur-strahlungsbildaufnahmevorrichtung mit höcker-bondverbindung - Google Patents

Tieftemperatur-strahlungsbildaufnahmevorrichtung mit höcker-bondverbindung

Info

Publication number
DE60322061D1
DE60322061D1 DE60322061T DE60322061T DE60322061D1 DE 60322061 D1 DE60322061 D1 DE 60322061D1 DE 60322061 T DE60322061 T DE 60322061T DE 60322061 T DE60322061 T DE 60322061T DE 60322061 D1 DE60322061 D1 DE 60322061D1
Authority
DE
Germany
Prior art keywords
höcker
temperature
recording device
image recording
radiation image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60322061T
Other languages
English (en)
Inventor
Mikko Ilmari Vuorela
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Direct Conversion Ltd Oy
Original Assignee
Ajat Ltd Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27807310&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60322061(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ajat Ltd Oy filed Critical Ajat Ltd Oy
Application granted granted Critical
Publication of DE60322061D1 publication Critical patent/DE60322061D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers
    • H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
    • H01L27/14661—X-ray, gamma-ray or corpuscular radiation imagers of the hybrid type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14634—Assemblies, i.e. Hybrid structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14636—Interconnect structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)
  • Wire Bonding (AREA)
  • Radiation Pyrometers (AREA)
DE60322061T 2002-03-13 2003-03-12 Tieftemperatur-strahlungsbildaufnahmevorrichtung mit höcker-bondverbindung Expired - Lifetime DE60322061D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36424902P 2002-03-13 2002-03-13
US10/126,254 US6933505B2 (en) 2002-03-13 2002-04-19 Low temperature, bump-bonded radiation imaging device
PCT/IB2003/001510 WO2003077319A2 (en) 2002-03-13 2003-03-12 Low temperature, bump-bonded radiation imaging device

Publications (1)

Publication Number Publication Date
DE60322061D1 true DE60322061D1 (de) 2008-08-21

Family

ID=27807310

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60322061T Expired - Lifetime DE60322061D1 (de) 2002-03-13 2003-03-12 Tieftemperatur-strahlungsbildaufnahmevorrichtung mit höcker-bondverbindung

Country Status (8)

Country Link
US (1) US6933505B2 (de)
EP (1) EP1520300B1 (de)
AT (1) ATE400895T1 (de)
AU (1) AU2003216662A1 (de)
DE (1) DE60322061D1 (de)
DK (1) DK1520300T3 (de)
ES (1) ES2309308T3 (de)
WO (1) WO2003077319A2 (de)

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US7361881B2 (en) * 2002-03-13 2008-04-22 Oy Ajat Ltd Ganged detector pixel, photon/pulse counting radiation imaging device
US20040232535A1 (en) * 2003-05-22 2004-11-25 Terry Tarn Microelectromechanical device packages with integral heaters
JP2005012049A (ja) * 2003-06-20 2005-01-13 Shimadzu Corp 放射線検出器およびそれを備えた放射線撮像装置
US20060011853A1 (en) * 2004-07-06 2006-01-19 Konstantinos Spartiotis High energy, real time capable, direct radiation conversion X-ray imaging system for Cd-Te and Cd-Zn-Te based cameras
WO2006018804A1 (en) * 2004-08-20 2006-02-23 Philips Intellectual Property & Standards Gmbh Microelectronic system with a passivation layer
US7187066B2 (en) * 2004-09-22 2007-03-06 Intel Corporation Radiant energy heating for die attach
JP4479577B2 (ja) * 2005-04-28 2010-06-09 株式会社日立製作所 半導体装置
US8295432B2 (en) 2005-05-02 2012-10-23 Oy Ajat Ltd Radiation imaging device with irregular rectangular shape and extraoral dental imaging system therefrom
US7742560B2 (en) 2005-05-02 2010-06-22 Oy Ajat Ltd. Radiation imaging device with irregular rectangular shape and extraoral dental imaging system therefrom
US7676022B2 (en) 2005-05-02 2010-03-09 Oy Ajat Ltd. Extra-oral digital panoramic dental x-ray imaging system
US7336763B2 (en) 2005-05-02 2008-02-26 Oy Ajat Ltd Dental extra-oral x-ray imaging system and method
US9332950B2 (en) 2005-05-02 2016-05-10 Oy Ajat Ltd. Radiation imaging device with irregular rectangular shape and extraoral dental imaging system therefrom
DE102005051330B4 (de) * 2005-10-25 2015-04-02 Infineon Technologies Ag Verfahren zum Herstellen und Reinigen von oberflächenmontierbaren Außenkontaktsockeln
CA2541256A1 (en) * 2006-02-22 2007-08-22 Redlen Technologies Inc. Shielding electrode for monolithic radiation detector
US7589324B2 (en) * 2006-12-21 2009-09-15 Redlen Technologies Use of solder mask as a protective coating for radiation detector
CN101903802B (zh) * 2007-12-20 2013-09-11 皇家飞利浦电子股份有限公司 直接转换探测器
DE102008012604B4 (de) 2008-03-05 2017-10-12 Siemens Healthcare Gmbh Detektormodul, Röntgendetektor und Verfahren zum Aufbau eines Röntgendetektors
US7715525B2 (en) 2008-03-13 2010-05-11 Oy Ajat Limited Single sensor multi-functional dental extra-oral x-ray imaging system and method
US7715526B2 (en) 2008-03-13 2010-05-11 Oy Ajat Limited Single sensor multi-functional dental extra-oral x-ray imaging system and method
DE102008020924A1 (de) 2008-04-25 2009-11-05 Siemens Aktiengesellschaft Modul mit Niedertemperatur-Lötverbindung und dazugehöriges Verfahren zur Herstellung
DE102008048044B4 (de) * 2008-09-19 2012-06-14 Siemens Aktiengesellschaft Herstellungsverfahren für einen Strahlungswandler, sowie Strahlungsdetektormodul, Strahlungsdetektor und Tomografiegerät
DE102008050840A1 (de) 2008-10-08 2009-10-15 Siemens Aktiengesellschaft Verfahren zur Fertigung eines elektrischen Moduls, elektrisches Modul, Röntgenmesssystem sowie Computertomograh
DE102008050838A1 (de) 2008-10-08 2009-10-15 Siemens Aktiengesellschaft Elektrische Baugruppe, Röntgenmesssystem, Computertomograph sowie Verfahren zur Fertigung einer elektrischen Baugruppe
WO2010126445A1 (en) 2009-04-29 2010-11-04 Xcounter Ab Computed tomography scanning system
US8476101B2 (en) * 2009-12-28 2013-07-02 Redlen Technologies Method of fabricating patterned CZT and CdTe devices
DE102010011582B4 (de) * 2010-03-16 2011-12-01 Siemens Aktiengesellschaft Detektormodul für einen Strahlendetektor und Strahlendetektor
US20120009394A1 (en) * 2010-07-07 2012-01-12 MOS Art Pack Corporation Bonding method and bonding substrate
EP2407109B1 (de) 2010-07-14 2016-01-06 XCounter AB Computertomografie-Abtastsystem und Verfahren
JP6234074B2 (ja) * 2013-06-07 2017-11-22 オリンパス株式会社 半導体装置、固体撮像装置、および撮像装置
US20150276945A1 (en) 2014-03-25 2015-10-01 Oy Ajat Ltd. Semiconductor bump-bonded x-ray imaging device
DE102014213734B4 (de) 2014-07-15 2021-01-21 Siemens Healthcare Gmbh Bildgebende Vorrichtung für elektromagnetische Strahlung
CN107003417B (zh) * 2014-10-20 2019-06-21 模拟技术公司 用于辐射成像模态装置的探测器阵列的探测器单元
CN107076858A (zh) * 2015-05-26 2017-08-18 西门子医疗有限公司 辐射检测器设备
US10483316B2 (en) * 2016-01-13 2019-11-19 mPower Technology, Inc. Fabrication and operation of multi-function flexible radiation detection systems
EP3552242B1 (de) 2016-12-09 2021-07-07 mPower Technology, Inc. Hochleistungsfähige solarzellen, arrays und herstellungsverfahren dafür
US10914848B1 (en) 2018-07-13 2021-02-09 mPower Technology, Inc. Fabrication, integration and operation of multi-function radiation detection systems
WO2020028402A1 (en) 2018-07-30 2020-02-06 mPower Technology, Inc. In-situ rapid annealing and operation of solar cells for extreme environment applications

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US5269453A (en) * 1992-04-02 1993-12-14 Motorola, Inc. Low temperature method for forming solder bump interconnections to a plated circuit trace
US5316205A (en) * 1993-04-05 1994-05-31 Motorola, Inc. Method for forming gold bump connection using tin-bismuth solder
US5619040A (en) * 1994-03-29 1997-04-08 Shapiro; Stephen L. Data acquisition system
US5730932A (en) * 1996-03-06 1998-03-24 International Business Machines Corporation Lead-free, tin-based multi-component solder alloys
JPH09326554A (ja) 1996-06-06 1997-12-16 Matsushita Electric Ind Co Ltd 電子部品接合用電極のはんだ合金及びはんだ付け方法
GB2319394B (en) 1996-12-27 1998-10-28 Simage Oy Bump-bonded semiconductor imaging device
US6207944B1 (en) * 1997-02-18 2001-03-27 Simage, O.Y. Semiconductor imaging device
US6238599B1 (en) * 1997-06-18 2001-05-29 International Business Machines Corporation High conductivity, high strength, lead-free, low cost, electrically conducting materials and applications
JP2000197988A (ja) 1998-03-26 2000-07-18 Nihon Superior Co Ltd 無鉛はんだ合金
US6742701B2 (en) * 1998-09-17 2004-06-01 Kabushiki Kaisha Tamura Seisakusho Bump forming method, presoldering treatment method, soldering method, bump forming apparatus, presoldering treatment device and soldering apparatus
US6365097B1 (en) * 1999-01-29 2002-04-02 Fuji Electric Co., Ltd. Solder alloy
KR20010072364A (ko) 1999-06-11 2001-07-31 이즈하라 요조 무연 땜납
JP3514670B2 (ja) 1999-07-29 2004-03-31 松下電器産業株式会社 半田付け方法
GB2354369A (en) * 1999-09-17 2001-03-21 Secr Defence Noise reduced semiconductor photon detectors
US6638847B1 (en) * 2000-04-19 2003-10-28 Advanced Interconnect Technology Ltd. Method of forming lead-free bump interconnections
KR100398716B1 (ko) * 2000-06-12 2003-09-19 가부시키가이샤 히타치세이사쿠쇼 반도체 모듈 및 반도체 장치를 접속한 회로 기판

Also Published As

Publication number Publication date
ATE400895T1 (de) 2008-07-15
DK1520300T3 (da) 2008-10-27
WO2003077319A2 (en) 2003-09-18
ES2309308T3 (es) 2008-12-16
AU2003216662A1 (en) 2003-09-22
US6933505B2 (en) 2005-08-23
EP1520300B1 (de) 2008-07-09
US20030173523A1 (en) 2003-09-18
WO2003077319A3 (en) 2004-06-03
EP1520300A2 (de) 2005-04-06

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