DE60317302D1 - Hochfluss-Röntgenquelle - Google Patents

Hochfluss-Röntgenquelle

Info

Publication number
DE60317302D1
DE60317302D1 DE60317302T DE60317302T DE60317302D1 DE 60317302 D1 DE60317302 D1 DE 60317302D1 DE 60317302 T DE60317302 T DE 60317302T DE 60317302 T DE60317302 T DE 60317302T DE 60317302 D1 DE60317302 D1 DE 60317302D1
Authority
DE
Germany
Prior art keywords
ray source
high flux
flux
ray
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60317302T
Other languages
English (en)
Other versions
DE60317302T3 (de
DE60317302T2 (de
Inventor
Damian Kucharczyk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agilent Technologies UK Ltd
Agilent Technologies Inc
Original Assignee
Oxford Diffraction Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9955488&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60317302(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Oxford Diffraction Ltd filed Critical Oxford Diffraction Ltd
Publication of DE60317302D1 publication Critical patent/DE60317302D1/de
Application granted granted Critical
Publication of DE60317302T2 publication Critical patent/DE60317302T2/de
Publication of DE60317302T3 publication Critical patent/DE60317302T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02—Constructional details
    • H05G1/04—Mounting the X-ray tube within a closed housing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE60317302.0T 2003-03-25 2003-12-18 Hochfluss-Röntgenquelle Expired - Lifetime DE60317302T3 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0306829.3A GB0306829D0 (en) 2003-03-25 2003-03-25 High flux x-ray source
GB0306829 2003-03-25
EP03257992.2A EP1462794B2 (de) 2003-03-25 2003-12-18 Hochfluss-Röntgenquelle

Publications (3)

Publication Number Publication Date
DE60317302D1 true DE60317302D1 (de) 2007-12-20
DE60317302T2 DE60317302T2 (de) 2008-08-28
DE60317302T3 DE60317302T3 (de) 2017-12-28

Family

ID=9955488

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60317302.0T Expired - Lifetime DE60317302T3 (de) 2003-03-25 2003-12-18 Hochfluss-Röntgenquelle

Country Status (4)

Country Link
US (1) US20040228445A1 (de)
EP (1) EP1462794B2 (de)
DE (1) DE60317302T3 (de)
GB (1) GB0306829D0 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2904176A1 (fr) * 2006-07-24 2008-01-25 Xenocs Soc Par Actions Simplif Systeme de delivrance de faisceau de rayons x stabilise
FR2918501B1 (fr) * 2007-07-02 2009-11-06 Xenocs Soc Par Actions Simplif Dispositif de delivrance d'un faisceau de rayons x a haute energie
GB201118556D0 (en) 2011-10-27 2011-12-07 Isis Innovation X-ray generation
GB201420936D0 (en) 2014-11-25 2015-01-07 Isis Innovation Radio frequency cavities
DE102015224143B3 (de) 2015-12-03 2017-02-23 Incoatec Gmbh Verfahren zur Justage der Primärseite eines Röntgendiffraktometers und zugehöriges Röntgendiffraktometer
EP3984464A1 (de) * 2020-10-19 2022-04-20 Excillum AB Röntgensystem

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
DE3940251A1 (de) * 1989-12-06 1991-06-13 Philips Patentverwaltung Roentgenstrahlenquelle mit einem mehrschichtigen ellipsoiden spiegel
JP2688381B2 (ja) 1990-09-14 1997-12-10 富士写真フイルム株式会社 写真フイルムパトローネ
DE4130556C2 (de) * 1991-09-13 1996-07-04 Picolab Oberflaechen Und Spure Vorrichtung zur Totalreflexions-Röntgenfluoreszenzanalyse
WO1998016817A1 (en) * 1996-10-16 1998-04-23 Illinois Institute Of Technology Method for detecting an image of an object
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
EP1193492B1 (de) * 2000-09-27 2007-08-08 Euratom Mikrostrahl-Kollimator für Hochauflösungs-Röntgenstrahl-Beugungsanalyse mittels konventionellen Diffraktometern
US6493421B2 (en) * 2000-10-16 2002-12-10 Advanced X-Ray Technology, Inc. Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
US6882739B2 (en) * 2001-06-19 2005-04-19 Hypernex, Inc. Method and apparatus for rapid grain size analysis of polycrystalline materials
GB0211691D0 (en) * 2002-05-21 2002-07-03 Oxford Diffraction Ltd X-ray diffraction apparatus

Also Published As

Publication number Publication date
GB0306829D0 (en) 2003-04-30
EP1462794A3 (de) 2006-04-19
EP1462794B1 (de) 2007-11-07
DE60317302T3 (de) 2017-12-28
DE60317302T2 (de) 2008-08-28
EP1462794B2 (de) 2017-08-30
EP1462794A2 (de) 2004-09-29
US20040228445A1 (en) 2004-11-18

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