DE60304006D1 - Steuerung eines lithographischen Apparates - Google Patents
Steuerung eines lithographischen ApparatesInfo
- Publication number
- DE60304006D1 DE60304006D1 DE60304006T DE60304006T DE60304006D1 DE 60304006 D1 DE60304006 D1 DE 60304006D1 DE 60304006 T DE60304006 T DE 60304006T DE 60304006 T DE60304006 T DE 60304006T DE 60304006 D1 DE60304006 D1 DE 60304006D1
- Authority
- DE
- Germany
- Prior art keywords
- control
- lithographic apparatus
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02253303 | 2002-05-10 | ||
EP02253303 | 2002-05-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60304006D1 true DE60304006D1 (de) | 2006-05-11 |
DE60304006T2 DE60304006T2 (de) | 2006-10-26 |
Family
ID=29595051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60304006T Expired - Fee Related DE60304006T2 (de) | 2002-05-10 | 2003-05-08 | Steuerung eines lithographischen Apparates |
Country Status (7)
Country | Link |
---|---|
US (1) | US7057705B2 (de) |
JP (1) | JP4202181B2 (de) |
KR (1) | KR100545294B1 (de) |
CN (1) | CN1289967C (de) |
DE (1) | DE60304006T2 (de) |
SG (1) | SG106687A1 (de) |
TW (1) | TWI238294B (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7116695B2 (en) * | 2004-09-28 | 2006-10-03 | Cymer, Inc. | Laser output light pulse beam parameter transient correction system |
US7170581B2 (en) * | 2004-10-27 | 2007-01-30 | Asml Netherlands B.V. | Self-adapting feedforward control tuning for motion system, and lithographic apparatus provided with such a motion system |
US7136148B2 (en) * | 2004-12-23 | 2006-11-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006077486A1 (en) * | 2005-01-20 | 2006-07-27 | Trudell Medical International | Dispensing device |
US7297911B2 (en) * | 2005-07-19 | 2007-11-20 | Asml Netherlands B.V. | Lithographic apparatus, illumination system, illumination controller and control method |
CN100416412C (zh) * | 2005-08-24 | 2008-09-03 | 上海华虹Nec电子有限公司 | 一种投影式光刻机中硅片平台高度控制系统及方法 |
US20070143032A1 (en) * | 2005-09-15 | 2007-06-21 | Carl Zeiss Smt Ag | Apparatus and method for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional body |
US8518030B2 (en) * | 2006-03-10 | 2013-08-27 | Amo Manufacturing Usa, Llc | Output energy control for lasers |
US7728955B2 (en) * | 2006-03-21 | 2010-06-01 | Asml Netherlands B.V. | Lithographic apparatus, radiation supply and device manufacturing method |
US7576832B2 (en) * | 2006-05-04 | 2009-08-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102006036173B4 (de) * | 2006-07-31 | 2012-01-26 | Xtreme Technologies Gmbh | Verfahren zur Impulsenergieregelung von Gasentladungs-Strahlungsquellen |
US8014881B2 (en) | 2007-02-15 | 2011-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9529275B2 (en) * | 2007-02-21 | 2016-12-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography scanner throughput |
US7824828B2 (en) * | 2007-02-22 | 2010-11-02 | Cadence Design Systems, Inc. | Method and system for improvement of dose correction for particle beam writers |
NL1036048A1 (nl) * | 2007-10-15 | 2009-04-16 | Asml Holding Nv | Pulse to pulse energy equalization of light beam intensity. |
NL1036292A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. |
JP4901784B2 (ja) * | 2008-03-05 | 2012-03-21 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
CN102253602A (zh) * | 2010-05-18 | 2011-11-23 | 上海微电子装备有限公司 | 一种光刻系统中实时控制照明剂量的装置 |
JP5817215B2 (ja) | 2011-05-26 | 2015-11-18 | オムロン株式会社 | 光増幅装置およびレーザ加工装置 |
RU2583003C2 (ru) * | 2011-07-11 | 2016-04-27 | МЭППЕР ЛИТОГРАФИ АйПи Б.В. | Литографическая система и способ хранения позиционных данных мишени |
US8731014B2 (en) * | 2012-02-02 | 2014-05-20 | Coherent, Inc. | Output-power control apparatus for a CO2 gas-discharge laser |
JP6010438B2 (ja) | 2012-11-27 | 2016-10-19 | 浜松ホトニクス株式会社 | 量子ビーム生成装置、量子ビーム生成方法、及び、レーザ核融合装置 |
DE102012113007B3 (de) * | 2012-12-21 | 2014-02-06 | Ushio Denki Kabushiki Kaisha | Verfahren zur Steuerung einer entladungsplasmabasierten Strahlungsquelle zur Stabilisierung der gepulst emittierten Strahlungsdosis |
US8872123B2 (en) * | 2013-01-10 | 2014-10-28 | Asml Netherlands B.V. | Method of timing laser beam pulses to regulate extreme ultraviolet light dosing |
KR102219069B1 (ko) * | 2013-06-18 | 2021-02-23 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 방법 및 시스템 |
US9599510B2 (en) | 2014-06-04 | 2017-03-21 | Cymer, Llc | Estimation of spectral feature of pulsed light beam |
US9261794B1 (en) * | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
US10816905B2 (en) * | 2015-04-08 | 2020-10-27 | Cymer, Llc | Wavelength stabilization for an optical source |
US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
FR3041073B1 (fr) * | 2015-09-15 | 2020-01-31 | Valeo Vision | Dispositif de projection de faisceau lumineux a ecran digital et projecteur muni d’un tel dispositif |
US10627724B2 (en) | 2015-09-23 | 2020-04-21 | Asml Netherlands B.V. | Lithographic apparatus and method |
US9939732B2 (en) * | 2015-10-27 | 2018-04-10 | Cymer, Llc | Controller for an optical system |
CN107546998B (zh) * | 2017-07-25 | 2019-12-10 | 华南理工大学 | 一种基于双环预测控制的切换型控制方法 |
KR20220070527A (ko) * | 2019-10-30 | 2022-05-31 | 사이머 엘엘씨 | 방사선 소스 테스팅 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5982790A (en) * | 1997-01-16 | 1999-11-09 | Lightwave Electronics Corporation | System for reducing pulse-to-pulse energy variation in a pulsed laser |
DE10083396T1 (de) | 1999-10-14 | 2002-01-24 | Lambda Physik Ag | Energiesteuerung für einen Excimer- oder Molekularfluorlaser |
JP3722200B2 (ja) | 2000-02-29 | 2005-11-30 | ウシオ電機株式会社 | 放電励起ガスレーザ装置の出力制御方法及び放電励起ガスレーザ装置 |
-
2003
- 2003-05-07 KR KR1020030029163A patent/KR100545294B1/ko not_active IP Right Cessation
- 2003-05-08 SG SG200302487A patent/SG106687A1/en unknown
- 2003-05-08 DE DE60304006T patent/DE60304006T2/de not_active Expired - Fee Related
- 2003-05-08 JP JP2003130517A patent/JP4202181B2/ja not_active Expired - Fee Related
- 2003-05-08 US US10/431,583 patent/US7057705B2/en not_active Expired - Lifetime
- 2003-05-08 TW TW092112579A patent/TWI238294B/zh not_active IP Right Cessation
- 2003-05-08 CN CNB031407536A patent/CN1289967C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1289967C (zh) | 2006-12-13 |
US20040021840A1 (en) | 2004-02-05 |
TW200402605A (en) | 2004-02-16 |
DE60304006T2 (de) | 2006-10-26 |
JP2003332233A (ja) | 2003-11-21 |
CN1461976A (zh) | 2003-12-17 |
JP4202181B2 (ja) | 2008-12-24 |
TWI238294B (en) | 2005-08-21 |
KR100545294B1 (ko) | 2006-01-24 |
KR20030087959A (ko) | 2003-11-15 |
US7057705B2 (en) | 2006-06-06 |
SG106687A1 (en) | 2004-10-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |