DE60232878D1 - Unter biokompatiblen bedingungen verarbeitbare fotoresists zur erzeugung von biomolekül-mustern - Google Patents

Unter biokompatiblen bedingungen verarbeitbare fotoresists zur erzeugung von biomolekül-mustern

Info

Publication number
DE60232878D1
DE60232878D1 DE60232878T DE60232878T DE60232878D1 DE 60232878 D1 DE60232878 D1 DE 60232878D1 DE 60232878 T DE60232878 T DE 60232878T DE 60232878 T DE60232878 T DE 60232878T DE 60232878 D1 DE60232878 D1 DE 60232878D1
Authority
DE
Germany
Prior art keywords
photore
processable
rests
production
compatible conditions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60232878T
Other languages
English (en)
Inventor
Panagiotis Argitis
Konstantinos Misiakos
Sotirios E Kakabakos
Antonios Douvas
Constantinos D Diakoumakos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAT CT SCIENT RES DEMOKRITOS
Original Assignee
NAT CT SCIENT RES DEMOKRITOS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NAT CT SCIENT RES DEMOKRITOS filed Critical NAT CT SCIENT RES DEMOKRITOS
Application granted granted Critical
Publication of DE60232878D1 publication Critical patent/DE60232878D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/544—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being organic
    • G01N33/545—Synthetic resin
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/551—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being inorganic
    • G01N33/552—Glass or silica
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Biomedical Technology (AREA)
  • Hematology (AREA)
  • Urology & Nephrology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Food Science & Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • Cell Biology (AREA)
  • Biotechnology (AREA)
  • Medicinal Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Microbiology (AREA)
  • Pathology (AREA)
  • Inorganic Chemistry (AREA)
  • Peptides Or Proteins (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
DE60232878T 2001-05-31 2002-05-30 Unter biokompatiblen bedingungen verarbeitbare fotoresists zur erzeugung von biomolekül-mustern Expired - Fee Related DE60232878D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GR20010100271A GR1004058B (el) 2001-05-31 2001-05-31 Φωτοπολυμερικα υλικα με βιοσυμβατες λιθογραφικες απαιτησεις καταλληλα για σχηματοποιηση επιστρωσεων πολλαπλων βioμοριων
PCT/GR2002/000033 WO2002097533A1 (en) 2001-05-31 2002-05-30 Photoresists processable under biocompatible conditions for multi-biomolecule patterning

Publications (1)

Publication Number Publication Date
DE60232878D1 true DE60232878D1 (de) 2009-08-20

Family

ID=10944758

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60232878T Expired - Fee Related DE60232878D1 (de) 2001-05-31 2002-05-30 Unter biokompatiblen bedingungen verarbeitbare fotoresists zur erzeugung von biomolekül-mustern

Country Status (6)

Country Link
US (1) US7608389B2 (de)
EP (1) EP1395878B1 (de)
AT (1) ATE436041T1 (de)
DE (1) DE60232878D1 (de)
GR (1) GR1004058B (de)
WO (1) WO2002097533A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004099373A2 (en) * 2003-05-02 2004-11-18 University Of North Carolina At Charlotte Biocompatible resists
GB0513910D0 (en) * 2005-07-07 2005-08-10 Univ Newcastle Immobilisation of biological molecules
WO2009152276A2 (en) 2008-06-10 2009-12-17 University Of North Carolina At Charlotte Photoacid generators and lithographic resists comprising the same
KR101039630B1 (ko) * 2009-02-18 2011-06-08 성균관대학교산학협력단 기판 상에 나노구조체를 선택적으로 위치시키는 방법 및 이에 의해 형성된 나노구조체를 포함하는 나노-분자 소자
US9259759B2 (en) 2010-03-01 2016-02-16 Cornell University Patterning of biomaterials using fluorinated materials and fluorinated solvents
JP6789024B2 (ja) * 2016-07-22 2020-11-25 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法、並びに、高分子化合物
EP3929658A1 (de) 2020-06-23 2021-12-29 Koninklijke Philips N.V. Druckverfahren und gemusterte schicht

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103064A (en) 1976-01-09 1978-07-25 Dios, Inc. Microdevice substrate and method for making micropattern devices
US4103073A (en) 1976-01-09 1978-07-25 Dios, Inc. Microsubstrates and method for making micropattern devices
JPH02309358A (ja) * 1989-05-24 1990-12-25 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
US5688642A (en) * 1994-12-01 1997-11-18 The United States Of America As Represented By The Secretary Of The Navy Selective attachment of nucleic acid molecules to patterned self-assembled surfaces
JP3457080B2 (ja) * 1994-12-28 2003-10-14 株式会社コスモ総合研究所 炭化水素油中の芳香族化合物の水素化処理方法
US5736257A (en) 1995-04-25 1998-04-07 Us Navy Photoactivatable polymers for producing patterned biomolecular assemblies
DE19546140C2 (de) * 1995-11-28 1998-08-06 Atotech Deutschland Gmbh Photoempfindliche Zusammensetzung
US5876899A (en) * 1996-09-18 1999-03-02 Shipley Company, L.L.C. Photoresist compositions
JPH10219182A (ja) * 1997-02-06 1998-08-18 Nkk Corp 耐傷つき性、耐摩耗性及び耐久性に優れた塗料組成物および塗装金属板
US5773308A (en) 1997-02-10 1998-06-30 The United States Of America As Represented By The Secretary Of The Navy Photoactivatable o-nitrobenzyl polyethylene glycol-silane for the production of patterned biomolecular arrays
JPH10235788A (ja) * 1997-02-21 1998-09-08 Sumitomo Metal Ind Ltd 耐薬品性に優れた塗装金属板
GB9715101D0 (en) * 1997-07-18 1997-09-24 Environmental Sensors Ltd The production of microstructures for analysis of fluids
JPH1184125A (ja) * 1997-09-12 1999-03-26 Tokyo Ohka Kogyo Co Ltd 色フィルタ用光重合性組成物、および色フィルタの製造方法
EP0957399B1 (de) * 1998-04-24 2004-02-18 Infineon Technologies AG Strahlungsempfindliches Gemisch und dessen Verwendung
US6884562B1 (en) * 1998-10-27 2005-04-26 E. I. Du Pont De Nemours And Company Photoresists and processes for microlithography
US6852466B2 (en) * 1998-12-23 2005-02-08 Shipley Company, L.L.C. Photoresist compositions particularly suitable for short wavelength imaging
GR1003421B (el) * 1999-05-26 2000-09-01 Βιοσυμβατες λιθογραφικες διαδικασιες και υλικα για διαμορφωση σχηματοποιημενων επιστρωσεων βιομοριων
JP3672780B2 (ja) * 1999-11-29 2005-07-20 セントラル硝子株式会社 ポジ型レジスト組成物およびパターン形成方法

Also Published As

Publication number Publication date
EP1395878A1 (de) 2004-03-10
US20050037276A1 (en) 2005-02-17
GR1004058B (el) 2002-11-15
ATE436041T1 (de) 2009-07-15
US7608389B2 (en) 2009-10-27
WO2002097533A1 (en) 2002-12-05
EP1395878B1 (de) 2009-07-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee