DE60231252D1 - Strukturierung von solid-state-merkmalen durch nanolithographisches direktschreibedrucken - Google Patents
Strukturierung von solid-state-merkmalen durch nanolithographisches direktschreibedruckenInfo
- Publication number
- DE60231252D1 DE60231252D1 DE60231252T DE60231252T DE60231252D1 DE 60231252 D1 DE60231252 D1 DE 60231252D1 DE 60231252 T DE60231252 T DE 60231252T DE 60231252 T DE60231252 T DE 60231252T DE 60231252 D1 DE60231252 D1 DE 60231252D1
- Authority
- DE
- Germany
- Prior art keywords
- nanolithographic
- solid state
- direct writing
- substrate
- state features
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
- Y10S977/857—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Theoretical Computer Science (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Formation Of Insulating Films (AREA)
- Laminated Bodies (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34161401P | 2001-12-17 | 2001-12-17 | |
PCT/US2002/040118 WO2003052514A2 (en) | 2001-12-17 | 2002-12-17 | Patterning of solid state features by direct write nanolithographic printing |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60231252D1 true DE60231252D1 (de) | 2009-04-02 |
Family
ID=23338292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60231252T Expired - Lifetime DE60231252D1 (de) | 2001-12-17 | 2002-12-17 | Strukturierung von solid-state-merkmalen durch nanolithographisches direktschreibedrucken |
Country Status (11)
Country | Link |
---|---|
US (3) | US7273636B2 (de) |
EP (1) | EP1502154B1 (de) |
JP (3) | JP2005513768A (de) |
KR (1) | KR100936599B1 (de) |
CN (1) | CN100345059C (de) |
AT (1) | ATE423336T1 (de) |
AU (1) | AU2002364001B2 (de) |
CA (1) | CA2470823C (de) |
DE (1) | DE60231252D1 (de) |
TW (1) | TWI287170B (de) |
WO (1) | WO2003052514A2 (de) |
Families Citing this family (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7273636B2 (en) * | 2001-12-17 | 2007-09-25 | Northwestern University | Patterning of solid state features by direct write nanolithographic printing |
US7998528B2 (en) * | 2002-02-14 | 2011-08-16 | Massachusetts Institute Of Technology | Method for direct fabrication of nanostructures |
AU2003300257A1 (en) * | 2002-05-21 | 2004-05-04 | Northwestern University | Peptide and protein arrays and direct-write lithographic printing of peptides and proteins |
US7199305B2 (en) * | 2002-08-08 | 2007-04-03 | Nanoink, Inc. | Protosubstrates |
US7098056B2 (en) * | 2002-08-09 | 2006-08-29 | Nanoink, Inc. | Apparatus, materials, and methods for fabrication and catalysis |
US7005378B2 (en) * | 2002-08-26 | 2006-02-28 | Nanoink, Inc. | Processes for fabricating conductive patterns using nanolithography as a patterning tool |
US8071168B2 (en) * | 2002-08-26 | 2011-12-06 | Nanoink, Inc. | Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair |
AU2003267244A1 (en) * | 2002-09-17 | 2004-04-08 | Northwestern University | Patterning magnetic nanostructures |
US20040226620A1 (en) | 2002-09-26 | 2004-11-18 | Daniel Therriault | Microcapillary networks |
US7691541B2 (en) * | 2002-10-21 | 2010-04-06 | Nanoink, Inc. | Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shifters |
US7141617B2 (en) * | 2003-06-17 | 2006-11-28 | The Board Of Trustees Of The University Of Illinois | Directed assembly of three-dimensional structures with micron-scale features |
FR2862006B1 (fr) * | 2003-11-12 | 2006-01-27 | Univ Lille Sciences Tech | Sources d'electronebulisation planaires sur le modele d'une plume de calligraphie et leur fabrication. |
CN1654230B (zh) * | 2004-02-10 | 2010-05-12 | 中国科学院上海应用物理研究所 | 以动态组合模式“蘸笔”纳米刻蚀技术制造纳米图形的方法 |
TWI288294B (en) * | 2004-03-19 | 2007-10-11 | Hon Hai Prec Ind Co Ltd | A manufacturing method of a cavity of a light guide plate |
CN100389344C (zh) * | 2004-03-27 | 2008-05-21 | 鸿富锦精密工业(深圳)有限公司 | 导光板模仁制造方法 |
US8235302B2 (en) * | 2004-04-20 | 2012-08-07 | Nanolnk, Inc. | Identification features |
WO2005115630A2 (en) * | 2004-04-30 | 2005-12-08 | Bioforce Nanosciences, Inc. | Method and apparatus for depositing material onto a surface |
US20060242740A1 (en) * | 2004-08-11 | 2006-10-26 | California Institute Of Technology | Method and device for surfactant activated Dip-Pen Nanolithography |
US8261662B1 (en) | 2004-11-08 | 2012-09-11 | Nanolnk, Inc. | Active pen nanolithography |
US20100297027A1 (en) * | 2004-12-20 | 2010-11-25 | Nanolnk, Inc. | Overt authentication features for compositions and objects and methods of fabrication and verification thereof |
US20100294147A1 (en) * | 2004-12-20 | 2010-11-25 | Nanoink, Inc. | Apparatus and methods for preparing identification features including pharmaceutical applications |
US7875426B2 (en) * | 2005-02-04 | 2011-01-25 | University Of South Florida | DNA biochip and methods of use |
US20060183342A1 (en) * | 2005-02-15 | 2006-08-17 | Eastman Kodak Company | Metal and metal oxide patterned device |
US20100294927A1 (en) * | 2005-09-12 | 2010-11-25 | Nanolnk, Inc. | High throughput inspecting |
KR100913997B1 (ko) * | 2006-04-06 | 2009-08-26 | 재단법인서울대학교산학협력재단 | 표면유체 원리를 이용한 잉크의 형성방법 및 이를 이용하여패터닝하는 방법 |
WO2007126689A1 (en) | 2006-04-19 | 2007-11-08 | Northwestern University | Article for parallel lithography with two-dimensional pen arrays |
US8192794B2 (en) * | 2006-04-19 | 2012-06-05 | Northwestern University | Massively parallel lithography with two-dimensional pen arrays |
TW200815278A (en) | 2006-06-28 | 2008-04-01 | Univ Northwestern | DPN generated hole nanoarrays |
US20080309688A1 (en) * | 2007-03-13 | 2008-12-18 | Nanolnk, Inc. | Nanolithography with use of viewports |
US7956102B2 (en) * | 2007-04-09 | 2011-06-07 | The Board Of Trustees Of The University Of Illinois | Sol-gel inks |
EP2156246A1 (de) * | 2007-05-09 | 2010-02-24 | Nanoink, Inc. | Kompakte nanofabrikationsvorrichtung |
KR20100047844A (ko) * | 2007-06-20 | 2010-05-10 | 노쓰웨스턴유니버시티 | 나노물질 및 중합체를 함유하는 조성물의 패턴화 |
US20090004231A1 (en) | 2007-06-30 | 2009-01-01 | Popp Shane M | Pharmaceutical dosage forms fabricated with nanomaterials for quality monitoring |
KR20100056453A (ko) * | 2007-08-08 | 2010-05-27 | 노쓰웨스턴유니버시티 | 캔틸레버 어레이에 대해 독립적으로 어드레스 가능한 자가 보정 잉킹 방법 |
WO2009052120A1 (en) * | 2007-10-15 | 2009-04-23 | Nanoink, Inc. | Lithography of nanoparticle based inks |
US20100297228A1 (en) * | 2007-10-29 | 2010-11-25 | Nanolnk, Inc. | Universal coating for imprinting identification features |
JP2011505000A (ja) * | 2007-11-26 | 2011-02-17 | ナノインク インコーポレーティッド | 枢動駆動を伴うカンチレバー |
US8256018B2 (en) * | 2008-02-05 | 2012-08-28 | Nanoink, Inc. | Array and cantilever array leveling |
US8068328B2 (en) * | 2008-03-12 | 2011-11-29 | Intel Corporation | Nanolithographic method of manufacturing an embedded passive device for a microelectronic application, and microelectronic device containing same |
US7452570B1 (en) * | 2008-04-09 | 2008-11-18 | International Business Machines Corporation | Probe-based lithography utilizing thermomechanically activated polymers |
US8393011B2 (en) * | 2008-05-13 | 2013-03-05 | Nanoink, Inc. | Piezoresistor height sensing cantilever |
US7922939B2 (en) * | 2008-10-03 | 2011-04-12 | The Board Of Trustees Of The University Of Illinois | Metal nanoparticle inks |
US8187500B2 (en) * | 2008-10-17 | 2012-05-29 | The Board Of Trustees Of The University Of Illinois | Biphasic inks |
KR20100043542A (ko) * | 2008-10-20 | 2010-04-29 | 삼성전자주식회사 | 딥펜 나노리소그래피 공정을 이용하여 패터닝하는 장치 및 방법 |
US20100196661A1 (en) * | 2009-01-30 | 2010-08-05 | Duerig Urs T | Method for patterning nano-scale patterns of molecules on a surface of a material |
US20100288543A1 (en) * | 2009-04-14 | 2010-11-18 | Nanoink, Inc. | Conducting lines, nanoparticles, inks, and patterning |
KR20120104966A (ko) | 2009-06-30 | 2012-09-24 | 나노잉크, 인크. | 개선된 포토마스크 복구방법 |
US20110165341A1 (en) * | 2009-12-02 | 2011-07-07 | Northwestern University | Block copolymer-assisted nanolithography |
KR100974288B1 (ko) * | 2010-01-13 | 2010-08-05 | 한국기계연구원 | 나노임프린트를 이용한 금속 산화박막 패턴 형성방법 및 이를 이용한 led 소자의 제조방법 |
US8763525B2 (en) * | 2010-12-15 | 2014-07-01 | Carestream Health, Inc. | Gravure printing of transparent conductive films containing networks of metal nanoparticles |
CN102092678B (zh) * | 2010-12-31 | 2013-07-10 | 上海交通大学 | 基于力调制模式的蘸笔纳米刻蚀方法 |
WO2012135768A1 (en) * | 2011-03-30 | 2012-10-04 | Rolandi Marco | Inorganic nanostructure reactive direct-write and growth |
TW201250845A (en) | 2011-05-17 | 2012-12-16 | Nanoink Inc | High density, hard tip arrays |
CN102344115B (zh) * | 2011-09-28 | 2015-04-15 | 清华大学 | 基于蘸笔原理的微纳尺度连接方法 |
WO2013059670A2 (en) | 2011-10-21 | 2013-04-25 | Nanoink, Inc. | Octahedral and pyramid-on-post tips for microscopy and lithography |
US20150210868A1 (en) * | 2012-09-10 | 2015-07-30 | Northwestern University | Method for synthesizing nanoparticles on surfaces |
WO2014210608A1 (en) | 2013-06-28 | 2014-12-31 | President And Fellows Of Harvard College | High-surface area functional material coated structures |
US10364141B2 (en) | 2013-12-23 | 2019-07-30 | Washington State University | Block copolymer nanostructures formed by disturbed self-assembly and uses thereof |
CN103878227B (zh) * | 2014-03-06 | 2015-08-12 | 京东方科技集团股份有限公司 | 模仁网点冲压装置 |
US10751933B2 (en) | 2015-12-16 | 2020-08-25 | The Regents Of The University Of California | Technique for three-dimensional nanoprinting |
WO2017151139A1 (en) * | 2016-03-04 | 2017-09-08 | Intel Corporation | Multi-component reactive inks for 3d-printed electronics |
KR20180132765A (ko) | 2016-04-01 | 2018-12-12 | 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 | 공조립을 통한, 고품질의, 티타니아, 알루미나 및 다른 금속 산화물 주형화 재료의 형성 |
WO2019068110A1 (en) | 2017-09-29 | 2019-04-04 | President And Fellows Of Harvard College | IMPROVED CATALYTIC MATERIALS COMPRISING PARTIALLY INCORPORATED CATALYTIC NANOPARTICLES |
WO2019183461A1 (en) * | 2018-03-23 | 2019-09-26 | Lawrence Livermore National Security, Llc | Base-catalyzed sol-gel inks for direct ink writing of high resolution hierarchically porous carbon aerogels |
CN112805088B (zh) * | 2018-08-16 | 2024-06-07 | 西北大学 | 多元素异质结构纳米颗粒及其制备方法 |
CN110143568B (zh) * | 2019-05-22 | 2022-03-29 | 季华实验室 | 在衬底材料的钝化层上形成三维图形结构的方法 |
CN110962220B (zh) * | 2019-12-18 | 2021-08-13 | 厦门大学 | 一种聚合物前驱体陶瓷薄膜的直写装置和制作方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10174012A (ja) * | 1996-12-06 | 1998-06-26 | Fujitsu General Ltd | 文字表示装置 |
US5942376A (en) * | 1997-08-14 | 1999-08-24 | Symetrix Corporation | Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films |
JPH11202143A (ja) * | 1998-01-16 | 1999-07-30 | Furukawa Electric Co Ltd:The | 光導波路部品およびその製造方法 |
JP3107074B2 (ja) * | 1998-12-03 | 2000-11-06 | 三菱マテリアル株式会社 | 表面モフォロジーに優れたパターン化誘電体薄膜の形成方法 |
US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
US20020122873A1 (en) * | 2000-01-05 | 2002-09-05 | Mirkin Chad A. | Nanolithography methods and products therefor and produced thereby |
US6635311B1 (en) * | 1999-01-07 | 2003-10-21 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or products thereby |
JP2000327311A (ja) * | 1999-05-26 | 2000-11-28 | Ngk Spark Plug Co Ltd | 金属酸化物薄膜を有する基板の製造方法 |
EP1059266A3 (de) * | 1999-06-11 | 2000-12-20 | Iljin Nanotech Co., Ltd. | Massensyntheseverfahren von hochreinen, auf einem grossformatigem Substrat angeordnete Kohlenstoffnanoröhren mittels thermischer chemischer Dampfphasenabscheidung |
US6890640B2 (en) * | 1999-12-03 | 2005-05-10 | Caterpillar Inc | Patterned hydrophilic-oleophilic metal oxide coating and method of forming |
US6365266B1 (en) * | 1999-12-07 | 2002-04-02 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
US6592980B1 (en) * | 1999-12-07 | 2003-07-15 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
US6508979B1 (en) * | 2000-02-08 | 2003-01-21 | University Of Southern California | Layered nanofabrication |
IL134631A0 (en) * | 2000-02-20 | 2001-04-30 | Yeda Res & Dev | Constructive nanolithography |
JP2001340755A (ja) * | 2000-03-31 | 2001-12-11 | Toyota Central Res & Dev Lab Inc | ガス吸着分離用多孔体及びそれを用いたガス吸着分離方法 |
CA2404013A1 (en) * | 2000-04-21 | 2001-11-01 | Hongyou Fan | Prototyping of patterned functional nanostructures |
US6986818B2 (en) * | 2000-06-02 | 2006-01-17 | The Regents Of The University Of California | Method for producing nanostructured metal-oxides |
CN1139535C (zh) * | 2001-05-28 | 2004-02-25 | 东南大学 | 用探针转移微粒制造纳米线结构的方法 |
US7273636B2 (en) * | 2001-12-17 | 2007-09-25 | Northwestern University | Patterning of solid state features by direct write nanolithographic printing |
AU2003267244A1 (en) * | 2002-09-17 | 2004-04-08 | Northwestern University | Patterning magnetic nanostructures |
-
2002
- 2002-12-17 US US10/320,721 patent/US7273636B2/en not_active Expired - Fee Related
- 2002-12-17 TW TW091136422A patent/TWI287170B/zh not_active IP Right Cessation
- 2002-12-17 CN CNB028272803A patent/CN100345059C/zh not_active Expired - Fee Related
- 2002-12-17 AU AU2002364001A patent/AU2002364001B2/en not_active Ceased
- 2002-12-17 KR KR1020047009448A patent/KR100936599B1/ko not_active IP Right Cessation
- 2002-12-17 JP JP2003553339A patent/JP2005513768A/ja not_active Withdrawn
- 2002-12-17 CA CA2470823A patent/CA2470823C/en not_active Expired - Fee Related
- 2002-12-17 AT AT02798520T patent/ATE423336T1/de not_active IP Right Cessation
- 2002-12-17 EP EP02798520A patent/EP1502154B1/de not_active Expired - Lifetime
- 2002-12-17 DE DE60231252T patent/DE60231252D1/de not_active Expired - Lifetime
- 2002-12-17 WO PCT/US2002/040118 patent/WO2003052514A2/en active Application Filing
-
2007
- 2007-08-29 US US11/847,263 patent/US7811635B2/en not_active Expired - Fee Related
-
2009
- 2009-12-14 JP JP2009282559A patent/JP4999913B2/ja not_active Expired - Fee Related
-
2010
- 2010-10-05 US US12/898,416 patent/US20110081526A1/en not_active Abandoned
-
2011
- 2011-11-04 JP JP2011242635A patent/JP2012060146A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
WO2003052514A9 (en) | 2004-06-03 |
JP2005513768A (ja) | 2005-05-12 |
TWI287170B (en) | 2007-09-21 |
AU2002364001B2 (en) | 2008-09-11 |
CA2470823C (en) | 2012-03-20 |
CN1615457A (zh) | 2005-05-11 |
WO2003052514A2 (en) | 2003-06-26 |
AU2002364001A1 (en) | 2003-06-30 |
US20030162004A1 (en) | 2003-08-28 |
US20110081526A1 (en) | 2011-04-07 |
US7273636B2 (en) | 2007-09-25 |
JP2010080977A (ja) | 2010-04-08 |
JP2012060146A (ja) | 2012-03-22 |
EP1502154A2 (de) | 2005-02-02 |
US20080044575A1 (en) | 2008-02-21 |
JP4999913B2 (ja) | 2012-08-15 |
CA2470823A1 (en) | 2003-06-26 |
EP1502154B1 (de) | 2009-02-18 |
CN100345059C (zh) | 2007-10-24 |
KR100936599B1 (ko) | 2010-01-13 |
TW200305057A (en) | 2003-10-16 |
KR20050026376A (ko) | 2005-03-15 |
WO2003052514A3 (en) | 2004-11-18 |
US7811635B2 (en) | 2010-10-12 |
ATE423336T1 (de) | 2009-03-15 |
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