DE60220976D1 - Verfahren zur Herstellung eines wärmeentwickelbaren photoempfindlichen Materials - Google Patents

Verfahren zur Herstellung eines wärmeentwickelbaren photoempfindlichen Materials

Info

Publication number
DE60220976D1
DE60220976D1 DE60220976T DE60220976T DE60220976D1 DE 60220976 D1 DE60220976 D1 DE 60220976D1 DE 60220976 T DE60220976 T DE 60220976T DE 60220976 T DE60220976 T DE 60220976T DE 60220976 D1 DE60220976 D1 DE 60220976D1
Authority
DE
Germany
Prior art keywords
producing
heat
photosensitive material
developable photosensitive
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60220976T
Other languages
English (en)
Other versions
DE60220976T2 (de
Inventor
Junpei Iwado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of DE60220976D1 publication Critical patent/DE60220976D1/de
Application granted granted Critical
Publication of DE60220976T2 publication Critical patent/DE60220976T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498—Photothermographic systems, e.g. dry silver
    • G03C1/49872—Aspects relating to non-photosensitive layers, e.g. intermediate protective layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G03C2001/7496—Viscosity range
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C2200/00—Details
    • G03C2200/35—Intermediate layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C2200/00—Details
    • G03C2200/44—Details pH value
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
DE60220976T 2001-10-04 2002-10-02 Verfahren zur Herstellung eines wärmeentwickelbaren photoempfindlichen Materials Expired - Lifetime DE60220976T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001308372A JP2003114500A (ja) 2001-10-04 2001-10-04 熱現像感光材料の製造方法
JP2001308372 2001-10-04

Publications (2)

Publication Number Publication Date
DE60220976D1 true DE60220976D1 (de) 2007-08-16
DE60220976T2 DE60220976T2 (de) 2007-10-18

Family

ID=19127698

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60220976T Expired - Lifetime DE60220976T2 (de) 2001-10-04 2002-10-02 Verfahren zur Herstellung eines wärmeentwickelbaren photoempfindlichen Materials

Country Status (4)

Country Link
US (1) US6821720B2 (de)
EP (1) EP1300725B1 (de)
JP (1) JP2003114500A (de)
DE (1) DE60220976T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6702195B2 (en) * 2002-07-15 2004-03-09 Xerox Corporation Multi-layer slot coating die with selective ultrasonic assist
US7157217B2 (en) * 2002-12-17 2007-01-02 Fujifilm Corporation Photothermographic material
US7332267B2 (en) * 2002-12-17 2008-02-19 Fujifilm Corporation Photothermographic material
JP4092213B2 (ja) * 2003-01-06 2008-05-28 富士フイルム株式会社 熱現像感光材料
JP2004309948A (ja) * 2003-04-10 2004-11-04 Fuji Photo Film Co Ltd 熱現像感光材料
US20050208441A1 (en) * 2004-03-19 2005-09-22 Fuji Photo Film Co., Ltd. Photothermographic material and image forming method utilizing the same
JP2006030895A (ja) * 2004-07-21 2006-02-02 Fuji Photo Film Co Ltd 熱現像感光材料の製造方法、およびそれによって製造された熱現像感光材料
US9320700B2 (en) * 2014-03-18 2016-04-26 L'oreal Cosmetic composition including acid

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5393649A (en) * 1994-03-16 1995-02-28 Eastman Kodak Company Thermally processable imaging element including an adhesive interlayer comprising a polymer having pyrrolidone functionality
US5422234A (en) * 1994-03-16 1995-06-06 Eastman Kodak Company Thermally processable imaging element including an adhesive interlayer comprising a polymer having epoxy functionality
JP3995830B2 (ja) * 1999-01-13 2007-10-24 富士フイルム株式会社 熱現像画像記録材料
US6419987B1 (en) * 1999-12-17 2002-07-16 Eastman Kodak Company Method for providing a high viscosity coating on a moving web and articles made thereby
JP4183869B2 (ja) * 2000-01-11 2008-11-19 富士フイルム株式会社 熱現像感光材料
JP2001249425A (ja) * 2000-03-06 2001-09-14 Fuji Photo Film Co Ltd 熱現像感光材料および画像形成方法
JP3965861B2 (ja) * 2000-04-06 2007-08-29 コニカミノルタホールディングス株式会社 熱現像感光材料
JP3915373B2 (ja) * 2000-06-15 2007-05-16 コニカミノルタホールディングス株式会社 熱現像感光材料及びその画像形成方法
US6762016B2 (en) * 2000-09-25 2004-07-13 Fuji Photo Film Co., Ltd. Photothermographic material
US6352819B1 (en) * 2000-12-01 2002-03-05 Eastman Kodak Company High contrast thermally-developable imaging materials containing barrier layer
JP2002182333A (ja) * 2000-12-13 2002-06-26 Fuji Photo Film Co Ltd 熱現像感光材料の製造方法

Also Published As

Publication number Publication date
US6821720B2 (en) 2004-11-23
JP2003114500A (ja) 2003-04-18
EP1300725A2 (de) 2003-04-09
EP1300725A3 (de) 2004-01-21
DE60220976T2 (de) 2007-10-18
EP1300725B1 (de) 2007-07-04
US20030073046A1 (en) 2003-04-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition