DE60220976D1 - A process for producing a heat-developable photosensitive material - Google Patents

A process for producing a heat-developable photosensitive material

Info

Publication number
DE60220976D1
DE60220976D1 DE60220976T DE60220976T DE60220976D1 DE 60220976 D1 DE60220976 D1 DE 60220976D1 DE 60220976 T DE60220976 T DE 60220976T DE 60220976 T DE60220976 T DE 60220976T DE 60220976 D1 DE60220976 D1 DE 60220976D1
Authority
DE
Germany
Prior art keywords
producing
heat
photosensitive material
developable photosensitive
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60220976T
Other languages
German (de)
Other versions
DE60220976T2 (en
Inventor
Junpei Iwado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of DE60220976D1 publication Critical patent/DE60220976D1/en
Publication of DE60220976T2 publication Critical patent/DE60220976T2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498—Photothermographic systems, e.g. dry silver
    • G03C1/49872—Aspects relating to non-photosensitive layers, e.g. intermediate protective layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G03C2001/7496—Viscosity range
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C2200/00—Details
    • G03C2200/35—Intermediate layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C2200/00—Details
    • G03C2200/44—Details pH value
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer
DE60220976T 2001-10-04 2002-10-02 A process for producing a heat-developable photosensitive material Expired - Lifetime DE60220976T2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001308372 2001-10-04
JP2001308372A JP2003114500A (en) 2001-10-04 2001-10-04 Method for producing heat-developable photosensitive material

Publications (2)

Publication Number Publication Date
DE60220976D1 true DE60220976D1 (en) 2007-08-16
DE60220976T2 DE60220976T2 (en) 2007-10-18

Family

ID=19127698

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60220976T Expired - Lifetime DE60220976T2 (en) 2001-10-04 2002-10-02 A process for producing a heat-developable photosensitive material

Country Status (4)

Country Link
US (1) US6821720B2 (en)
EP (1) EP1300725B1 (en)
JP (1) JP2003114500A (en)
DE (1) DE60220976T2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6702195B2 (en) * 2002-07-15 2004-03-09 Xerox Corporation Multi-layer slot coating die with selective ultrasonic assist
US7332267B2 (en) * 2002-12-17 2008-02-19 Fujifilm Corporation Photothermographic material
US7157217B2 (en) * 2002-12-17 2007-01-02 Fujifilm Corporation Photothermographic material
JP4092213B2 (en) * 2003-01-06 2008-05-28 富士フイルム株式会社 Photothermographic material
JP2004309948A (en) * 2003-04-10 2004-11-04 Fuji Photo Film Co Ltd Heat developable photosensitive material
US20050208441A1 (en) * 2004-03-19 2005-09-22 Fuji Photo Film Co., Ltd. Photothermographic material and image forming method utilizing the same
JP2006030895A (en) * 2004-07-21 2006-02-02 Fuji Photo Film Co Ltd Method for manufacturing heat developable photosensitive material and heat developable photosensitive material manufactured by the same
US9320700B2 (en) * 2014-03-18 2016-04-26 L'oreal Cosmetic composition including acid

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5422234A (en) * 1994-03-16 1995-06-06 Eastman Kodak Company Thermally processable imaging element including an adhesive interlayer comprising a polymer having epoxy functionality
US5393649A (en) * 1994-03-16 1995-02-28 Eastman Kodak Company Thermally processable imaging element including an adhesive interlayer comprising a polymer having pyrrolidone functionality
JP3995830B2 (en) * 1999-01-13 2007-10-24 富士フイルム株式会社 Thermally developed image recording material
US6419987B1 (en) * 1999-12-17 2002-07-16 Eastman Kodak Company Method for providing a high viscosity coating on a moving web and articles made thereby
JP4183869B2 (en) * 2000-01-11 2008-11-19 富士フイルム株式会社 Photothermographic material
JP2001249425A (en) * 2000-03-06 2001-09-14 Fuji Photo Film Co Ltd Heat developable photosensitive material and image forming method
JP3965861B2 (en) * 2000-04-06 2007-08-29 コニカミノルタホールディングス株式会社 Photothermographic material
JP3915373B2 (en) * 2000-06-15 2007-05-16 コニカミノルタホールディングス株式会社 Photothermographic material and image forming method thereof
US6762016B2 (en) * 2000-09-25 2004-07-13 Fuji Photo Film Co., Ltd. Photothermographic material
US6352819B1 (en) * 2000-12-01 2002-03-05 Eastman Kodak Company High contrast thermally-developable imaging materials containing barrier layer
JP2002182333A (en) * 2000-12-13 2002-06-26 Fuji Photo Film Co Ltd Method for producing heat developable photosensitive material

Also Published As

Publication number Publication date
US20030073046A1 (en) 2003-04-17
EP1300725A3 (en) 2004-01-21
US6821720B2 (en) 2004-11-23
EP1300725A2 (en) 2003-04-09
DE60220976T2 (en) 2007-10-18
EP1300725B1 (en) 2007-07-04
JP2003114500A (en) 2003-04-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition