DE60212024D1 - Strahlungsempfindliche Harzzusammensetzung, Rippe und Verfahren zur Herstellung derselben und Anzeigeelement - Google Patents
Strahlungsempfindliche Harzzusammensetzung, Rippe und Verfahren zur Herstellung derselben und AnzeigeelementInfo
- Publication number
- DE60212024D1 DE60212024D1 DE60212024T DE60212024T DE60212024D1 DE 60212024 D1 DE60212024 D1 DE 60212024D1 DE 60212024 T DE60212024 T DE 60212024T DE 60212024 T DE60212024 T DE 60212024T DE 60212024 D1 DE60212024 D1 DE 60212024D1
- Authority
- DE
- Germany
- Prior art keywords
- rib
- making
- resin composition
- same
- display element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Graft Or Block Polymers (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001271609A JP2003082042A (ja) | 2001-09-07 | 2001-09-07 | 隔壁形成用感放射線性樹脂組成物、隔壁、および表示素子。 |
JP2001271609 | 2001-09-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60212024D1 true DE60212024D1 (de) | 2006-07-20 |
DE60212024T2 DE60212024T2 (de) | 2006-11-30 |
Family
ID=19097096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60212024T Expired - Lifetime DE60212024T2 (de) | 2001-09-07 | 2002-09-05 | Strahlungsempfindliche Harzzusammensetzung, Rippe und Verfahren zur Herstellung derselben und Anzeigeelement |
Country Status (6)
Country | Link |
---|---|
US (1) | US6852476B2 (de) |
EP (1) | EP1296186B1 (de) |
JP (1) | JP2003082042A (de) |
KR (1) | KR20030051178A (de) |
DE (1) | DE60212024T2 (de) |
TW (1) | TWI311577B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005037668A (ja) * | 2003-07-14 | 2005-02-10 | Jsr Corp | パターン形成法および光学素子 |
JP4322097B2 (ja) | 2003-11-14 | 2009-08-26 | 東京応化工業株式会社 | El表示素子の隔壁、およびel表示素子 |
JP4734508B2 (ja) * | 2004-06-21 | 2011-07-27 | 京セラ株式会社 | Elディスプレイおよびその製造方法 |
US6992326B1 (en) | 2004-08-03 | 2006-01-31 | Dupont Displays, Inc. | Electronic device and process for forming same |
US7477013B2 (en) * | 2004-08-12 | 2009-01-13 | E. I. Du Pont De Nemours And Company | Organic light emitting devices with distinct resistance regions |
US7166860B2 (en) * | 2004-12-30 | 2007-01-23 | E. I. Du Pont De Nemours And Company | Electronic device and process for forming same |
KR101209046B1 (ko) | 2005-07-27 | 2012-12-06 | 삼성디스플레이 주식회사 | 박막트랜지스터 기판과 박막트랜지스터 기판의 제조방법 |
JP4677871B2 (ja) * | 2005-10-03 | 2011-04-27 | Jsr株式会社 | 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成 |
JP4895034B2 (ja) * | 2006-05-24 | 2012-03-14 | Jsr株式会社 | 感放射線性樹脂組成物、スペーサーおよびその形成方法 |
CN101543135B (zh) | 2007-05-31 | 2011-04-13 | 松下电器产业株式会社 | 有机电致发光元件和其制造方法 |
KR101599757B1 (ko) * | 2011-09-30 | 2016-03-04 | 디아이씨 가부시끼가이샤 | 잉크젯 잉크용 기록 매체, 잉크젯 인쇄물 및 그 제조 방법 |
KR102378162B1 (ko) * | 2014-04-25 | 2022-03-23 | 에이지씨 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자 |
US20210364916A1 (en) * | 2020-05-21 | 2021-11-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist composition and method of forming photoresist pattern |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2670791A1 (fr) * | 1990-12-21 | 1992-06-26 | Atochem | Composition a base de copolymere fluore reticulable pour peintures et vernis. |
JP3650985B2 (ja) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | ネガ型感放射線性樹脂組成物およびパターン製造法 |
JP3873263B2 (ja) * | 1997-09-22 | 2007-01-24 | Jsr株式会社 | 感放射線性樹脂組成物、保護膜、層間絶縁膜およびこれらの膜の形成法 |
JP3644243B2 (ja) * | 1998-03-31 | 2005-04-27 | Jsr株式会社 | 感放射線性樹脂組成物、カラーフィルタおよび液晶表示素子 |
JPH11329724A (ja) * | 1998-05-08 | 1999-11-30 | Futaba Corp | 有機el表示素子とその製造方法 |
JP2000305267A (ja) * | 1999-04-22 | 2000-11-02 | Jsr Corp | 感光性樹脂組成物 |
JP3891753B2 (ja) * | 2000-02-22 | 2007-03-14 | シャープ株式会社 | 有機発光素子の製造方法 |
US6468712B1 (en) * | 2000-02-25 | 2002-10-22 | Massachusetts Institute Of Technology | Resist materials for 157-nm lithography |
-
2001
- 2001-09-07 JP JP2001271609A patent/JP2003082042A/ja active Pending
-
2002
- 2002-09-05 DE DE60212024T patent/DE60212024T2/de not_active Expired - Lifetime
- 2002-09-05 TW TW091120342A patent/TWI311577B/zh not_active IP Right Cessation
- 2002-09-05 EP EP02019996A patent/EP1296186B1/de not_active Expired - Lifetime
- 2002-09-06 US US10/235,718 patent/US6852476B2/en not_active Expired - Fee Related
- 2002-09-06 KR KR1020020053707A patent/KR20030051178A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1296186B1 (de) | 2006-06-07 |
US6852476B2 (en) | 2005-02-08 |
DE60212024T2 (de) | 2006-11-30 |
EP1296186A1 (de) | 2003-03-26 |
TWI311577B (en) | 2009-07-01 |
US20030068574A1 (en) | 2003-04-10 |
KR20030051178A (ko) | 2003-06-25 |
JP2003082042A (ja) | 2003-03-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |