DE60201044D1 - Vorrichtung und Verfahren zur Vakuumbeschichtung mittels Lichtbogen - Google Patents
Vorrichtung und Verfahren zur Vakuumbeschichtung mittels LichtbogenInfo
- Publication number
- DE60201044D1 DE60201044D1 DE60201044T DE60201044T DE60201044D1 DE 60201044 D1 DE60201044 D1 DE 60201044D1 DE 60201044 T DE60201044 T DE 60201044T DE 60201044 T DE60201044 T DE 60201044T DE 60201044 D1 DE60201044 D1 DE 60201044D1
- Authority
- DE
- Germany
- Prior art keywords
- arc
- vacuum coating
- vacuum
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001095815A JP4085593B2 (ja) | 2001-03-29 | 2001-03-29 | 真空アーク蒸着装置 |
JP2001095815 | 2001-03-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60201044D1 true DE60201044D1 (de) | 2004-09-30 |
DE60201044T2 DE60201044T2 (de) | 2004-12-30 |
Family
ID=18949820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60201044T Expired - Lifetime DE60201044T2 (de) | 2001-03-29 | 2002-03-28 | Vorrichtung und Verfahren zur Vakuumbeschichtung mittels Lichtbogen |
Country Status (6)
Country | Link |
---|---|
US (2) | US6692623B2 (de) |
EP (1) | EP1245694B1 (de) |
JP (1) | JP4085593B2 (de) |
KR (1) | KR100496464B1 (de) |
DE (1) | DE60201044T2 (de) |
HK (1) | HK1048832B (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040134770A1 (en) * | 2002-11-15 | 2004-07-15 | Petersen John H | Ionic plasma deposition apparatus |
US8066854B2 (en) * | 2002-12-18 | 2011-11-29 | Metascape Llc | Antimicrobial coating methods |
JP2006515387A (ja) * | 2002-12-18 | 2006-05-25 | アイオニック フュージョン コーポレイション | 抗−微生物性表面のイオン性プラズマ堆積、及びそれらから得られる抗−微生物性表面 |
JP4045953B2 (ja) * | 2002-12-27 | 2008-02-13 | 日新電機株式会社 | 真空アーク蒸着装置 |
US7509734B2 (en) * | 2003-03-03 | 2009-03-31 | United Technologies Corporation | Repairing turbine element |
JP4438326B2 (ja) * | 2003-06-13 | 2010-03-24 | 日新電機株式会社 | 偏向磁場型真空アーク蒸着装置 |
US20080003377A1 (en) * | 2006-06-30 | 2008-01-03 | The Board Of Regents Of The Nevada System Of Higher Ed. On Behalf Of The Unlv | Transparent vacuum system |
JP4660452B2 (ja) * | 2006-09-30 | 2011-03-30 | 株式会社フェローテック | 拡径管型プラズマ生成装置 |
US7872244B2 (en) * | 2007-08-08 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4955027B2 (ja) * | 2009-04-02 | 2012-06-20 | クリーン・テクノロジー株式会社 | 排ガス処理装置における磁場によるプラズマの制御方法 |
WO2013170052A1 (en) | 2012-05-09 | 2013-11-14 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
PL2251453T3 (pl) | 2009-05-13 | 2014-05-30 | Sio2 Medical Products Inc | Uchwyt na pojemnik |
JP5644085B2 (ja) * | 2009-06-10 | 2014-12-24 | 富士通株式会社 | 成膜装置及び成膜方法 |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
KR101036676B1 (ko) * | 2009-07-31 | 2011-05-23 | 한국염색기술연구소 | 석탄 화력발전 보일러 설비용 염색폐수 슬러지의 연료화장치 및 그 방법 |
JP5606777B2 (ja) * | 2010-04-22 | 2014-10-15 | 株式会社フェローテック | プラズマ流生成方法、プラズマ処理方法、プラズマ発生装置及びプラズマ処理装置 |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
CN102776479A (zh) * | 2011-05-09 | 2012-11-14 | 无锡尚德太阳能电力有限公司 | 一种薄膜制备装置和方法 |
US9153422B2 (en) | 2011-08-02 | 2015-10-06 | Envaerospace, Inc. | Arc PVD plasma source and method of deposition of nanoimplanted coatings |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
EP2776603B1 (de) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | Passivierungs-, ph-schutz- oder schmierbeschichtung für arzneimittelverpackung, beschichtungsverfahren und vorrichtung |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9793098B2 (en) * | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
CN104854257B (zh) | 2012-11-01 | 2018-04-13 | Sio2医药产品公司 | 涂层检查方法 |
US9903782B2 (en) | 2012-11-16 | 2018-02-27 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
BR112015012470B1 (pt) | 2012-11-30 | 2022-08-02 | Sio2 Medical Products, Inc | Método de produção de um tambor médico para um cartucho ou seringa médica |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
US9564297B2 (en) | 2013-05-16 | 2017-02-07 | Applied Materials, Inc. | Electron beam plasma source with remote radical source |
US9721760B2 (en) * | 2013-05-16 | 2017-08-01 | Applied Materials, Inc. | Electron beam plasma source with reduced metal contamination |
EP3693493A1 (de) | 2014-03-28 | 2020-08-12 | SiO2 Medical Products, Inc. | Antistatische beschichtungen für kunststoffbehälter |
KR20180048694A (ko) | 2015-08-18 | 2018-05-10 | 에스아이오2 메디컬 프로덕츠, 인크. | 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기 |
DE102020215892A1 (de) * | 2020-12-15 | 2022-06-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung zur Ausbildung von amorphen Kohlenstoffschichten auf Bauteiloberflächen mit reduzierter Oberflächenrauheit |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4724058A (en) | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
US5279723A (en) | 1992-07-30 | 1994-01-18 | As Represented By The United States Department Of Energy | Filtered cathodic arc source |
US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
KR100230279B1 (ko) | 1997-03-31 | 1999-11-15 | 윤종용 | 음극 아크 방전을 이용한 박막 증착장치 |
JP3449198B2 (ja) * | 1997-10-22 | 2003-09-22 | 日新電機株式会社 | イオン注入装置 |
JP3514127B2 (ja) * | 1998-07-17 | 2004-03-31 | 三菱マテリアル株式会社 | 粗大ドロップレットの少ない金属化合物薄膜の形成を可能とするアーク式イオンプレーティング装置 |
JP2001003160A (ja) * | 1999-06-18 | 2001-01-09 | Nissin Electric Co Ltd | 膜形成方法およびその装置 |
-
2001
- 2001-03-29 JP JP2001095815A patent/JP4085593B2/ja not_active Expired - Fee Related
-
2002
- 2002-03-28 EP EP02007409A patent/EP1245694B1/de not_active Expired - Lifetime
- 2002-03-28 US US10/107,363 patent/US6692623B2/en not_active Expired - Fee Related
- 2002-03-28 DE DE60201044T patent/DE60201044T2/de not_active Expired - Lifetime
- 2002-03-29 KR KR10-2002-0017207A patent/KR100496464B1/ko not_active IP Right Cessation
-
2003
- 2003-02-11 HK HK03100983.6A patent/HK1048832B/zh not_active IP Right Cessation
- 2003-09-10 US US10/658,410 patent/US6866753B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20020157609A1 (en) | 2002-10-31 |
EP1245694B1 (de) | 2004-08-25 |
DE60201044T2 (de) | 2004-12-30 |
US6692623B2 (en) | 2004-02-17 |
US20040045812A1 (en) | 2004-03-11 |
HK1048832A1 (en) | 2003-04-17 |
EP1245694A1 (de) | 2002-10-02 |
US6866753B2 (en) | 2005-03-15 |
KR20020077216A (ko) | 2002-10-11 |
HK1048832B (zh) | 2005-03-18 |
JP2002294433A (ja) | 2002-10-09 |
KR100496464B1 (ko) | 2005-06-20 |
JP4085593B2 (ja) | 2008-05-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |