DE602009000273D1 - Quelle für geladene Teilchen mit integriertem Energiefilter - Google Patents

Quelle für geladene Teilchen mit integriertem Energiefilter

Info

Publication number
DE602009000273D1
DE602009000273D1 DE602009000273T DE602009000273T DE602009000273D1 DE 602009000273 D1 DE602009000273 D1 DE 602009000273D1 DE 602009000273 T DE602009000273 T DE 602009000273T DE 602009000273 T DE602009000273 T DE 602009000273T DE 602009000273 D1 DE602009000273 D1 DE 602009000273D1
Authority
DE
Germany
Prior art keywords
energy
slit
lens
diaphragm
charged particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602009000273T
Other languages
English (en)
Inventor
Alexander Henstra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of DE602009000273D1 publication Critical patent/DE602009000273D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/027—Construction of the gun or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/04—Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE602009000273T 2008-05-26 2009-05-25 Quelle für geladene Teilchen mit integriertem Energiefilter Active DE602009000273D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08156906A EP2128885A1 (de) 2008-05-26 2008-05-26 Quelle für geladene Teilchen mit integriertem Energiefilter

Publications (1)

Publication Number Publication Date
DE602009000273D1 true DE602009000273D1 (de) 2010-11-25

Family

ID=39830356

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602009000273T Active DE602009000273D1 (de) 2008-05-26 2009-05-25 Quelle für geladene Teilchen mit integriertem Energiefilter

Country Status (6)

Country Link
US (2) US7999225B2 (de)
EP (2) EP2128885A1 (de)
JP (1) JP5160499B2 (de)
CN (1) CN101593658B (de)
AT (1) ATE484841T1 (de)
DE (1) DE602009000273D1 (de)

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EP2128885A1 (de) * 2008-05-26 2009-12-02 FEI Company Quelle für geladene Teilchen mit integriertem Energiefilter
US8053725B2 (en) * 2009-06-29 2011-11-08 Fei Company Beam quality in FIB systems
EP2453461A1 (de) * 2010-11-10 2012-05-16 FEI Company Quelle für geladene Teilchen mit integriertem elektrostatischen Energiefilter
US8334508B1 (en) * 2011-02-22 2012-12-18 Electron Optica, Inc. Mirror energy filter for electron beam apparatus
FR2974967A1 (fr) * 2011-05-02 2012-11-09 Gen Electric Procede et dispositif pour la mise en oeuvre d'imagerie a double energie
US9111715B2 (en) 2011-11-08 2015-08-18 Fei Company Charged particle energy filter
US8890092B2 (en) * 2013-01-28 2014-11-18 Industry—University Cooperation Foundation Sunmoon University Multi-particle beam column having an electrode layer including an eccentric aperture
EP2816585A1 (de) * 2013-06-17 2014-12-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ladungsträgerstrahlsystem und Verfahren zum Betrieb davon
US9443696B2 (en) 2014-05-25 2016-09-13 Kla-Tencor Corporation Electron beam imaging with dual Wien-filter monochromator
KR101633978B1 (ko) 2014-06-20 2016-06-28 한국표준과학연구원 모노크로메이터 및 이를 구비한 하전입자빔 장치
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
US9767984B2 (en) 2014-09-30 2017-09-19 Fei Company Chicane blanker assemblies for charged particle beam systems and methods of using the same
US9905391B2 (en) * 2015-04-29 2018-02-27 Kla-Tencor Corporation System and method for imaging a sample with an electron beam with a filtered energy spread
KR20240042242A (ko) * 2015-07-22 2024-04-01 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US10192716B2 (en) * 2015-09-21 2019-01-29 Kla-Tencor Corporation Multi-beam dark field imaging
EP3203493B1 (de) * 2016-02-02 2018-10-03 FEI Company Ladungsträger-mikroskop mit astigmatismuskompensation und energieauswahl
US10410827B2 (en) 2017-05-03 2019-09-10 Fei Company Gun lens design in a charged particle microscope
DE102017208005B3 (de) * 2017-05-11 2018-08-16 Carl Zeiss Microscopy Gmbh Teilchenquelle zur Erzeugung eines Teilchenstrahls und teilchenoptische Vorrichtung
WO2019020396A1 (en) * 2017-07-28 2019-01-31 Asml Netherlands B.V. SYSTEMS AND METHODS FOR DISPERSION COMPENSATION OF A BEAM SEPARATOR IN A MULTI-BEAM APPARATUS
CN108566720B (zh) * 2018-03-08 2019-05-03 西北核技术研究所 一种粒子加速器能量选择与分析系统
JP7231738B2 (ja) * 2018-12-31 2023-03-01 エーエスエムエル ネザーランズ ビー．ブイ． 複数ビームを用いたインレンズウェーハプリチャージ及び検査
CN111266368B (zh) * 2020-01-20 2020-09-22 哈尔滨工业大学 一种聚焦离子束清理透射电子显微镜光阑的方法
JP7379712B2 (ja) 2020-07-20 2023-11-14 株式会社日立ハイテク エネルギーフィルタ、およびそれを備えたエネルギーアナライザおよび荷電粒子ビーム装置

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ATE524822T1 (de) * 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
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EP2128885A1 (de) * 2008-05-26 2009-12-02 FEI Company Quelle für geladene Teilchen mit integriertem Energiefilter

Also Published As

Publication number Publication date
JP2009289748A (ja) 2009-12-10
CN101593658A (zh) 2009-12-02
US20110284763A1 (en) 2011-11-24
EP2128886B1 (de) 2010-10-13
EP2128886A1 (de) 2009-12-02
CN101593658B (zh) 2014-05-07
JP5160499B2 (ja) 2013-03-13
US7999225B2 (en) 2011-08-16
EP2128885A1 (de) 2009-12-02
US20090289195A1 (en) 2009-11-26
US8461525B2 (en) 2013-06-11
ATE484841T1 (de) 2010-10-15

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