ATE484841T1 - Quelle für geladene teilchen mit integriertem energiefilter - Google Patents
Quelle für geladene teilchen mit integriertem energiefilterInfo
- Publication number
- ATE484841T1 ATE484841T1 AT09160973T AT09160973T ATE484841T1 AT E484841 T1 ATE484841 T1 AT E484841T1 AT 09160973 T AT09160973 T AT 09160973T AT 09160973 T AT09160973 T AT 09160973T AT E484841 T1 ATE484841 T1 AT E484841T1
- Authority
- AT
- Austria
- Prior art keywords
- energy
- slit
- lens
- diaphragm
- charged particles
- Prior art date
Links
- 239000002245 particle Substances 0.000 title abstract 4
- 230000003287 optical effect Effects 0.000 abstract 2
- 238000011109 contamination Methods 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 230000003993 interaction Effects 0.000 abstract 1
- 238000001228 spectrum Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/027—Construction of the gun or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/04—Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/061—Construction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08156906A EP2128885A1 (de) | 2008-05-26 | 2008-05-26 | Quelle für geladene Teilchen mit integriertem Energiefilter |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE484841T1 true ATE484841T1 (de) | 2010-10-15 |
Family
ID=39830356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT09160973T ATE484841T1 (de) | 2008-05-26 | 2009-05-25 | Quelle für geladene teilchen mit integriertem energiefilter |
Country Status (6)
Country | Link |
---|---|
US (2) | US7999225B2 (de) |
EP (2) | EP2128885A1 (de) |
JP (1) | JP5160499B2 (de) |
CN (1) | CN101593658B (de) |
AT (1) | ATE484841T1 (de) |
DE (1) | DE602009000273D1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2128885A1 (de) * | 2008-05-26 | 2009-12-02 | FEI Company | Quelle für geladene Teilchen mit integriertem Energiefilter |
US8053725B2 (en) * | 2009-06-29 | 2011-11-08 | Fei Company | Beam quality in FIB systems |
EP2453461A1 (de) * | 2010-11-10 | 2012-05-16 | FEI Company | Quelle für geladene Teilchen mit integriertem elektrostatischen Energiefilter |
US8334508B1 (en) * | 2011-02-22 | 2012-12-18 | Electron Optica, Inc. | Mirror energy filter for electron beam apparatus |
FR2974967A1 (fr) * | 2011-05-02 | 2012-11-09 | Gen Electric | Procede et dispositif pour la mise en oeuvre d'imagerie a double energie |
US9111715B2 (en) | 2011-11-08 | 2015-08-18 | Fei Company | Charged particle energy filter |
US8890092B2 (en) * | 2013-01-28 | 2014-11-18 | Industry—University Cooperation Foundation Sunmoon University | Multi-particle beam column having an electrode layer including an eccentric aperture |
EP2816585A1 (de) * | 2013-06-17 | 2014-12-24 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Ladungsträgerstrahlsystem und Verfahren zum Betrieb davon |
US9443696B2 (en) | 2014-05-25 | 2016-09-13 | Kla-Tencor Corporation | Electron beam imaging with dual Wien-filter monochromator |
KR101633978B1 (ko) | 2014-06-20 | 2016-06-28 | 한국표준과학연구원 | 모노크로메이터 및 이를 구비한 하전입자빔 장치 |
NL2013411B1 (en) * | 2014-09-04 | 2016-09-27 | Univ Delft Tech | Multi electron beam inspection apparatus. |
US9767984B2 (en) | 2014-09-30 | 2017-09-19 | Fei Company | Chicane blanker assemblies for charged particle beam systems and methods of using the same |
US9905391B2 (en) * | 2015-04-29 | 2018-02-27 | Kla-Tencor Corporation | System and method for imaging a sample with an electron beam with a filtered energy spread |
KR20240042242A (ko) * | 2015-07-22 | 2024-04-01 | 에이에스엠엘 네델란즈 비.브이. | 복수의 하전 입자 빔을 이용하는 장치 |
US10192716B2 (en) * | 2015-09-21 | 2019-01-29 | Kla-Tencor Corporation | Multi-beam dark field imaging |
EP3203493B1 (de) * | 2016-02-02 | 2018-10-03 | FEI Company | Ladungsträger-mikroskop mit astigmatismuskompensation und energieauswahl |
US10410827B2 (en) | 2017-05-03 | 2019-09-10 | Fei Company | Gun lens design in a charged particle microscope |
DE102017208005B3 (de) * | 2017-05-11 | 2018-08-16 | Carl Zeiss Microscopy Gmbh | Teilchenquelle zur Erzeugung eines Teilchenstrahls und teilchenoptische Vorrichtung |
WO2019020396A1 (en) * | 2017-07-28 | 2019-01-31 | Asml Netherlands B.V. | SYSTEMS AND METHODS FOR DISPERSION COMPENSATION OF A BEAM SEPARATOR IN A MULTI-BEAM APPARATUS |
CN108566720B (zh) * | 2018-03-08 | 2019-05-03 | 西北核技术研究所 | 一种粒子加速器能量选择与分析系统 |
JP7231738B2 (ja) * | 2018-12-31 | 2023-03-01 | エーエスエムエル ネザーランズ ビー.ブイ. | 複数ビームを用いたインレンズウェーハプリチャージ及び検査 |
CN111266368B (zh) * | 2020-01-20 | 2020-09-22 | 哈尔滨工业大学 | 一种聚焦离子束清理透射电子显微镜光阑的方法 |
JP7379712B2 (ja) | 2020-07-20 | 2023-11-14 | 株式会社日立ハイテク | エネルギーフィルタ、およびそれを備えたエネルギーアナライザおよび荷電粒子ビーム装置 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7004207A (de) | 1969-07-30 | 1971-02-02 | ||
GB1416043A (en) | 1972-01-28 | 1975-12-03 | Nasa | Electron microscope aperture system |
US4590379A (en) * | 1980-09-16 | 1986-05-20 | Martin Frederick W | Achromatic deflector and quadrupole lens |
DE8634545U1 (de) | 1986-12-23 | 1987-05-21 | Siemens AG, 1000 Berlin und 8000 München | Korpuskularstrahlgerät zur fehlerarmen Abbildung linienförmiger Objekte |
DE3825103A1 (de) * | 1988-07-23 | 1990-01-25 | Zeiss Carl Fa | Verfahren zum beleuchten eines objektes in einem transmissions-elektronenmikroskop |
DE69027602T2 (de) | 1990-08-08 | 1997-01-23 | Philips Electronics Nv | Energiefilter für Ladungsträgervorrichtung |
NL9100294A (nl) | 1991-02-20 | 1992-09-16 | Philips Nv | Geladen deeltjesbundelinrichting. |
DE4216730C2 (de) | 1992-05-20 | 2003-07-24 | Advantest Corp | Rasterelektronenstrahlgerät |
EP0647960B1 (de) | 1993-05-21 | 1997-03-26 | Koninklijke Philips Electronics N.V. | Energiefilter mit Korrektur von chromatischen Aberrationen zweiter ordnung |
JPH10510674A (ja) | 1995-10-03 | 1998-10-13 | フィリップス エレクトロニクス エヌ ベー | 単色分光計用の固定ダイヤフラムからなる粒子光学装置 |
WO1997044811A1 (en) | 1996-05-21 | 1997-11-27 | Philips Electronics N.V. | Correction device for the correction of lens aberrations in particle-optical apparatus |
US5798524A (en) | 1996-08-07 | 1998-08-25 | Gatan, Inc. | Automated adjustment of an energy filtering transmission electron microscope |
DE19633496B4 (de) | 1996-08-20 | 2006-06-08 | Ceos Corrected Electron Optical Systems Gmbh | Monchromator für die Elektronenoptik, insbesondere Elketronenmikroskopie |
WO1998012732A1 (en) | 1996-09-20 | 1998-03-26 | Philips Electronics N.V. | Correction device for correcting chromatic aberration in particle-optical apparatus |
EP0883891B1 (de) | 1996-12-03 | 2003-04-23 | Fei Company | Verfahren zum betreiben eines partikels optischen gerätes |
EP0989584B1 (de) | 1998-09-23 | 2004-11-24 | Advantest Corporation | Vorrichtung zur Reduzierung der Energieverteilung eines Teilchenstrahls und Teilchenstrahlgerät mit einer solchen Anordnung |
WO2000079565A1 (en) | 1999-06-22 | 2000-12-28 | Philips Electron Optics B.V. | Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current |
EP1150327B1 (de) | 2000-04-27 | 2018-02-14 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Mehrstrahl Ladungsträgerstrahlvorrichtung |
US6501076B1 (en) | 2000-10-11 | 2002-12-31 | Fei Company | Electron analyzer having an integrated low pass filter |
JP2004534360A (ja) * | 2001-06-15 | 2004-11-11 | 株式会社荏原製作所 | 電子線装置及びその電子線装置を用いたデバイスの製造方法 |
JP3968334B2 (ja) * | 2002-09-11 | 2007-08-29 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び荷電粒子線照射方法 |
ATE524822T1 (de) * | 2003-05-28 | 2011-09-15 | Mapper Lithography Ip Bv | Belichtungsverfahren für strahlen aus geladenen teilchen |
NL1025500C2 (nl) | 2004-02-17 | 2005-08-19 | Fei Co | Deeltjesbron met selecteerbare bundelstroom en energiespreiding. |
EP2128885A1 (de) * | 2008-05-26 | 2009-12-02 | FEI Company | Quelle für geladene Teilchen mit integriertem Energiefilter |
-
2008
- 2008-05-26 EP EP08156906A patent/EP2128885A1/de not_active Withdrawn
-
2009
- 2009-05-25 DE DE602009000273T patent/DE602009000273D1/de active Active
- 2009-05-25 JP JP2009124911A patent/JP5160499B2/ja active Active
- 2009-05-25 AT AT09160973T patent/ATE484841T1/de not_active IP Right Cessation
- 2009-05-25 EP EP09160973A patent/EP2128886B1/de active Active
- 2009-05-26 US US12/472,259 patent/US7999225B2/en active Active
- 2009-05-26 CN CN200910145359.7A patent/CN101593658B/zh active Active
-
2011
- 2011-08-04 US US13/198,640 patent/US8461525B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2009289748A (ja) | 2009-12-10 |
CN101593658A (zh) | 2009-12-02 |
US20110284763A1 (en) | 2011-11-24 |
DE602009000273D1 (de) | 2010-11-25 |
EP2128886B1 (de) | 2010-10-13 |
EP2128886A1 (de) | 2009-12-02 |
CN101593658B (zh) | 2014-05-07 |
JP5160499B2 (ja) | 2013-03-13 |
US7999225B2 (en) | 2011-08-16 |
EP2128885A1 (de) | 2009-12-02 |
US20090289195A1 (en) | 2009-11-26 |
US8461525B2 (en) | 2013-06-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE484841T1 (de) | Quelle für geladene teilchen mit integriertem energiefilter | |
US10811215B2 (en) | Charged particle beam system | |
JP4749734B2 (ja) | 選択可能なビーム電流及びエネルギーの広がりを備えた粒子源 | |
US7507956B2 (en) | Charged particle beam energy width reduction system for charged particle beam system | |
US8158939B2 (en) | High resolution gas field ion column | |
JP5518128B2 (ja) | 荷電粒子ビーム装置用モノクロメータ及びこれを用いた電子装置 | |
KR102277431B1 (ko) | 듀얼 빈 필터 모노크로메이터를 사용한 전자 빔 영상화 | |
US7919749B2 (en) | Energy filter for cold field emission electron beam apparatus | |
US20180005797A1 (en) | Scanning electron microscope | |
US9905391B2 (en) | System and method for imaging a sample with an electron beam with a filtered energy spread | |
US7679054B2 (en) | Double stage charged particle beam energy width reduction system for charged particle beam system | |
JP2013102060A5 (de) | ||
US8946650B2 (en) | Particle beam device and method for analyzing and/or treating an object | |
JP2019079953A5 (de) | ||
WO2006126872A1 (en) | Apparatus for the generation of parallel beamlets | |
US9991088B2 (en) | Charged particle beam device and aberration corrector | |
JP5657460B2 (ja) | 電子ビーム描画装置 | |
JP2009231036A (ja) | 収差補正集束イオンビーム装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |