JPH10510674A - 単色分光計用の固定ダイヤフラムからなる粒子光学装置 - Google Patents
単色分光計用の固定ダイヤフラムからなる粒子光学装置Info
- Publication number
- JPH10510674A JPH10510674A JP9514104A JP51410497A JPH10510674A JP H10510674 A JPH10510674 A JP H10510674A JP 9514104 A JP9514104 A JP 9514104A JP 51410497 A JP51410497 A JP 51410497A JP H10510674 A JPH10510674 A JP H10510674A
- Authority
- JP
- Japan
- Prior art keywords
- filter
- filter assembly
- electron
- particle
- diaphragm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 粒子が横切る加速高圧電界を粒子源内に確立する高圧手段(16a,16 b)を含む、荷電粒子の1次ビーム(31)を生成する粒子源(2)と、 1次ビームのエネルギー分散よりも少ないエネルギー分散を備えた2次ビーム を1次ビームから選択するため、粒子源内の高圧電界の実質的に完全に前方にあ る単色分光計フィルタ組立体(10)とからなる粒子光学装置であって、 上記単色分光計フィルタ組立体(10)の入り口側に在り、通常の動作条件で 単色分光計フィルタ組立体の一部(48a)に固定的に連結されたダイヤフラム (30)が設けられていることを特徴とする粒子光学装置。 2. 上記単色分光計フィルタ組立体(10)は、ウィーンフィルタからなる請 求項1記載の粒子光学装置。 3. 上記フィルタ組立体(10)は、フィルタの磁界を発生させる永久磁石( 36)を有する請求項2記載の粒子光学装置。 4. ダイヤフラム(30)は、ウィーンフィルタの磁気回路の磁極面又は磁界 画成密閉部品(48a)に連結されていることを特徴とする請求項2又は3記載 の粒子光学装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL95202649.0 | 1995-10-03 | ||
EP95202649 | 1995-10-03 | ||
PCT/IB1996/001029 WO1997013268A1 (en) | 1995-10-03 | 1996-10-01 | Particle-optical apparatus comprising a fixed diaphragm for the monochromator filter |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007017782A Division JP2007109675A (ja) | 1995-10-03 | 2007-01-29 | 単色分光計用の固定ダイヤフラムからなる粒子光学装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10510674A true JPH10510674A (ja) | 1998-10-13 |
Family
ID=8220679
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9514104A Pending JPH10510674A (ja) | 1995-10-03 | 1996-10-01 | 単色分光計用の固定ダイヤフラムからなる粒子光学装置 |
JP2007017782A Pending JP2007109675A (ja) | 1995-10-03 | 2007-01-29 | 単色分光計用の固定ダイヤフラムからなる粒子光学装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007017782A Pending JP2007109675A (ja) | 1995-10-03 | 2007-01-29 | 単色分光計用の固定ダイヤフラムからなる粒子光学装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5838004A (ja) |
EP (1) | EP0795196B1 (ja) |
JP (2) | JPH10510674A (ja) |
DE (1) | DE69610287T2 (ja) |
WO (1) | WO1997013268A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007504606A (ja) * | 2003-08-28 | 2007-03-01 | シマヅ リサーチ ラボラトリー(ヨーロッパ)リミティド | 粒子光学装置 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6288401B1 (en) * | 1999-07-30 | 2001-09-11 | Etec Systems, Inc. | Electrostatic alignment of a charged particle beam |
US6410924B1 (en) * | 1999-11-16 | 2002-06-25 | Schlumberger Technologies, Inc. | Energy filtered focused ion beam column |
US6495826B2 (en) * | 2000-04-10 | 2002-12-17 | Jeol, Ltd. | Monochrometer for electron beam |
CN100470216C (zh) * | 2007-10-30 | 2009-03-18 | 中国科学院西安光学精密机械研究所 | 不同类型光谱仪的对比方法 |
EP2128885A1 (en) | 2008-05-26 | 2009-12-02 | FEI Company | Charged particle source with integrated energy filter |
DE102010030372B4 (de) * | 2010-06-22 | 2012-02-16 | Dreebit Gmbh | Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum |
EP2453461A1 (en) | 2010-11-10 | 2012-05-16 | FEI Company | Charged particle source with integrated electrostatic energy filter |
US8183526B1 (en) | 2011-02-11 | 2012-05-22 | Electron Optica | Mirror monochromator for charged particle beam apparatus |
US8592761B2 (en) | 2011-05-19 | 2013-11-26 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
US8274046B1 (en) | 2011-05-19 | 2012-09-25 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
US9111715B2 (en) | 2011-11-08 | 2015-08-18 | Fei Company | Charged particle energy filter |
US8436317B1 (en) | 2011-11-09 | 2013-05-07 | Hermes-Microvision, Inc. | Wien filter |
US9767984B2 (en) | 2014-09-30 | 2017-09-19 | Fei Company | Chicane blanker assemblies for charged particle beam systems and methods of using the same |
JP7029933B2 (ja) * | 2017-11-02 | 2022-03-04 | 日本電子株式会社 | 電子顕微鏡および電子顕微鏡の制御方法 |
EP3489989B1 (en) | 2017-11-27 | 2020-07-08 | FEI Company | Transmission charged particle microscope with adjustable beam energy spread |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1074625A (en) * | 1963-04-24 | 1967-07-05 | Ass Elect Ind | Improvements relating to magnetic spectrometers |
NL7404363A (nl) * | 1974-04-01 | 1975-10-03 | Philips Nv | Elektronenmikroskoop met energieanalysator. |
JPH06101318B2 (ja) * | 1985-10-16 | 1994-12-12 | 株式会社日立製作所 | イオンマイクロビ−ム装置 |
US4743756A (en) * | 1987-08-10 | 1988-05-10 | Gatan Inc. | Parallel-detection electron energy-loss spectrometer |
EP0555911B1 (en) * | 1992-02-12 | 1999-01-07 | Koninklijke Philips Electronics N.V. | Method of reducing a spatial spread within an electron beam, and an electron beam apparatus suitable for carrying out such a method |
EP0647960B1 (en) * | 1993-05-21 | 1997-03-26 | Koninklijke Philips Electronics N.V. | Energy filter with correction of a second-order chromatic aberration |
US5386115A (en) * | 1993-09-22 | 1995-01-31 | Westinghouse Electric Corporation | Solid state micro-machined mass spectrograph universal gas detection sensor |
-
1996
- 1996-10-01 JP JP9514104A patent/JPH10510674A/ja active Pending
- 1996-10-01 DE DE69610287T patent/DE69610287T2/de not_active Expired - Lifetime
- 1996-10-01 WO PCT/IB1996/001029 patent/WO1997013268A1/en active IP Right Grant
- 1996-10-01 EP EP96930328A patent/EP0795196B1/en not_active Expired - Lifetime
- 1996-10-01 US US08/849,205 patent/US5838004A/en not_active Expired - Lifetime
-
2007
- 2007-01-29 JP JP2007017782A patent/JP2007109675A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007504606A (ja) * | 2003-08-28 | 2007-03-01 | シマヅ リサーチ ラボラトリー(ヨーロッパ)リミティド | 粒子光学装置 |
Also Published As
Publication number | Publication date |
---|---|
WO1997013268A1 (en) | 1997-04-10 |
EP0795196A1 (en) | 1997-09-17 |
DE69610287T2 (de) | 2001-04-12 |
DE69610287D1 (de) | 2000-10-19 |
JP2007109675A (ja) | 2007-04-26 |
EP0795196B1 (en) | 2000-09-13 |
US5838004A (en) | 1998-11-17 |
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