WO2007042336A2
(en)
|
2005-10-14 |
2007-04-19 |
Stmicroelectronics S.R.L. |
Substrate-level assembly for an integrated device, manufacturing process thereof and related integrated device
|
GB0605576D0
(en)
*
|
2006-03-20 |
2006-04-26 |
Oligon Ltd |
MEMS device
|
WO2008076929A1
(en)
*
|
2006-12-15 |
2008-06-26 |
The Regents Of The University Of California |
Acoustic substrate
|
US20080290494A1
(en)
*
|
2007-05-21 |
2008-11-27 |
Markus Lutz |
Backside release and/or encapsulation of microelectromechanical structures and method of manufacturing same
|
US8542850B2
(en)
|
2007-09-12 |
2013-09-24 |
Epcos Pte Ltd |
Miniature microphone assembly with hydrophobic surface coating
|
SG155795A1
(en)
*
|
2008-03-19 |
2009-10-29 |
Sensfab Pte Ltd |
Water resistant ultra-low pressure sensor and method of fabrication of same
|
SG158758A1
(en)
*
|
2008-07-14 |
2010-02-26 |
Sensfab Pte Ltd |
Extended sensor back volume
|
DE102008040597A1
(de)
|
2008-07-22 |
2010-01-28 |
Robert Bosch Gmbh |
Mikromechanisches Bauelement mit Rückvolumen
|
US7951636B2
(en)
*
|
2008-09-22 |
2011-05-31 |
Solid State System Co. Ltd. |
Method for fabricating micro-electro-mechanical system (MEMS) device
|
KR101065292B1
(ko)
*
|
2008-12-22 |
2011-09-19 |
한국전자통신연구원 |
멤스 마이크로폰 및 그 제조 방법
|
DE102009000053A1
(de)
*
|
2009-01-07 |
2010-07-08 |
Robert Bosch Gmbh |
Bauelement mit einer mikromechanischen Mikrofonstruktur
|
US8405115B2
(en)
*
|
2009-01-28 |
2013-03-26 |
Maxim Integrated Products, Inc. |
Light sensor using wafer-level packaging
|
US8580596B2
(en)
*
|
2009-04-10 |
2013-11-12 |
Nxp, B.V. |
Front end micro cavity
|
US8330239B2
(en)
|
2009-04-29 |
2012-12-11 |
Freescale Semiconductor, Inc. |
Shielding for a micro electro-mechanical device and method therefor
|
US8158492B2
(en)
*
|
2009-04-29 |
2012-04-17 |
Freescale Semiconductor, Inc. |
MEMS microphone with cavity and method therefor
|
EP2252077B1
(de)
|
2009-05-11 |
2012-07-11 |
STMicroelectronics Srl |
Anordnung eines kapazitiven mikroelektromechanischen Akustikwandlers und Verpackung dafür
|
US8571249B2
(en)
*
|
2009-05-29 |
2013-10-29 |
General Mems Corporation |
Silicon microphone package
|
KR101096548B1
(ko)
|
2009-11-06 |
2011-12-20 |
주식회사 비에스이 |
멤스 마이크로폰 및 그 제조방법
|
JP5404365B2
(ja)
*
|
2009-12-16 |
2014-01-29 |
キヤノン株式会社 |
電気機械変換装置及びその製造方法
|
KR101109095B1
(ko)
*
|
2009-12-29 |
2012-01-31 |
주식회사 비에스이 |
멤스 마이크로폰 및 그 제조방법
|
US8304846B2
(en)
*
|
2009-12-31 |
2012-11-06 |
Texas Instruments Incorporated |
Silicon microphone with integrated back side cavity
|
US8617960B2
(en)
*
|
2009-12-31 |
2013-12-31 |
Texas Instruments Incorporated |
Silicon microphone transducer
|
EP2524390B1
(de)
*
|
2010-01-11 |
2014-08-27 |
ELMOS Semiconductor AG |
Mikroelektromechanisches halbleitersensorbauelement
|
JP5414546B2
(ja)
*
|
2010-01-12 |
2014-02-12 |
キヤノン株式会社 |
容量検出型の電気機械変換素子
|
US8722445B2
(en)
|
2010-06-25 |
2014-05-13 |
International Business Machines Corporation |
Planar cavity MEMS and related structures, methods of manufacture and design structures
|
DE102011012295B4
(de)
*
|
2011-02-24 |
2020-06-04 |
Tdk Corporation |
MEMS-Mikrofon und Verfahren zur Herstellung des MEMS-Mikrofons
|
CN102348155B
(zh)
*
|
2010-07-30 |
2014-02-05 |
上海丽恒光微电子科技有限公司 |
微机电麦克风及其制造方法
|
EP2420470B1
(de)
*
|
2010-08-18 |
2015-10-14 |
Nxp B.V. |
MEMS-Mikrofon
|
KR20120061422A
(ko)
*
|
2010-12-03 |
2012-06-13 |
한국전자통신연구원 |
멤스 음향 센서
|
WO2012107094A1
(en)
*
|
2011-02-10 |
2012-08-16 |
Epcos Ag |
Mems device comprising an under bump metallization
|
WO2012122696A1
(en)
*
|
2011-03-11 |
2012-09-20 |
Goertek Inc. |
Cmos compatible silicon differential condenser microphone and method for manufacturing the same
|
US9232302B2
(en)
|
2011-05-31 |
2016-01-05 |
Apple Inc. |
Microphone assemblies with through-silicon vias
|
US8503699B2
(en)
|
2011-06-01 |
2013-08-06 |
Infineon Technologies Ag |
Plate, transducer and methods for making and operating a transducer
|
US20120308066A1
(en)
*
|
2011-06-03 |
2012-12-06 |
Hung-Jen Chen |
Combined micro-electro-mechanical systems microphone and method for manufacturing the same
|
US8948420B2
(en)
|
2011-08-02 |
2015-02-03 |
Robert Bosch Gmbh |
MEMS microphone
|
CN102387455A
(zh)
*
|
2011-09-28 |
2012-03-21 |
美律电子(深圳)有限公司 |
具扩增背腔空间的微机电麦克风芯片
|
DE102011084393A1
(de)
*
|
2011-10-13 |
2013-04-18 |
Robert Bosch Gmbh |
Mikromechanische Funktionsvorrichtung, insbesondere Lautsprechervorrichtung, und entsprechendes Herstellungsverfahren
|
DE112011105847B4
(de)
*
|
2011-11-14 |
2019-08-29 |
Tdk Corporation |
MEMS-Mikrofon mit reduzierter parasitärer Kapazität und Verfahren zur Herstellung
|
CN103248994A
(zh)
*
|
2012-02-06 |
2013-08-14 |
苏州敏芯微电子技术有限公司 |
集成电路与电容式微硅麦克风单片集成的制作方法及芯片
|
FR2994489B1
(fr)
*
|
2012-08-08 |
2015-07-31 |
Commissariat Energie Atomique |
Substrat pour lithographie electronique a haute resolution et procede de lithographie correspondant
|
US8987842B2
(en)
*
|
2012-09-14 |
2015-03-24 |
Solid State System Co., Ltd. |
Microelectromechanical system (MEMS) device and fabrication method thereof
|
TWI476877B
(zh)
*
|
2012-10-15 |
2015-03-11 |
Win Semiconductors Corp |
氣腔式封裝結構及方法
|
US10136226B2
(en)
*
|
2012-12-18 |
2018-11-20 |
Tdk Corporation |
Top-port MEMS microphone and method of manufacturing the same
|
US9006845B2
(en)
*
|
2013-01-16 |
2015-04-14 |
Infineon Technologies, A.G. |
MEMS device with polymer layer, system of a MEMS device with a polymer layer, method of making a MEMS device with a polymer layer
|
US9758372B1
(en)
*
|
2013-02-13 |
2017-09-12 |
Amkor Technology, Inc. |
MEMS package with MEMS die, magnet, and window substrate fabrication method and structure
|
CN104003348B
(zh)
*
|
2013-02-27 |
2018-02-02 |
应美盛股份有限公司 |
用于具有双层面结构层和声学端口的mems结构的方法
|
JP6237978B2
(ja)
*
|
2013-03-13 |
2017-11-29 |
オムロン株式会社 |
静電容量型センサ、音響センサ及びマイクロフォン
|
US20140312439A1
(en)
*
|
2013-04-19 |
2014-10-23 |
Infineon Technologies Ag |
Microphone Module and Method of Manufacturing Thereof
|
US9252321B2
(en)
|
2013-04-22 |
2016-02-02 |
Empire Technology Development Llc |
Opto-mechanical alignment
|
DE102013207497A1
(de)
*
|
2013-04-25 |
2014-11-13 |
Robert Bosch Gmbh |
Bauelement mit einer mikromechanischen Mikrofonstruktur
|
ITTO20130350A1
(it)
|
2013-04-30 |
2014-10-31 |
St Microelectronics Srl |
Assemblaggio a livello di fetta di un dispositivo sensore mems e relativo dispositivo sensore mems
|
EP2991926A1
(de)
|
2013-05-02 |
2016-03-09 |
Robert Bosch GmbH |
Monolithische cmos-mems-mikrofone und verfahren zur herstellung
|
KR101472297B1
(ko)
*
|
2013-05-22 |
2014-12-12 |
한국기계연구원 |
1칩형 mems 마이크로폰 및 그 제작 방법
|
DE102013212173B4
(de)
|
2013-06-26 |
2016-06-02 |
Robert Bosch Gmbh |
MEMS-Bauelement mit einer auslenkbaren Membran und einem feststehenden Gegenelement sowie Verfahren zu dessen Herstellung
|
US9584889B2
(en)
|
2013-08-27 |
2017-02-28 |
Infineon Technologies Ag |
System and method for packaged MEMS device having embedding arrangement, MEMS die, and grille
|
US9695515B2
(en)
*
|
2013-08-30 |
2017-07-04 |
Hewlett-Packard Development Company, L.P. |
Substrate etch
|
CN104671190B
(zh)
*
|
2013-11-27 |
2017-07-14 |
中芯国际集成电路制造(上海)有限公司 |
器件表面的保护方法
|
US10138115B2
(en)
*
|
2014-08-06 |
2018-11-27 |
Infineon Technologies Ag |
Low profile transducer module
|
US10433088B2
(en)
*
|
2014-08-26 |
2019-10-01 |
Goertek Inc. |
PCB speaker and method for micromachining speaker diaphragm on PCB substrate
|
US9967679B2
(en)
|
2015-02-03 |
2018-05-08 |
Infineon Technologies Ag |
System and method for an integrated transducer and temperature sensor
|
DE102015204886A1
(de)
*
|
2015-03-18 |
2016-09-22 |
Robert Bosch Gmbh |
Verfahren zum Herstellen einer porösen Struktur im Schichtaufbau eines Halbleiterbauelements und MEMS-Bauelement mit einem solchen porösen Strukturelement
|
US10433042B2
(en)
|
2015-11-03 |
2019-10-01 |
Goertek Inc. |
MEMS multi-module assembly, manufacturing method and electronics apparatus
|
GB201708348D0
(en)
*
|
2017-04-28 |
2017-07-12 |
Cirrus Logic Int Semiconductor Ltd |
MEMS devices and processes
|
IT201700103489A1
(it)
|
2017-09-15 |
2019-03-15 |
St Microelectronics Srl |
Metodo di fabbricazione di una membrana filtrante sottile, dispositivo trasduttore acustico includente la membrana filtrante, metodo di assemblaggio del dispositivo trasduttore acustico e sistema elettronico
|
DE102018200190B4
(de)
*
|
2018-01-08 |
2019-08-14 |
Infineon Technologies Ag |
Mikroelektromechanisches System mit Filterstruktur
|
IT201800002049A1
(it)
|
2018-01-26 |
2019-07-26 |
St Microelectronics Srl |
Metodo di fabbricazione di una piastrina a semiconduttore provvista di un modulo filtrante sottile, piastrina a semiconduttore includente il modulo filtrante, package alloggiante la piastrina a semiconduttore, e sistema elettronico
|
US11388530B2
(en)
|
2018-07-19 |
2022-07-12 |
Cochlear Limited |
Sub-surface indicator lighting
|
EP3629597B1
(de)
*
|
2018-09-26 |
2021-07-07 |
ams AG |
Mems-mikrofonanordnung und verfahren zur herstellung einer mems-mikrofonanordnung
|
CN112823532B
(zh)
|
2018-10-05 |
2022-05-31 |
美商楼氏电子有限公司 |
具有入口防护部的麦克风设备
|
WO2020072904A1
(en)
*
|
2018-10-05 |
2020-04-09 |
Knowles Electronics, Llc |
Acoustic transducers with a low pressure zone and diaphragms having enhanced compliance
|
CN112789239A
(zh)
|
2018-10-05 |
2021-05-11 |
美商楼氏电子有限公司 |
形成包括褶皱的mems振膜的方法
|
JP2022525465A
(ja)
*
|
2019-04-05 |
2022-05-16 |
レゾナント インコーポレイテッド |
横方向に励起されたフィルムバルク音響共振器パッケージ及び方法
|
DE102020113974A1
(de)
*
|
2019-05-28 |
2020-12-03 |
Apple Inc. |
Entlüftete akustische wandler und verwandte verfahren und systeme
|
US11310591B2
(en)
*
|
2019-05-28 |
2022-04-19 |
Apple Inc. |
Vented acoustic transducers, and related methods and systems
|