DE602007002526D1 - Herstellungsverfahren für ein elektrisch leitendes Element - Google Patents

Herstellungsverfahren für ein elektrisch leitendes Element

Info

Publication number
DE602007002526D1
DE602007002526D1 DE602007002526T DE602007002526T DE602007002526D1 DE 602007002526 D1 DE602007002526 D1 DE 602007002526D1 DE 602007002526 T DE602007002526 T DE 602007002526T DE 602007002526 T DE602007002526 T DE 602007002526T DE 602007002526 D1 DE602007002526 D1 DE 602007002526D1
Authority
DE
Germany
Prior art keywords
manufacturing
electrically conductive
conductive element
electrically
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007002526T
Other languages
English (en)
Inventor
Yiliang Wu
Beng S Ong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Publication of DE602007002526D1 publication Critical patent/DE602007002526D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8222—Bipolar technology
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/464—Lateral top-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
DE602007002526T 2006-07-20 2007-07-19 Herstellungsverfahren für ein elektrisch leitendes Element Active DE602007002526D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/490,391 US7491646B2 (en) 2006-07-20 2006-07-20 Electrically conductive feature fabrication process

Publications (1)

Publication Number Publication Date
DE602007002526D1 true DE602007002526D1 (de) 2009-11-05

Family

ID=38617447

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007002526T Active DE602007002526D1 (de) 2006-07-20 2007-07-19 Herstellungsverfahren für ein elektrisch leitendes Element

Country Status (8)

Country Link
US (1) US7491646B2 (de)
EP (1) EP1881750B1 (de)
JP (1) JP2008028390A (de)
KR (1) KR20080008999A (de)
CN (1) CN101110359B (de)
CA (1) CA2593884C (de)
DE (1) DE602007002526D1 (de)
TW (1) TWI425689B (de)

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WO2008038976A1 (en) * 2006-09-29 2008-04-03 Lg Chem, Ltd. Organic silver complex compound used in paste for conductive pattern forming
KR100711505B1 (ko) * 2007-01-30 2007-04-27 (주)이그잭스 도전막 형성을 위한 은 페이스트
KR100709724B1 (ko) * 2007-01-30 2007-04-24 (주)이그잭스 도전막 형성을 위한 금속 페이스트
JP5647900B2 (ja) * 2008-01-31 2015-01-07 ノースウエスタン ユニバーシティ 溶液処理型高移動度無機薄膜トランジスタ
JP5463538B2 (ja) * 2008-03-18 2014-04-09 国立大学法人 東京大学 有機薄膜トランジスタの製造方法
TW201005813A (en) 2008-05-15 2010-02-01 Du Pont Process for forming an electroactive layer
JP5359032B2 (ja) * 2008-05-30 2013-12-04 凸版印刷株式会社 薄膜トランジスタ、薄膜トランジスタアレイ及び画像表示装置
US7935278B2 (en) * 2009-03-05 2011-05-03 Xerox Corporation Feature forming process using acid-containing composition
US20100226811A1 (en) * 2009-03-05 2010-09-09 Xerox Corporation Feature forming process using plasma treatment
EP2404315A4 (de) 2009-03-06 2012-08-08 Du Pont Verfahren zur formung einer elektroaktiven schicht
EP2406813A4 (de) 2009-03-09 2012-07-25 Du Pont Verfahren zur formung einer elektroaktiven schicht
WO2010104857A2 (en) * 2009-03-09 2010-09-16 E. I. Du Pont De Nemours And Company Process for forming an electroactive layer
US9137902B2 (en) 2009-08-14 2015-09-15 Xerox Corporation Process to form highly conductive feature from silver nanoparticles with reduced processing temperature
KR101795088B1 (ko) 2009-11-09 2017-11-07 카네기 멜론 유니버시티 금속 잉크 조성물, 전도성 패턴, 방법, 및 장치
DE102009053943A1 (de) * 2009-11-19 2011-05-26 Evonik Degussa Gmbh Verfahren zur Erzeugung silberhaltiger Strukturen, die silberhaltigen Strukturen aufweisende Erzeugnisse und ihre Verwendung
JP5670134B2 (ja) * 2010-09-21 2015-02-18 日立化成株式会社 導電膜形成用材料およびこれを用いた導電膜の形成方法
WO2012151500A1 (en) 2011-05-04 2012-11-08 Liquid X Printed Metals, Inc. Metal alloys from molecular inks
EP2753668B1 (de) 2011-09-06 2019-03-27 Henkel IP & Holding GmbH Leitfähiges material und verfahren dafür
US20130156971A1 (en) 2011-10-28 2013-06-20 Liquid X Printed Metals, Inc. Transparent conductive- and ito-replacement materials and structures
WO2013130450A2 (en) 2012-02-27 2013-09-06 Liquid X Printed Metals, Inc. Self-reducing metal complex inks soluble in polar protic solvents and improved curing methods
TWI635918B (zh) * 2012-08-07 2018-09-21 大賽璐股份有限公司 銀奈米粒子之製造方法及銀奈米粒子
TWI592234B (zh) * 2012-08-07 2017-07-21 Daicel Corp Method for producing silver nano-particles, silver nano-particles and silver paint composition
US9758688B2 (en) 2012-09-21 2017-09-12 Sumitomo Chemical Company, Limited Composition for forming conductive film
JP6576345B2 (ja) 2013-08-16 2019-09-18 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング サブミクロン銀粒子インク組成物、プロセスおよび応用
KR20180029051A (ko) 2015-07-03 2018-03-19 내셔날 리서치 카운실 오브 캐나다 초협폭 선을 인쇄하는 방법
CN107850834A (zh) 2015-07-03 2018-03-27 加拿大国家研究委员会 基于金属纳米粒子光子烧结的自对准金属图案化
CN107852821A (zh) 2015-07-03 2018-03-27 加拿大国家研究委员会 印刷超窄间隙线的方法

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JPH01263154A (ja) * 1988-04-15 1989-10-19 Nitto Denko Corp 導電性ペースト組成物
US6123876A (en) * 1995-04-04 2000-09-26 Canon Kabushiki Kaisha Metal-containing composition for forming electron-emitting device
WO1998050601A1 (fr) * 1997-04-30 1998-11-12 Takamatsu Research Laboratory Pate metallique et procede de production d'une couche metallique
JP4242080B2 (ja) * 2000-11-20 2009-03-18 株式会社デンソー タッチパネル、表示装置、タッチパネルの製造方法
EP1282175A3 (de) * 2001-08-03 2007-03-14 FUJIFILM Corporation Muster aus leitendem Material und Verfahren zur dessen Herstellung
US6951666B2 (en) * 2001-10-05 2005-10-04 Cabot Corporation Precursor compositions for the deposition of electrically conductive features
KR100545288B1 (ko) * 2003-03-28 2006-01-25 주식회사 잉크테크 유기은 조성물 및 그 제조방법, 그로부터 제조되는 잉크및 그 잉크를 이용한 도전배선 형성 방법
US20040211979A1 (en) * 2003-04-24 2004-10-28 Konica Minolta Holdings, Inc. Circuit board and method for manufacturing the circuit board
US7102155B2 (en) * 2003-09-04 2006-09-05 Hitachi, Ltd. Electrode substrate, thin film transistor, display device and their production
US7276385B1 (en) * 2003-11-24 2007-10-02 Kovio, Inc. Methods of laser repairing a circuit, compositions and equipment for such methods, and structures formed from such methods
US20050129843A1 (en) * 2003-12-11 2005-06-16 Xerox Corporation Nanoparticle deposition process
JP2005174824A (ja) * 2003-12-12 2005-06-30 Tanaka Kikinzoku Kogyo Kk 金属ペースト及び該金属ペーストを用いた膜形成方法
JP4467300B2 (ja) * 2003-12-26 2010-05-26 株式会社日立製作所 配線基板
US7456424B2 (en) * 2004-12-14 2008-11-25 Xerox Corporation Thin film transistors including indolocarbozoles
US7270694B2 (en) * 2004-10-05 2007-09-18 Xerox Corporation Stabilized silver nanoparticles and their use
KR101037030B1 (ko) * 2004-11-23 2011-05-25 삼성전자주식회사 금속 나노 결정을 이용한 금속패턴 형성 방법
US20060130700A1 (en) * 2004-12-16 2006-06-22 Reinartz Nicole M Silver-containing inkjet ink
JP2006328532A (ja) * 2005-05-10 2006-12-07 Samsung Electro-Mechanics Co Ltd 金属ナノ粒子、これを製造する方法及び導電性インク

Also Published As

Publication number Publication date
TWI425689B (zh) 2014-02-01
KR20080008999A (ko) 2008-01-24
CA2593884C (en) 2012-09-25
TW200816532A (en) 2008-04-01
US20080020572A1 (en) 2008-01-24
JP2008028390A (ja) 2008-02-07
CA2593884A1 (en) 2008-01-20
CN101110359B (zh) 2011-03-09
US7491646B2 (en) 2009-02-17
EP1881750B1 (de) 2009-09-23
CN101110359A (zh) 2008-01-23
EP1881750A1 (de) 2008-01-23

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