DE602006005933D1 - Ischer dämpfe (pecvd) aus einer internen barriereschicht auf einem behälter - Google Patents

Ischer dämpfe (pecvd) aus einer internen barriereschicht auf einem behälter

Info

Publication number
DE602006005933D1
DE602006005933D1 DE602006005933T DE602006005933T DE602006005933D1 DE 602006005933 D1 DE602006005933 D1 DE 602006005933D1 DE 602006005933 T DE602006005933 T DE 602006005933T DE 602006005933 T DE602006005933 T DE 602006005933T DE 602006005933 D1 DE602006005933 D1 DE 602006005933D1
Authority
DE
Germany
Prior art keywords
container
injector
precursor gas
top end
gas outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006005933T
Other languages
English (en)
Inventor
Jean-Michel Rius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sidel Participations SAS
Original Assignee
Sidel Participations SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel Participations SAS filed Critical Sidel Participations SAS
Publication of DE602006005933D1 publication Critical patent/DE602006005933D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
    • B05D7/227Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of containers, cans or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Medical Preparation Storing Or Oral Administration Devices (AREA)
  • Laminated Bodies (AREA)
DE602006005933T 2005-07-26 2006-07-24 Ischer dämpfe (pecvd) aus einer internen barriereschicht auf einem behälter Active DE602006005933D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0507966A FR2889204B1 (fr) 2005-07-26 2005-07-26 Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant une ligne de gaz isolee par electrovanne
PCT/FR2006/001803 WO2007012744A1 (fr) 2005-07-26 2006-07-24 Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant une ligne de gaz isolee par electrovanne

Publications (1)

Publication Number Publication Date
DE602006005933D1 true DE602006005933D1 (de) 2009-05-07

Family

ID=36128580

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006005933T Active DE602006005933D1 (de) 2005-07-26 2006-07-24 Ischer dämpfe (pecvd) aus einer internen barriereschicht auf einem behälter

Country Status (10)

Country Link
US (1) US7887891B2 (de)
EP (1) EP1907601B1 (de)
JP (1) JP2009503252A (de)
CN (1) CN101248211B (de)
AT (1) ATE426692T1 (de)
DE (1) DE602006005933D1 (de)
ES (1) ES2324428T3 (de)
FR (1) FR2889204B1 (de)
PT (1) PT1907601E (de)
WO (1) WO2007012744A1 (de)

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US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
EP2299922B1 (de) * 2008-05-30 2016-11-09 Colorado State University Research Foundation Gerät zur erzeugung von plasma
WO2011123125A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
WO2009146432A1 (en) * 2008-05-30 2009-12-03 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
AU2010249031B2 (en) * 2009-05-13 2015-10-15 Sio2 Medical Products, Inc. Outgassing method for inspecting a coated surface
ES2513866T3 (es) 2009-05-13 2014-10-27 Sio2 Medical Products, Inc. Revestimiento e inspección de recipientes
US20110001103A1 (en) * 2009-07-01 2011-01-06 Chi-Kuang Chen Elevating mechanism for measuring concentrations of medicines
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
DE102010023119A1 (de) * 2010-06-07 2011-12-22 Khs Corpoplast Gmbh Vorrichtung zur Plasmabehandlung von Werkstücken
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
CN103443338B (zh) 2011-02-02 2017-09-22 华盛顿大学商业化中心 大规模平行邻接作图
US10081864B2 (en) 2011-03-10 2018-09-25 Kaiatech, Inc Method and apparatus for treating containers
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
EP2961858B1 (de) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Beschichtete spritze.
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
CN110074968B (zh) 2013-03-11 2021-12-21 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
CN103695870B (zh) * 2013-12-24 2015-10-28 北京北印东源新材料科技有限公司 Pecvd镀膜装置
EP3693493A1 (de) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
CN104386918B (zh) * 2014-10-22 2017-07-07 宁波正力药品包装有限公司 一种玻璃瓶内壁阻隔性薄膜的制备方法
EP3337915B1 (de) 2015-08-18 2021-11-03 SiO2 Medical Products, Inc. Pharmazeutische und andere verpackungen mit niedriger sauerstoffübertragungsrate
TWI551712B (zh) 2015-09-02 2016-10-01 財團法人工業技術研究院 容器內部鍍膜裝置及其方法
US20190382161A1 (en) * 2018-06-17 2019-12-19 Rohm And Haas Electronic Materials Llc Containers with active surface and methods of forming such containers

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US4439463A (en) * 1982-02-18 1984-03-27 Atlantic Richfield Company Plasma assisted deposition system
US4656083A (en) * 1983-08-01 1987-04-07 Washington Research Foundation Plasma gas discharge treatment for improving the biocompatibility of biomaterials
DE3521625A1 (de) * 1985-06-15 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum beschichten von substraten durch niederdruck-plasmapolymerisation von monomeren
DE4316349C2 (de) * 1993-05-15 1996-09-05 Ver Foerderung Inst Kunststoff Verfahren zur Innenbeschichtung von Hohlkörpern mit organischen Deckschichten durch Plasmapolymerisation, sowie Vorrichtung zur Durchführung des Verfahrens
WO1994027745A1 (de) * 1993-06-01 1994-12-08 Kautex Werke Reinold Hagen Aktiengesellschaft Verfahren und einrichtung zum herstellen einer polymeren beschichtung an kunststoff-hohlkörpern
US6112695A (en) * 1996-10-08 2000-09-05 Nano Scale Surface Systems, Inc. Apparatus for plasma deposition of a thin film onto the interior surface of a container
JP3077623B2 (ja) * 1997-04-02 2000-08-14 日本電気株式会社 プラズマ化学気相成長装置
FR2776540B1 (fr) * 1998-03-27 2000-06-02 Sidel Sa Recipient en matiere a effet barriere et procede et appareil pour sa fabrication
US6421127B1 (en) * 1999-07-19 2002-07-16 American Air Liquide, Inc. Method and system for preventing deposition on an optical component in a spectroscopic sensor
FR2799994B1 (fr) * 1999-10-25 2002-06-07 Sidel Sa Dispositif pour le traitement d'un recipient a l'aide d'un plasma a basse pression comportant un circuit de vide perfectionne
JP2002121667A (ja) * 2000-10-12 2002-04-26 Mitsubishi Shoji Plast Kk プラスチック容器内へのdlc膜連続成膜装置及び連続成膜方法
WO2002051707A1 (fr) * 2000-12-25 2002-07-04 Mitsubishi Shoji Plastics Corporation Appareil de production de recipients plastiques a revetement de cda et procede associe
FR2824002B1 (fr) * 2001-04-27 2004-06-25 Inergy Automotive Systems Procede de fabrication d'un reservoir a carburant faisant intervenir la decomposition d'un gaz de reaction sur l'enveloppe du reservoir
CN100337881C (zh) * 2002-05-28 2007-09-19 麒麟麦酒株式会社 包覆有dlc薄膜的塑料容器及其制造设备和制造方法
JP4149748B2 (ja) * 2002-06-24 2008-09-17 三菱商事プラスチック株式会社 ロータリー型量産用cvd成膜装置及びプラスチック容器内表面へのcvd膜成膜方法
JP3746748B2 (ja) * 2002-09-25 2006-02-15 三菱重工業株式会社 気体透過防止膜被覆プラスチック容器の製造方法

Also Published As

Publication number Publication date
WO2007012744A1 (fr) 2007-02-01
FR2889204A1 (fr) 2007-02-02
FR2889204B1 (fr) 2007-11-30
PT1907601E (pt) 2009-06-29
CN101248211A (zh) 2008-08-20
EP1907601B1 (de) 2009-03-25
JP2009503252A (ja) 2009-01-29
EP1907601A1 (de) 2008-04-09
ATE426692T1 (de) 2009-04-15
CN101248211B (zh) 2010-09-15
US20080206477A1 (en) 2008-08-28
US7887891B2 (en) 2011-02-15
ES2324428T3 (es) 2009-08-06

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Legal Events

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