DE602006005786D1 - Positive strahlungsempfindliche Harzzusammensetzung - Google Patents

Positive strahlungsempfindliche Harzzusammensetzung

Info

Publication number
DE602006005786D1
DE602006005786D1 DE602006005786T DE602006005786T DE602006005786D1 DE 602006005786 D1 DE602006005786 D1 DE 602006005786D1 DE 602006005786 T DE602006005786 T DE 602006005786T DE 602006005786 T DE602006005786 T DE 602006005786T DE 602006005786 D1 DE602006005786 D1 DE 602006005786D1
Authority
DE
Germany
Prior art keywords
photoacid generator
excimer laser
resin composition
sensitive resin
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006005786T
Other languages
English (en)
Inventor
Takayuki Tsuji
Tomoki Nagai
Kentarou Harada
Daisuke Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE602006005786D1 publication Critical patent/DE602006005786D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE602006005786T 2005-03-29 2006-03-28 Positive strahlungsempfindliche Harzzusammensetzung Active DE602006005786D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005093385 2005-03-29

Publications (1)

Publication Number Publication Date
DE602006005786D1 true DE602006005786D1 (de) 2009-04-30

Family

ID=37070938

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006005786T Active DE602006005786D1 (de) 2005-03-29 2006-03-28 Positive strahlungsempfindliche Harzzusammensetzung

Country Status (6)

Country Link
US (1) US7488566B2 (de)
EP (1) EP1840650B1 (de)
JP (1) JP4665810B2 (de)
AT (1) ATE426189T1 (de)
DE (1) DE602006005786D1 (de)
IL (1) IL174569A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8592130B2 (en) * 2008-05-30 2013-11-26 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board
EP2348360B1 (de) * 2010-01-25 2017-09-27 Rohm and Haas Electronic Materials LLC Photoresist, der eine stickstoffhaltige Verbindung umfasst
JP7204343B2 (ja) 2017-06-06 2023-01-16 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP7414407B2 (ja) * 2018-06-13 2024-01-16 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7285144B2 (ja) * 2018-06-28 2023-06-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7475111B2 (ja) * 2018-11-14 2024-04-26 東京応化工業株式会社 レジストパターン形成方法、レジスト組成物及びその製造方法
US20200356001A1 (en) * 2019-05-10 2020-11-12 Rohm And Haas Electronic Materials Llc Photoresist compositions and methods of forming resist patterns with such compositions
US11852972B2 (en) 2020-10-30 2023-12-26 Rohm And Haas Electronic Materials Llc Photoresist compositions and pattern formation methods

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3215562B2 (ja) 1993-10-21 2001-10-09 信越化学工業株式会社 溶解阻害剤、その合成方法並びにそれを含有するレジスト材料
JP3082892B2 (ja) 1994-05-23 2000-08-28 日本電信電話株式会社 ポジ型レジスト材料
JP3661721B2 (ja) * 1996-10-15 2005-06-22 信越化学工業株式会社 化学増幅ポジ型レジスト材料
JP4007569B2 (ja) * 1999-09-06 2007-11-14 富士フイルム株式会社 ポジ型電子線又はｘ線レジスト組成物
JP4910238B2 (ja) * 2001-03-06 2012-04-04 Ｊｓｒ株式会社 化学増幅型感放射線性樹脂組成物
JP3988517B2 (ja) * 2001-04-27 2007-10-10 Ｊｓｒ株式会社 感放射線性樹脂組成物
US6824954B2 (en) * 2001-08-23 2004-11-30 Jsr Corporation Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
JP4192610B2 (ja) * 2002-11-18 2008-12-10 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP3991222B2 (ja) * 2003-02-13 2007-10-17 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法
JP4360264B2 (ja) * 2004-04-30 2009-11-11 Ｊｓｒ株式会社 ポジ型感放射線性樹脂組成物
JP4544085B2 (ja) * 2004-09-28 2010-09-15 Ｊｓｒ株式会社 ポジ型感放射線性樹脂組成物
EP1686424A3 (de) * 2005-01-27 2009-11-04 JSR Corporation Strahlungsempfindliche Harzzusammensetzung

Also Published As

Publication number Publication date
JP4665810B2 (ja) 2011-04-06
EP1840650B1 (de) 2009-03-18
US7488566B2 (en) 2009-02-10
IL174569A (en) 2010-11-30
ATE426189T1 (de) 2009-04-15
IL174569A0 (en) 2006-08-20
EP1840650A1 (de) 2007-10-03
US20060223010A1 (en) 2006-10-05
JP2006309186A (ja) 2006-11-09

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Legal Events

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