DE602005020411D1 - Verbesserte dielektrische Beschichtung für an Hochtemperaturwasser ausgesetzte Oberflächen - Google Patents

Verbesserte dielektrische Beschichtung für an Hochtemperaturwasser ausgesetzte Oberflächen

Info

Publication number
DE602005020411D1
DE602005020411D1 DE602005020411T DE602005020411T DE602005020411D1 DE 602005020411 D1 DE602005020411 D1 DE 602005020411D1 DE 602005020411 T DE602005020411 T DE 602005020411T DE 602005020411 T DE602005020411 T DE 602005020411T DE 602005020411 D1 DE602005020411 D1 DE 602005020411D1
Authority
DE
Germany
Prior art keywords
high temperature
temperature water
dielectric coating
surfaces exposed
improved dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005020411T
Other languages
English (en)
Inventor
Catherine Procik Dulka
Young Jin Kim
Rajasingh Swartz Israel
David Wesley Sandusky
Kevin H Janora
Peter W Brown
Tianji Zhao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE602005020411D1 publication Critical patent/DE602005020411D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C15/00—Cooling arrangements within the pressure vessel containing the core; Selection of specific coolants
    • G21C15/28—Selection of specific coolants ; Additions to the reactor coolants, e.g. against moderator corrosion
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C19/00—Arrangements for treating, for handling, or for facilitating the handling of, fuel or other materials which are used within the reactor, e.g. within its pressure vessel
    • G21C19/28—Arrangements for introducing fluent material into the reactor core; Arrangements for removing fluent material from the reactor core
    • G21C19/30—Arrangements for introducing fluent material into the reactor core; Arrangements for removing fluent material from the reactor core with continuous purification of circulating fluent material, e.g. by extraction of fission products deterioration or corrosion products, impurities, e.g. by cold traps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/30—Nuclear fission reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
DE602005020411T 2004-12-30 2005-12-22 Verbesserte dielektrische Beschichtung für an Hochtemperaturwasser ausgesetzte Oberflächen Active DE602005020411D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/024,952 US8023609B2 (en) 2004-12-30 2004-12-30 Dielectric coating for surfaces exposed to high temperature water

Publications (1)

Publication Number Publication Date
DE602005020411D1 true DE602005020411D1 (de) 2010-05-20

Family

ID=36084383

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005020411T Active DE602005020411D1 (de) 2004-12-30 2005-12-22 Verbesserte dielektrische Beschichtung für an Hochtemperaturwasser ausgesetzte Oberflächen

Country Status (7)

Country Link
US (2) US8023609B2 (de)
EP (1) EP1676936B1 (de)
JP (1) JP4943701B2 (de)
DE (1) DE602005020411D1 (de)
ES (1) ES2341783T3 (de)
MX (1) MXPA05013942A (de)
TW (1) TWI372398B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090046825A1 (en) * 2007-08-16 2009-02-19 Ge-Hitachi Nuclear Energy Americas Llc Protective coating applied to metallic reactor components to reduce corrosion products into the nuclear reactor environment
US20110122986A1 (en) * 2007-08-23 2011-05-26 Kabushiki Kaisha Toshiba Method of inhibiting adhesion of radioactive substance and apparatus inhibited from suffering adhesion thereof
US8349408B2 (en) * 2008-09-03 2013-01-08 Ge-Hitachi Nuclear Energy Americas, Llc Method of protecting reactor components from fouling
JP5513864B2 (ja) * 2008-12-12 2014-06-04 株式会社東芝 原子炉炉内構造物およびその製造方法
JP5361500B2 (ja) * 2009-04-03 2013-12-04 株式会社東芝 ジェットポンプおよびその振動抑制方法
KR101163999B1 (ko) 2010-02-19 2012-07-18 한국원자력연구원 물과 접촉하는 표면 중 손상부의 수중 보수방법 및 이에 사용되는 수중 보수장치
JP4810617B1 (ja) * 2010-07-27 2011-11-09 株式会社東芝 プラントの腐食抑制方法及びプラント
US20130251087A1 (en) * 2012-02-17 2013-09-26 Massachusetts Institute Of Technology Surface modification of cladding material
DE102012220559A1 (de) * 2012-11-12 2014-05-15 Siemens Aktiengesellschaft Kühlung für elektrische Generatoren
US10847273B2 (en) 2014-01-17 2020-11-24 Ge-Hitachi Nuclear Energy Americas Llc Steam separator and nuclear boiling water reactor including the same
US10777328B2 (en) 2015-05-04 2020-09-15 Cerium Laboratories, Llc Enhanced surface treatments
CN112562944A (zh) * 2020-12-11 2021-03-26 国网黑龙江省电力有限公司电力科学研究院 一种适用于强风沙区域金具表面涂层的选涂方法

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CA1064626A (en) * 1977-06-09 1979-10-16 Majesty (Her) In Right Of Canada As Represented By Atomic Energy Of Cana Da Limited Deposit suppression in the core of water-cooled nuclear reactors
US4297150A (en) * 1979-07-07 1981-10-27 The British Petroleum Company Limited Protective metal oxide films on metal or alloy substrate surfaces susceptible to coking, corrosion or catalytic activity
CA1232827A (en) * 1984-04-20 1988-02-16 Yasumasa Furutani Inhibition of deposition of radioactive substances on nuclear power plant components
JPS63274751A (ja) * 1987-05-01 1988-11-11 Toyota Motor Corp セラミック溶射部材
DE69003479T2 (de) * 1989-07-21 1994-01-20 Cogema Verfahren zur Herstellung einer Chromoxidschutzschicht zwischen den Tabletten und dem Kühlrohr eines Kernbrennelements und Kernbrennelement mit einer solchen Schutzschicht.
US5147597A (en) * 1991-04-09 1992-09-15 Electric Power Research Institute Prestabilized chromium protective film to reduce radiation buildup
US5510173A (en) * 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
JPH07228963A (ja) * 1994-02-17 1995-08-29 Nuclear Fuel Ind Ltd 原子燃料用折出硬化型ニッケル基合金材
US5444747A (en) 1994-05-09 1995-08-22 General Electric Company Jet pump electro-nozzle
JP3605969B2 (ja) * 1996-10-31 2004-12-22 石川島播磨重工業株式会社 防食用チタン酸化膜の作製方法および防食用チタン酸化膜
US6214473B1 (en) * 1998-05-13 2001-04-10 Andrew Tye Hunt Corrosion-resistant multilayer coatings
US6254341B1 (en) * 1998-11-13 2001-07-03 General Electric Company Engine having resistance to particle deposits
JP4043647B2 (ja) 1999-06-23 2008-02-06 株式会社東芝 原子炉構造材及び原子炉構造材の腐食低減方法
JP4627830B2 (ja) * 1999-12-20 2011-02-09 株式会社フルヤ金属 超臨界水酸化分解処理装置の反応容器及び反応容器の製造方法
JP4334106B2 (ja) * 2000-03-31 2009-09-30 株式会社東芝 原子炉構造材料の光触媒付着方法
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US7666522B2 (en) * 2003-12-03 2010-02-23 IMDS, Inc. Laser based metal deposition (LBMD) of implant structures

Also Published As

Publication number Publication date
EP1676936A3 (de) 2007-04-04
US20140029712A1 (en) 2014-01-30
ES2341783T3 (es) 2010-06-28
TW200634849A (en) 2006-10-01
US8023609B2 (en) 2011-09-20
US20050265512A1 (en) 2005-12-01
TWI372398B (en) 2012-09-11
JP2006194873A (ja) 2006-07-27
MXPA05013942A (es) 2006-07-10
EP1676936B1 (de) 2010-04-07
JP4943701B2 (ja) 2012-05-30
EP1676936A2 (de) 2006-07-05
US8675806B2 (en) 2014-03-18

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