DE602005007776D1 - Druckreferenzvorlage zur mehrschicht- oder mehrstruktur-registration und verfahren dafür - Google Patents

Druckreferenzvorlage zur mehrschicht- oder mehrstruktur-registration und verfahren dafür

Info

Publication number
DE602005007776D1
DE602005007776D1 DE602005007776T DE602005007776T DE602005007776D1 DE 602005007776 D1 DE602005007776 D1 DE 602005007776D1 DE 602005007776 T DE602005007776 T DE 602005007776T DE 602005007776 T DE602005007776 T DE 602005007776T DE 602005007776 D1 DE602005007776 D1 DE 602005007776D1
Authority
DE
Germany
Prior art keywords
reference template
multilayer
method therefor
print reference
structure registration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602005007776T
Other languages
German (de)
English (en)
Inventor
Matthew E Colburn
Yves C Martin
Charles T Rettner
Kessel Theodore G Van
Hematha K Wickramasinghe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE602005007776D1 publication Critical patent/DE602005007776D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/04—Additives and treatments of the filtering material
    • B01D2239/045—Deodorising additives

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
DE602005007776T 2005-01-18 2005-10-18 Druckreferenzvorlage zur mehrschicht- oder mehrstruktur-registration und verfahren dafür Expired - Lifetime DE602005007776D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/037,890 US20060157898A1 (en) 2005-01-18 2005-01-18 Imprint reference template for multilayer or multipattern registration and method therefor
PCT/US2005/037278 WO2006078333A1 (en) 2005-01-18 2005-10-18 Imprint reference template for multilayer or multipattern registration and method therefor

Publications (1)

Publication Number Publication Date
DE602005007776D1 true DE602005007776D1 (de) 2008-08-07

Family

ID=35539396

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005007776T Expired - Lifetime DE602005007776D1 (de) 2005-01-18 2005-10-18 Druckreferenzvorlage zur mehrschicht- oder mehrstruktur-registration und verfahren dafür

Country Status (7)

Country Link
US (2) US20060157898A1 (enExample)
EP (1) EP1839088B1 (enExample)
JP (1) JP2008527736A (enExample)
CN (1) CN101088045B (enExample)
AT (1) ATE399336T1 (enExample)
DE (1) DE602005007776D1 (enExample)
WO (1) WO2006078333A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101479661B (zh) * 2005-03-23 2012-06-06 艾格瑞系统有限公司 利用压印光刻和直接写入技术制造器件的方法
US20080023885A1 (en) * 2006-06-15 2008-01-31 Nanochip, Inc. Method for forming a nano-imprint lithography template having very high feature counts
US20070121477A1 (en) * 2006-06-15 2007-05-31 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20080074984A1 (en) * 2006-09-21 2008-03-27 Nanochip, Inc. Architecture for a Memory Device
JP5326806B2 (ja) * 2009-05-21 2013-10-30 住友電気工業株式会社 半導体光素子を作製する方法
US7977655B2 (en) * 2009-05-21 2011-07-12 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system of monitoring E-beam overlay and providing advanced process control
CN102456540B (zh) * 2010-10-19 2014-05-21 上海华虹宏力半导体制造有限公司 应用于外延工艺中的光刻套刻标记的制备方法
JP2012089636A (ja) * 2010-10-19 2012-05-10 Toshiba Corp ナノインプリント法
CN102848709B (zh) * 2012-09-29 2015-05-13 信利光电股份有限公司 一种半自动丝网印刷对位方法
US9377683B2 (en) 2013-03-22 2016-06-28 HGST Netherlands B.V. Imprint template with optically-detectable alignment marks and method for making using block copolymers
US8900885B1 (en) 2013-05-28 2014-12-02 International Business Machines Corporation Wafer bonding misalignment reduction
US11075126B2 (en) * 2019-02-15 2021-07-27 Kla-Tencor Corporation Misregistration measurements using combined optical and electron beam technology
US11488949B1 (en) * 2021-06-07 2022-11-01 United Microelectronics Corp. Method of generating dummy patterns for device-under-test and calibration kits
WO2023172766A2 (en) * 2022-03-11 2023-09-14 Board Of Regents, The University Of Texas System Nanoshape patterning techniques that allow high-throughput fabrication of functional nanostructures with complex geometries on planar and non-planar substrates

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0138297B1 (ko) * 1994-02-07 1998-06-01 김광호 포토 마스크 및 그 제조 방법
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6300018B1 (en) * 1999-09-21 2001-10-09 Tyco Electronics Logistics Ag Photolithography mask having a subresolution alignment mark window
WO2002008835A2 (en) * 2000-07-16 2002-01-31 Board Of Regents, The University Of Texas System High-resolution overlay alignment methods and systems for imprint lithography
EP2306242A3 (en) * 2000-10-12 2011-11-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
JP2002252157A (ja) * 2001-02-22 2002-09-06 Sony Corp マスク作製用部材およびその製造方法ならびにマスクおよびその製造方法ならびに露光方法ならびに半導体装置の製造方法
WO2004057663A1 (en) * 2002-12-19 2004-07-08 Koninklijke Philips Electronics N.V. Stress-free composite substrate and method of manufacturing such a composite substrate

Also Published As

Publication number Publication date
JP2008527736A (ja) 2008-07-24
US20060157898A1 (en) 2006-07-20
EP1839088A1 (en) 2007-10-03
ATE399336T1 (de) 2008-07-15
EP1839088B1 (en) 2008-06-25
WO2006078333A1 (en) 2006-07-27
US20080180646A1 (en) 2008-07-31
CN101088045B (zh) 2011-04-13
CN101088045A (zh) 2007-12-12

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Representative=s name: DUSCHER, R., DIPL.-PHYS. DR.RER.NAT., PAT.-ANW., 7

8364 No opposition during term of opposition