DE602004012056D1 - Fokussierlinse für Strahlen geladener Teilchen - Google Patents

Fokussierlinse für Strahlen geladener Teilchen

Info

Publication number
DE602004012056D1
DE602004012056D1 DE602004012056T DE602004012056T DE602004012056D1 DE 602004012056 D1 DE602004012056 D1 DE 602004012056D1 DE 602004012056 T DE602004012056 T DE 602004012056T DE 602004012056 T DE602004012056 T DE 602004012056T DE 602004012056 D1 DE602004012056 D1 DE 602004012056D1
Authority
DE
Germany
Prior art keywords
charged particle
focusing lens
particle beams
beams
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004012056T
Other languages
English (en)
Other versions
DE602004012056T2 (de
Inventor
Hans-Peter Feuerbaum
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE602004012056D1 publication Critical patent/DE602004012056D1/de
Application granted granted Critical
Publication of DE602004012056T2 publication Critical patent/DE602004012056T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
DE602004012056T 2004-01-21 2004-01-21 Fokussierlinse für Strahlen geladener Teilchen Expired - Lifetime DE602004012056T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04001221A EP1557867B1 (de) 2004-01-21 2004-01-21 Fokussierlinse für Strahlen geladener Teilchen

Publications (2)

Publication Number Publication Date
DE602004012056D1 true DE602004012056D1 (de) 2008-04-10
DE602004012056T2 DE602004012056T2 (de) 2009-03-12

Family

ID=34626474

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004012056T Expired - Lifetime DE602004012056T2 (de) 2004-01-21 2004-01-21 Fokussierlinse für Strahlen geladener Teilchen

Country Status (5)

Country Link
US (1) US7652263B2 (de)
EP (1) EP1557867B1 (de)
JP (1) JP4828433B2 (de)
DE (1) DE602004012056T2 (de)
WO (1) WO2005071708A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101243531A (zh) * 2005-08-18 2008-08-13 电子线技术院株式会社 改变电子柱中的电子束的能量的方法
JP4588602B2 (ja) * 2005-09-30 2010-12-01 株式会社トプコン 静電偏向器の製造方法
DE102006059162B4 (de) * 2006-12-14 2009-07-09 Carl Zeiss Nts Gmbh Teilchenoptische Anordnung
US7872236B2 (en) * 2007-01-30 2011-01-18 Hermes Microvision, Inc. Charged particle detection devices
US7759653B2 (en) * 2008-05-30 2010-07-20 Hermes Microvision, Inc. Electron beam apparatus
JP5302595B2 (ja) * 2008-08-06 2013-10-02 株式会社日立ハイテクノロジーズ 傾斜観察方法および観察装置
US7960697B2 (en) 2008-10-23 2011-06-14 Hermes-Microvision, Inc. Electron beam apparatus
US7919760B2 (en) * 2008-12-09 2011-04-05 Hermes-Microvision, Inc. Operation stage for wafer edge inspection and review
US8094924B2 (en) * 2008-12-15 2012-01-10 Hermes-Microvision, Inc. E-beam defect review system
JP5517790B2 (ja) * 2010-07-02 2014-06-11 株式会社キーエンス 拡大観察装置
JP5690086B2 (ja) * 2010-07-02 2015-03-25 株式会社キーエンス 拡大観察装置
US8519353B2 (en) * 2010-12-29 2013-08-27 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4596929A (en) * 1983-11-21 1986-06-24 Nanometrics Incorporated Three-stage secondary emission electron detection in electron microscopes
JP3341226B2 (ja) * 1995-03-17 2002-11-05 株式会社日立製作所 走査電子顕微鏡
JP3372138B2 (ja) * 1995-06-26 2003-01-27 株式会社日立製作所 走査形電子顕微鏡
JPH09147775A (ja) * 1995-11-27 1997-06-06 Jeol Ltd 走査電子顕微鏡用対物レンズ
JPH09147774A (ja) * 1995-11-27 1997-06-06 Jeol Ltd 走査電子顕微鏡用対物レンズ
US5734164A (en) * 1996-11-26 1998-03-31 Amray, Inc. Charged particle apparatus having a canted column
US6037589A (en) * 1997-01-16 2000-03-14 Seiko Instruments Inc. Electron beam device
JP4162343B2 (ja) * 1999-12-24 2008-10-08 エスアイアイ・ナノテクノロジー株式会社 電子線装置
EP1354335A2 (de) * 2000-10-31 2003-10-22 Fei Company Rasterelektronenmikroskop mit einstellbarer spannung der letzten elektrode im elektrostatischen objektiv
EP1350259B1 (de) * 2000-12-22 2004-08-25 Fei Company Sem mit einem sekundärelektronendetektor mit einer zentralelektrode
US7161149B2 (en) * 2002-06-28 2007-01-09 Jeol Ltd. Scanning electron microscope and method of controlling same
JP2004087455A (ja) * 2002-06-28 2004-03-18 Jeol Ltd 走査電子顕微鏡及び走査電子顕微鏡の制御方法
DE10233002B4 (de) * 2002-07-19 2006-05-04 Leo Elektronenmikroskopie Gmbh Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem
US7034297B2 (en) * 2003-03-05 2006-04-25 Applied Materials, Israel, Ltd. Method and system for use in the monitoring of samples with a charged particle beam
US6897442B2 (en) * 2003-04-25 2005-05-24 Applied Materials Israel, Ltd. Objective lens arrangement for use in a charged particle beam column
JP4128487B2 (ja) * 2003-06-02 2008-07-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US7067807B2 (en) * 2004-09-08 2006-06-27 Applied Materials, Israel, Ltd. Charged particle beam column and method of its operation
US7233008B1 (en) * 2005-03-14 2007-06-19 Applied Materials, Israel, Ltd. Multiple electrode lens arrangement and a method for inspecting an object

Also Published As

Publication number Publication date
EP1557867B1 (de) 2008-02-27
WO2005071708A3 (en) 2005-12-08
US7652263B2 (en) 2010-01-26
US20070262255A1 (en) 2007-11-15
WO2005071708A2 (en) 2005-08-04
JP4828433B2 (ja) 2011-11-30
EP1557867A1 (de) 2005-07-27
DE602004012056T2 (de) 2009-03-12
JP2007519194A (ja) 2007-07-12

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Legal Events

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8364 No opposition during term of opposition